"Extended Abstracts", Fall Meeting, Oct. 9-14, 1984, vol. 83-2. |
"Frequency Dependence of Photo-EMF of Strongly Inverted Ge and Si MIS Structures-II. Experiments", by R.S. Nakhmanson, et al., Solid-State Electronics, 1975, vol. 18, pp. 627-634. |
"Frequency Dependence of Photo-EMF of Strongly Inverted Ge and Si MIS Structures-I. Theory", by R.S. Nakhmanson, et al., Solid-State Electronics, 1975, vol. 18, pp 617-626. |
"Ac Surface Photovoltages in Strongly-Inverted Oxidized p-Type Silicone Wafers", by C. Munakata, et al,. Japanese Journal of Applied Physics, Nov., 1984, vol. 23, No. 11, pp. 1451-1461. |
"Analysis of ac Surface Photovoltages in a Depleted Oxidized p-Type Silicon Wafer", by C. Munakata, et al., Japanese Journal of Applied Physics, Jun., 1986, vol. 25, No. 6, pp. 807-812. |
"Non-Destructive Method of Observing Inhomogeneities in p-n Junctions with a Chopped Photon Beam", by C. Munakata, et al,. Japanese Journal of Applied Physics, Feb., 1981, vol. 20, No. 2, pp. L137-L140. |
"Determination of Surface Charge and Interface Trap Densities in Naturally Oxidized n-type Si wafers Using ac Surface Photovoltages" by H. Shimizu, et al., Japanese journal of Applied Physics, Feb. 1987, vol. 26, pp. 226-230. |
"Analysis and Control of Electrically Active Contaminants by Surface Charge Analysis" by E. Kamieniecki, et al., Handbook of Semiconductor Wafer Cleaning Technology (date unknown). |
"Non-Contact Mapping of Heavy Metal Contamination for Silicon ic Fabrication", by J. Lagowski, et al,. Semicond. Sci. Technology, 1992 (month unavailable). |
"Determination of Surface Space Charge Capacitance Using a Light Probe", by E. Kamieniecki, J. Vac. Sci. Technology, Mar. 1982. |
"A New Method for In-Line, Real-Time Monitoring of Wafer Cleaning Operations", by E. Kamieniecki, et al., Presented During the Symposium on Ultra Cleaning Processing of Silicon Surfaces, Sep. 9-21, 1994. |
"Surface Photovoltage Measured Capacitance: Application to Semiconductor/Electrolyte System" by E. Kamieniecki, J. Appl. Phys., Nov. 1983. |
AN-1 Application Note--Surface Charge Profiler, "Performance Demonstration", QC Solutions, Inc., Jul. 1994. |
An-2 Application Note--Surface Charge Profiler, "In Wafer Cleaning Monitoring", QC Solutions, Inc., Sep. 1994. |
AN-3 Application Note--Surface Charge Profiler, "Monitoring of Wafer Cleansing Using the Surface Charge Profiler on the Back Surfaces of the Wafer", Nov. 1994. |
"Surface Charge Profiler" brochure mailed out by QC Solutions, Inc., in Jan. 1995. |
"Surface Charge Analysis: A New Method . . . Oxide System", by E. Kamieniecki, Semiconductor Cleaning Technology/1989 Electronics and Dielectrics and Insulation Divisions (month unavailable). |