Number | Name | Date | Kind |
---|---|---|---|
3617824 | Shinoda et al. | Nov 1971 | |
4128670 | Gaensslen | Dec 1978 | |
4180596 | Crowder et al. | Dec 1979 | |
4263058 | Brown et al. | Apr 1981 | |
4285761 | Fatula et al. | Aug 1981 | |
4329706 | Crowder et al. | May 1982 |
Entry |
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P. Ho et al., IBM Technical Disclosure Bulletin, vol. 21, No. 12, May 1979, pp. 5039-5040, "Method for Obtaining Large Grain Silicon Films on Amorphous Substrate". |
T. Mochizuki et al., Japanese Journal of Applied Physics, vol. 17, 1978 Supplement 17-1, pp. 37-42, "A New MOS Process Using MoSi.sub.2 as a Gate Material". |
Laibowitz et al., IBM Technical Disclosure Bulletin, vol. 21, No. 2, May 1979, pp. 5051 and 5052. |