Konda et al, "Low-Temperature Surface Cleaning Of GaAs By Electron Cyclotron Resonance (ECR) Plasma", Japanese Journal of Applied Physics, vol. 28, No. 1, 1989, pp. L7-L9. |
Kondo et al, "Hydrogen ECR Plasma Surface Cleaning Using AlGaAs Substrates", Institute of Physics Conference, No. 129, 1992, pp. 585-590. |
Hong et al, "Removal of GaAs Surface Contaminants Using H.sub.2 Electron Cyclotron Resonance Plasma Treatment Followed By Cl.sub.2 Chemical Etching", Applied Physics Letters, vol. 62, No. 21, 1993, pp. 2658-2660. |
Kizuki et al, "Selective Metalorganic Chemical Vapor Deposition Growth Of GaAs On AlGaAs Combined With In Situ HCl Gas Etching", Journal of Crystal Growth, vol. 134, 1993, pp. 35-42. |
Kuiper et al., "Room-Temperature HF Vapor-Phase Cleaning For Low-Pressure Chemical Vapor Deposition of Expitaxial Si and SiGe Layers", J. Electrochem. Soc., vol. 139, No. 9, Sep. 1992, pp. 2594-2599. |
Hamm et a., "Selective Area Growth of Heterostructure Bipolar Transistors by Metalorganic Molecular Beam Epitaxy", Applied Physics Letter, vol. 61, No. 5, Aug. 3, 1992, pp. 592-594. |