Claims
- 1. A method for preparing composite materials of a positive temperature coefficient thermistor device, comprising the following steps:
providing a metal laminated material comprising a top metal layer and a bottom metal layer, an insulating layer between the top and the bottom metal layer, and a conducting through hole disposed between the top metal layer and the bottom metal layer; performing a composite electroplating process to form an composite electroplating layer on the surface of the top metal layer, wherein the composite electroplating layer is a continuous porous structure with a secondary aggregation of carbon black and electroplated metal; and thermal-laminating a polymeric composite material on the composite electroplating layer to form the composite materials of the positive temperature coefficient thermistor device, wherein the polymeric composite material is conductive crystallized and filled with the carbon black.
- 2. The method according to claim 1, wherein the polymeric composite material is selected from the group consisting of polyethylene, polypropylene, polyvinyl fluoride and copolymers thereof.
- 3. The method according to claim 1, wherein the thickness of the composite electroplating layer with a continuous porous structure is more than 0.2 μm.
- 4. The method according to claim 1, wherein the insulating layer is made of the material selected from the group consisting of epoxy resin, polyimide resin, a glass fiber cloth impregnated with epoxy resin, and a glass fiber cloth impregnated with polyimide.
- 5. The method according to claim 1, further comprising a chemical cleaning process performed before the composite electroplating process.
- 6. The method according to the claim 5, further comprising a cathode degreasing process performed before the chemical cleaning process.
- 7. The method according to the claim 1, wherein the composite electroplating process is performed by using a electroplating solution comprising boric acid, carbon black and nickel.
- 8. The method according to the claim 7, wherein the composite electroplating process is performed at approximately 35° C.
- 9. The method according to the claim 7, wherein the composite electroplating process is performed for approximately 10 minutes.
- 10. The method according to the claim 7, wherein the composite electroplating process is performed by using a current with a current density 3A/dm2.
- 11. A method for preparing a composite material laminated structure having a metal layer, comprising the following steps:
providing a metal laminated material having a bottom-insulating layer; performing a composite electroplating process to electroplate carbon black onto the surface of the metal layer to form an composite electroplating layer with a continuous porous structure on the surface of the metal layer; and thermal-laminating a polymeric composite material on the composite electroplating layer to form the composite material laminated structure having a metal layer, wherein the polymeric composite material is conductive crystallized and filled with the carbon black.
- 12. The method according to claim 11, wherein the polymeric composite material is selected from the group consisting of polyethylene, polypropylene, polyvinyl fluoride and copolymers thereof.
- 13. The method according to claim 11, wherein the insulating layer is a laminated material layer made of a glass fiber cloth impregnated with epoxy resin.
- 14. The method according to claim 11, wherein the continuous porous structure is constituted of a metal and a secondary aggregation of carbon black.
- 15. The method according to claim 14, wherein the continuous porous structure is combined with the polymeric composite material to form another secondary aggregation of carbon black.
- 16. The method according to claim 11, further comprising a chemical cleaning process performed before the composite electroplating process and a cathode degreasing process performed before the chemical cleaning process.
- 17. The method according to the claim 11, wherein the composite electroplating process is performed by using a electroplating solution comprising boric acid, carbon black and nickel.
- 18. The method according to the claim 17, wherein the composite electroplating process is performed at approximately 35° C.
- 19. The method according to the claim 17, wherein the composite electroplating process is performed for approximately 10 minutes.
- 20. The method according to the claim 17, wherein the composite electroplating process is performed by using a current with a current density 3A/dm2.
Priority Claims (1)
Number |
Date |
Country |
Kind |
090105217 |
Mar 2001 |
TW |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The application is a division of application Ser. No. 10/056,459, originally filed on Jan. 24, 2002, and the disclosure of which is incorporated herein by reference.
Divisions (1)
|
Number |
Date |
Country |
Parent |
10056459 |
Jan 2002 |
US |
Child |
10424144 |
Apr 2003 |
US |