Method of generating electron-beam data for creating a mask

Information

  • Patent Grant
  • 6189135
  • Patent Number
    6,189,135
  • Date Filed
    Friday, March 31, 2000
    24 years ago
  • Date Issued
    Tuesday, February 13, 2001
    23 years ago
Abstract
A method of generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit by parallel processing a layout pattern of a semiconductor integrated circuit with a parallel data processing unit based on at least one of (i) design layers of the semiconductor integrated circuit, (ii) fabrication processes used in fabricating a mask for the layout pattern, and (iii) segments, each segment being an electron-beam radiation region of the mask. The data processing is divided and divided portions of the data processing are as-signed to respective parallel-connected processing circuits. The parallel data processing unit includes a hierarchy developing A unit for developing, in parallel processing, a hierarchy of the layout pattern for respective design layers by assigning the hierarchy developing to respective parallel-connected processing circuits. The format of data processed by parallel processing is converted into electron-beam data and output.
Description




BACKGROUND OF THE INVENTION




1. Field of the Invention




The present invention relates to an electron-beam data generating apparatus for converting layout pattern data into electron-beam data (EB data) for creating a mask to be used in a semiconductor fabrication process.




2. Description of the Prior Art




In order to manufacture a semiconductor integrated circuit (LSI), in general, after the design of the LSI has been completed, a circuit pattern of the LSI is created as a metallic thin film on a glass substrate. The metallic thin film forming the circuit pattern of the LSI is referred to as a mask. Semiconductor devices are then created by transferring the circuit pattern to locations on a silicon wafer sequentially one location after another by using the mask. A mask is created normally by, first of all, converting a circuit pattern resulting from a completed layout design into mask data having a data format readable by a mask drawing apparatus. In the following description, the circuit pattern, data input to the format-conversion process, is referred to as layout-pattern data which has a GDSII STREAM format. On the other hand, mask data output by the conversion is called as EB data.




When the designer creates layout-pattern data, a circuit pattern is entered for each fabrication process. At that time, it is necessary to enter figure data by providing a hierarchy thereto. The hierarchy comprises design layers. A segment is a drawing-region unit of the mask drawing apparatus. A mask is drawn by dividing the pattern of the mask into segment units.





FIG. 8

is a block diagram showing the configuration of a conventional electron-beam data generating apparatus for two design layers, two fabrication processes and two segments.

FIG. 9

is a diagram showing an example of an image figure of layout-pattern data. In this example, the number of fabrication processes match the number of design layers. It should be noted, however, that one fabrication process may correspond to a plurality of design layers.




In

FIG. 8

, reference numerals


1


and


2


denote layout-pattern data and a stream analyzing unit respectively. Reference numeral


3


is a reference sorting unit and reference numeral


4


denotes a hierarchy developing unit. Reference numerals


5


and


6


are a trapezoid division unit and a trapezoid-file sorting unit, respectively. Reference numeral


7


denotes a data compressing unit and reference numeral


8


is a format converting unit. Reference numerals


9




a


and


9




b


each denote EB data.




The hierarchy developing unit


4


comprises a hierarchy developing L


1


sub-unit


10


and a hierarchy developing L


2


sub-unit


11


for developing hierarchies for design layers L


1


and L


2


respectively. The trapezoid division unit


5


comprises a trapezoid division P


1


sub-unit


12


and a trapezoid division P


2


sub-unit


13


for carrying out trapezoid division processes on data developed for fabrication processes P


1


and P


2


, respectively. In addition, the trapezoid-file sorting unit


6


comprises a trapezoid-file sorting P


1


S


1


sub-unit


14


, a trapezoid-file sorting P


1


S


2


sub-unit


15


, a trapezoid-file sorting P


2


S


1


sub-unit


16


and a trapezoid-file sorting P


2


S


2


sub-unit


17


for carrying out trapezoid-file sorting processes for their respective combinations of the two fabrication processes P


