Number | Name | Date | Kind |
---|---|---|---|
3465427 | Barson et al. | Sep 1969 | |
4542340 | Chakravarti et al. | Sep 1985 | |
4638341 | Baier et al. | Jan 1987 | |
4672314 | Kokkas | Jun 1987 | |
4789825 | Carelli et al. | Dec 1988 | |
4860079 | Turner | Aug 1989 | |
4896108 | Lynch et al. | Jan 1990 | |
4906921 | Juge | Mar 1990 | |
4994736 | Davis et al. | Feb 1991 | |
5239270 | Desbiens | Aug 1993 | |
5304925 | Ebina | Apr 1994 | |
5391502 | Wei | Feb 1995 |
Entry |
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"How Plasma Etching Damages Thin Gate Oxides," Calvin T. Gabriel, VLSI Technology, Inc. and James P. McVittie, Stanford Univ., Jun. 1992, Solid State Technogy. p. 81-87. |