Claims
- 1. A method of forming a partial reverse active mask, comprising:
providing a mask pattern, comprising a large active region pattern with an original dimension and a small active region pattern; shrinking the large active region pattern and the small active region pattern until the small active region pattern disappears; and enlarging the large active region pattern to a dimension slightly smaller than the original dimension.
- 2. The method according to claim 1, wherein the large active region pattern and the small active region are shrunk with a distance of about 0.5 μm to 2.0 μm.
- 3. The method according to claim 1, wherein the large active region pattern is enlarged with a dimension smaller than the shrinking distance.
Priority Claims (1)
Number |
Date |
Country |
Kind |
87105966 |
Apr 1998 |
TW |
|
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation in part of U.S. patent application Ser. No. 09/075,618, filed May 11, 1998, which claimed the priority benefit of Taiwan application Serial no. 87105966, filed Apr. 18, 1998.
Continuations (1)
|
Number |
Date |
Country |
Parent |
09535251 |
Mar 2000 |
US |
Child |
09991466 |
Nov 2001 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09075618 |
May 1998 |
US |
Child |
09535251 |
Mar 2000 |
US |