1


and P


2


and segments S


1


and S


2


each used as a unit of mask-pattern creation. The data compressing unit


7


comprises a data compressing P


1


S


1


sub-unit


18


, a data compressing P


1


S


2


sub-unit


19


, a data compressing P


2


S


1


sub-unit


20


and a data compressing P


2


S


2


sub-unit


21


for sorting trapezoid files of their respective combinations of the two fabrication processes P


1


and P


2


and the two segments S


1


and S


2


. The format converting unit


8


comprises a format converting P


1


sub-unit


22


and a format converting P


2


sub-unit


23


for format conversion to generate the EB data


9




a


and the EB data


9




b


of the fabrication processes P


1


, and P


2


respectively.




First of all, from the layout-pattern data


1


created by the designer in the GDSII STREAM format, figure data of the stream data is read out by the stream analyzing unit


2


for each cell. At that time, only data of layers specified by parameter inputs is read in. Further, the stream format is checked and, in addition, data such as cell names and reference information is analyzed.




The reference sorting unit


3


then sorts reference files from the analyzed stream. Subsequently, the hierarchy developing unit


4


develops a cell hierarchical structure for each design layer, creating a flat figure on each of the fabrication processes. Then, the trapezoid division unit


5


carries out a trapezoid division process on the figure having a developed hierarchical structure for each fabrication process. The trapezoid-file sorting unit


6


then carries out a file sorting process on trapezoid data produced by the trapezoid division unit


5


for each segment. Subsequently, the data compressing unit


7


compresses the data for each fabrication process and each segment. Finally, the format converting unit


8


carries out format conversion for each fabrication process to produce a MEBES data format. The of processing steps described above result in the EB data


9




a


and the EB data


9




b.






In the hierarchy developing unit


4


, the design layer L


1


is processed by the hierarchy developing L


1


sub-unit


10


and, as the processing is completed, the design layer L


2


is processed by the hierarchy developing L


2


sub-unit


11


. In the trapezoid division unit


5


, figures developed by the hierarchy developing unit


4


undergo processing for the fabrication process P


1


by the trapezoid division P


1


sub-unit


12


and, as the processing is completed, undergo processing for the fabrication process P


2


by the trapezoid division P


2


sub-unit


13


. In the trapezoid-file sorting unit


6


, files of the figures completing the trapezoid division processing are sorted by using data such as the X-direction coordinate or a data code resulting from coding of a trapezoidal shape, a stripe or a segment as a key. First of all, processing for the fabrication process P


1


and the segment S


1


is carried out by the trapezoid-file sorting P


1


S


1


sub-unit


14


. When this processing is finished, processing for the fabrication process P


1


and the segment S


2


is carried out by the trapezoid-file sorting P


1


S


2


sub-unit


15


. When this processing is finished, processing for the fabrication process P


2


and the segment Si is carried out by the trapezoid-file sorting P


2


S


1


sub-unit


16


. When this processing is finished, processing for the fabrication process P


2


and the segment S


2


is carried out by the trapezoid-file sorting P


2


S


2


sub-unit


17


. In the data compressing unit


7


, processing for the fabrication process P


1


and the segment S


1


is carried out by the data compressing P


1


S


1


sub-unit


18


. When this processing is finished, processing for the fabrication process P


1


and the segment S


2


is carried out by the data compressing P


1


S


2


sub-unit


19


. When this processing is finished, processing for the fabrication process P


2


and the segment S


1


is carried out by the data compressing P


2


S


1


sub-unit


20


. When this processing is finished, processing for the fabrication process P


2


and the segment S


2


is carried out by the data compressing P


2


S


2


sub-unit


21


. In the format converting unit


8


, processing for the fabrication process P


1


is carried out by the format converting P


1


sub-unit


22


. When this processing is finished, processing for the fabrication process P


2


is carried out by the format converting P


2


sub-unit


23


.




Having a configuration described above, the conventional electron-beam data generating apparatus has a problem that it takes a long time to carry out the processing to convert layout-pattern data into EB data.




