S. Wolf and R. N. Tauber, "Silicon Processing for the VLSI Era" vol. 1-Process Technology, Lattice Press, 1986, pp. 523-527 and 567. |
B. E.Deal, M. A. McNeilly, D. B. Kao and J. M. deLarios, "Vapor-Phase Wafer Cleaning, Oxide Etching and Thin Film Growth", Presented at 1st Intl. Symposium on Cleaning Technology in Semiconductor Device Mfg. Fall Meeting, The Electrochem. Soc. in Hollywood, Fla. Oct./1989. |
Man Wong, M. M. Moslehi and R. A. Bowling, "Wafer Temperature Dependence of the Vapor-Phase HF Oxide Etch", J. Electrochem. Soc., vol. 140, No. 1, pp. 205-208, Jan. 1990. |
M. Wong, M. M. Moslehi and D. W. Reed, "Characterization of Wafer Cleaning and Oxide Etching Using Vapor-Phase Hydrogen Flouride", J. Electrochem. Soc., vol. 136, No. 6, pp. 1799-1802, Jun. 1991. |
M. Wong, D. K. Y. Liu, M. M. Moslehi and D. W. Reed, "Preoxidation Treatment Using HCl/HF Vapor", IEEE Electron Device Letters, vol. 12, No. 8, pp. 425, 426, Aug. 1991. |