P.E. Wagner and M. Kerker; Brownian coagulation of aerosols in rarefied gases; The Journal of Chemical Physics; vol. 66, No. 2; pp. 638-646; Jan. 15, 1977. |
Ganesan Narsimhan et al.; Dissociation Kinetics of Doublets of Aerosol Particles; Journal of Colloid and Interface Science; vol. 116, No. 1; pp. 278-287; Mar. 1987. |
L. David Pratt; Photoresist aerosol particle formation during spin-coating; Proceedings SPIE-The International Society of Optical Engineering; vol. 1262; pp. 170-179; Mar. 5-6, 1990. |
Linda M. Bond et al.; Using Laser Surface Scanning and Bare Wafer Review to Diagnose Photolithography Track Developer Process Induced Defect Issues; SPIE 24th International Symposium on Microlithography; pp. 1-9; 1999. |
John Sturtevant et al.; Substrate Contamination Effects in the Processing of Chemically Amplified DUV Photoresists; Proceedings SPIE-The International Society of Optical Engineering; pp. 770-780; May 1994. |
Hiroshi Ito; Deep-UV resists: Evolution and Status; Solid State Technology; 164-166, 168, 170 and 173; Jul. 1996. |
Khoi Phan et al.; Efficient and Cost Effective Photo Defect Monitoring; Proceedings SPIE-The International Society of Optical Engineering; vol. 3332; pp. 709-713; Feb. 23-25, 1998. |
Linda M. Bond et al.; Use of Multiple Lithography Monitors in a Defect Control strategy for High Volume Manufacturing; 10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop; all; 1999. |