SUMMARY OF THE INVENTION




The present invention is implemented to solve the problem described above, and it is thus an object of the present invention to provide an electron-beam data generating apparatus capable of processing data at a high speed.




According to an aspect of the present invention, an electron-beam data generating apparatus for generating electron-beam data comprises a data processing unit for carrying out data processing of a layout pattern based on at least one of design layers, fabrication processes of mask creation and segments each serving as an electron-beam radiation region in parallel by dividing data processing and assigning divided portions of the data processing to a plurality of processing circuits; and a format converting unit for converting a format of data completing the data processing in the data processing unit into a format of the electron-beam data and outputting the electron-beam data. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.




According to another aspect of the present invention, the data processing unit employed in the electron-beam data generating apparatus described above includes a hierarchy developing unit for carrying out hierarchy developing processes on the layout pattern in parallel for the respective design layers by assigning the hierarchy developing processes to the processing circuits. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.




According to still another aspect of the present invention, the data processing unit employed in the electron-beam data generating apparatus described above includes a trapezoid division unit for carrying out trapezoid-division processes on figures of the layout pattern in parallel for the respective fabrication processes by assigning the trapezoid-division processes to the processing circuits and for outputting a plurality of trapezoid files. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.




According to a still further aspect of the present invention, the data processing unit employed in the electron-beam data generating apparatus described above includes a trapezoid-file sorting unit for carrying out pieces of sort processing on the trapezoid files output by the trapezoid division unit by using a predetermined key in parallel for respective combinations of the fabrication processes and the segments each serving as an electron-beam radiation region by assigning the pieces of sort processing to the processing circuits. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.




According to a still further aspect of the present invention, the data processing unit employed in the electron-beam data generating apparatus described above includes a data compressing unit for carrying out data-compression processes on the layout pattern in parallel for respective combinations of the fabrication processes and the segments each serving as an electron-beam radiation region by assigning the data-compression processes to the processing circuits. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.




According to a still further aspect of the present invention, the format converting unit employed in the electron-beam data generating apparatus described above carries out format-conversion processes on data of the layout pattern in parallel for the respective fabrication processes by assigning the format-conversion processes to the processing circuits. As a result, the electron-beam data generating apparatus has an effect of a capability of processing data at a high speed.











BRIEF DESCRIPTION OF THE DRAWINGS




Preferred embodiments of the present invention will be described with reference to figures wherein:





FIG. 1

is a block diagram showing a hardware configuration of an EB data generating apparatus as implemented by an embodiment of the present invention;





FIG. 2

is a functional block diagram showing an EB data generating apparatus as implemented by a first embodiment of the present invention;





FIG. 3

is a functional block diagram showing an EB data generating apparatus as implemented by a second embodiment of the present invention;





FIG. 4

is a functional block diagram showing an EB data generating apparatus as implemented by a third embodiment of the present invention;





FIG. 5

is a functional block diagram showing an EB data generating apparatus as implemented by a fourth embodiment of the present invention;





FIG. 6

is a functional block diagram showing an EB data generating apparatus as implemented by a fifth embodiment of the present invention;





FIG. 7

is a functional block diagram showing an EB data generating apparatus as implemented by a sixth embodiment of the present invention;





FIG. 8

is a functional block diagram showing a conventional electron-beam data generating apparatus; and





FIG. 9

is a diagram showing an example of image figures of layout-pattern data.











DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS




The present invention will become more apparent from a study of the following detailed description of some preferred embodiments with reference to the accompanying diagrams.




First Embodiment





FIG. 1

is a block diagram showing a hardware configuration of an EB data generating apparatus as implemented by an embodiment of the present invention. As shown in the figure, the EB data generating apparatus implemented by an embodiment of the present invention comprises four CPUs (processing circuits)


101




a


,


101




b


,


101




c


and


101




d


, a ROM unit


102


, a RAM unit


103


, an input/output interface unit


104


including a keyboard and a CRT and a data bus


105


for transferring data among these components. In the configuration of the EB data generating apparatus, data processing can be carried out in parallel by the four CPUs.





