Number | Date | Country | Kind |
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90830428.0 | Oct 1990 | EPX |
Number | Name | Date | Kind |
---|---|---|---|
4541169 | Bartush | Sep 1985 | |
4617087 | Iyer et al. | Oct 1986 | |
4804560 | Shioya et al. | Feb 1989 | |
4818334 | Shwartzman et al. | Apr 1989 | |
4927783 | Arai et al. | May 1990 | |
5035768 | Mu et al. | Jul 1991 | |
5077236 | Kim | Dec 1991 |
Entry |
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Paul E. Riley, et al., "Development of a Magnetron-Enhanced Plasma Process for Tungsten Etchback with Response-Surface Methodology", IEEE Transactions on Semiconductor Manufacturing vol. 3, No. 3: 142-144, 1990. |
Jen-Jiang Lee et al., "A Study of Tungsten Etchback for Contact and Via Fill Application" IEEE V-MIC Conf., Jun. 15-16, 1987, Santa Clara, Calif.; pp. 193-199. |