Number | Date | Country | Kind |
---|---|---|---|
63-118458 | May 1988 | JPX | |
63-172302 | Jul 1988 | JPX | |
63-207446 | Aug 1988 | JPX |
This is a continuation of application Ser. No. 07/350,860, filed on May 9, 1989, now U.S. Pat. No. 5,096,842.
Number | Name | Date | Kind |
---|---|---|---|
4229502 | Wu et al. | Oct 1980 | |
4531282 | Sakai et al. | Jul 1985 | |
4663827 | Nakahara | May 1987 | |
4693782 | Kikuchi et al. | Sep 1987 | |
4746629 | Hanagasaki | May 1988 | |
4830972 | Hamasaki | May 1989 | |
4908324 | Nihira et al. | Mar 1990 |
Number | Date | Country |
---|---|---|
225672 | Jun 1987 | EPX |
3825701 | Feb 1989 | DEX |
Entry |
---|
Orvek et al., "Carbonized layer formation in ion implanted photoresist masks", Nuclear Instruments & Method in Physics Research, 1985, pp. 501-506. |
JP 61-237 467 A: In Patents Abstracts of Japan, 1987, vol. 11, No. 83, E-489. |
IEEE Transactions on Electron Devices, 1984, vol. ED-31, No. 12, pp. 1781 to 1783. |
Proceedings of the 12th Conference on Solid State Devices, Tokyo; Tsutomu Fujita et al.; 1980, pp. 149-153. |
Proceedings of the BCTM; B-Y Hwang et al.; 1987, pp. 176-179. |
Number | Date | Country | |
---|---|---|---|
Parent | 350860 | May 1989 |