FIG. 2

is a functional block diagram showing an EB data generating apparatus as implemented by a first embodiment of the present invention. In actuality, operations of the first embodiment are implemented by a software executed on the hardware shown in FIG.


1


.




To be more specific,

FIG. 2

is a functional block diagram showing the configuration of an EB data generating apparatus as implemented by the first embodiment for two design layers, two fabrication processes and two segments. It should be noted that the first embodiment generates the same typical image figures as the image figures of layout-pattern data of

FIG. 9

which is processed by the conventional EB data generating apparatus explained previously.




In

FIG. 2

, reference numerals


201


and


202


denote layout-pattern data and a stream analyzing unit respectively. Reference numeral


203


is a reference sorting unit and reference numeral


204


denotes a hierarchy developing unit (data processing unit). Reference numerals


205


and


206


are a trapezoid division unit and a trapezoid-file sorting unit respectively. Reference numeral


207


denotes a data compressing unit and reference numeral


208


is a format converting unit. Reference numerals


209




a


and


209




b


each denote EB data.




It should be noted that the hierarchy developing unit


204


comprises a hierarchy developing L


1


sub-unit


210


and a hierarchy developing L


2


sub-unit


211


for developing hierarchies in parallel for design layers L


1


and L


2


, respectively. In this case, two of the four CPUs


101




a


to


110




d


shown in

FIG. 1

are each allocated to one of the two parallel processes for the design layers L


1


and L


2


. In this way, the hierarchies can be developed at a high speed.




In addition, the trapezoid division unit


205


comprises a trapezoid division P


1


sub-unit


212


and a trapezoid division P


2


sub-unit


213


for carrying out trapezoid division processes on data developed for fabrication processes P


1


and P


2


respectively. Further, the trapezoid-file sorting unit


206


comprises a trapezoid-file sorting P


1


S


1


sub-unit


214


, a trapezoid-file sorting P


1


S


2


sub-unit


215


, a trapezoid-file sorting P


2


S


1


sub-unit


216


and a trapezoid-file sorting P


2


S


2


sub-unit


217


for respectively carrying out trapezoid-file sorting processes on the respective combinations of the two fabrication processes P


1


and P


2


and segments S


1


and S


2


, each used as a unit of mask-pattern creation. The data compressing unit


207


comprises a data compressing P


1


S


1


sub-unit


218


, a data compressing P


1


S


2


sub-unit


219


, a data compressing P


2


S


1


sub-unit


220


and a data compressing P


2


S


2


sub-unit


221


for sorting trapezoid files of the respective combinations of the two fabrication processes P


1


and P


2


and the two segments S


1


and S


2


. Finally, the format converting unit


208


comprises a format converting P


1


sub-unit


222


and a format converting P


2


sub-unit


223


for format conversion to generate the EB data


209




a


and the EB data


209




b


for the fabrication processes P


1


and P


2


, respectively.




First of all, from the layout-pattern data


201


created by the designer in the GDSII STREAM format, figure data of the stream data is read out by the stream analyzing unit


202


for each cell. At that time, only data of layers specified by parameter inputs is read in. Further, the stream format is checked and, in addition, data such as cell names and reference information are analyzed.




The reference sorting unit


203


then sorts reference files from the analyzed stream. Subsequently, the hierarchy developing unit


204


develops a cell hierarchical structure for each design layer and fetches reference data onto a fabrication process. Then, data of a cell is made polygon data, creating a flat figure on the fabrication processes.




The trapezoid division unit


205


then carries out a trapezoid division process on the figure having a developed hierarchical structure for each fabrication process. To be more specific, in the trapezoid division process, first of all, the polygon data is divided among specified drawing regions and then divided among segment regions. The data is further divided among stripe regions, regions of division in the vertical direction of the EB format. Figures divided in this way are further divided into trapezoids.




Subsequently, the trapezoid-file sorting unit


206


carries out a file sorting process on trapezoid data produced by the trapezoid division unit


205


for each fabrication process and each segment by using data such as the X-direction coordinate or a data code resulting from coding of a trapezoidal shape, a stripe or a segment as a key. Then, the data compressing unit


207


compresses the data for each fabrication process and each segment. Finally, the format converting unit


208


carries out format conversion for each fabrication process to produce a MEBES data format. The pieces of processing described above result in the EB data


209




a


and the EB data


209




b.






In the hierarchy developing unit


204


, the design layers L


1


and L


2


are processed in parallel by the hierarchy developing L


1


sub-unit


210


and the hierarchy developing L


2


sub-unit


211


respectively by using different CPUs described above. In the trapezoid division unit


205


, figures developed by the hierarchy developing unit


204


undergo processing for the fabrication process P


1


by the trapezoid division P


1


sub-unit


212


and, as the processing is completed, undergo processing for the fabrication process P


2


by the trapezoid division P


2


sub-unit


213


.




In the trapezoid-file sorting unit


206


, files of the figures completing the trapezoid division processing are sorted by using data such as the X-direction coordinate or a data code resulting from coding of a trapezoidal shape, a stripe or a segment as a key. To be more specific, first of all, processing for the fabrication process P


1


and the segment S


1


is carried out by the trapezoid-file sorting P


1


S


1


sub-unit


214


. As this processing is finished, processing for the fabrication process P


1


and the segment S


2


is carried out by the trapezoid-file sorting P


1


S


2


sub-unit


215


. When this processing is finished, processing for the fabrication process P


2


and the segment S


1


is carried out by the trapezoid-file sorting P


2


S


1


sub-unit


216


. When this processing is finished, processing for the fabrication process P


2


and the segment S


2


is carried out by the trapezoid-file sorting P


2


S


2


sub-unit


217


.




In the data compressing unit


207


, processing for the fabrication process P


1


and the segment S


1


is carried out by the data compressing P


1


S


1


sub-unit


218


. When this processing is finished, processing for the fabrication process P


1


and the segment S


2


is carried out by the data compressing P


1


S


2


sub-unit


219


. When this processing is finished, processing for the fabrication process P


2


and the segment S


1


is carried out by the data compressing P


2


S


1


sub-unit


220


. When this processing is finished, processing for the fabrication process P


2


and the segment S


2


is carried out by the data compressing P


2


S


2


sub-unit


221


. It should be noted that, in the data compression, data of the same type in the X and Y directions is searched for data located at equal intervals to be summarized as iteration data.




In the format converting unit


208


, processing for the fabrication process P


1


is carried out by the format converting P


1


sub-unit


222


. When this processing is finished, processing for the fabrication process P


2


is carried out by the format converting P


2


sub-unit


223


. The format converting P


1


sub-unit


222


outputs the EB data


209




a


and the format converting P


2


sub-unit


223


produces the EB data


209




b.






As described above, according to the first embodiment, since as many hierarchy developing processes as design layers can be carried out in parallel in the hierarchy developing unit


204


, the processing time required for carrying out the conversion into EB data can be shortened, allowing fabrication processes having a short process time to be implemented.




Second Embodiment





FIG. 3

is a functional block diagram showing an EB data generating apparatus as implemented by a second embodiment of the present invention. Data, units and sub-units in this figure which are identical with or equivalent to those of the first embodiment described earlier are denoted by the same reference numerals for denoting the latter and their description is omitted to avoid duplication of explanation. It should be noted that, like the first embodiment, operations of the second embodiment are also implemented by software executed on the hardware shown in FIG.


1


.




The configuration of the second embodiment is different from that of the first embodiment in the following areas. In place of the hierarchy developing unit


204


and the trapezoid division unit


205


, a hierarchy developing unit


304


and a trapezoid division unit (data processing unit)


305


are provided, respectively. In the hierarchy developing unit


304


, the design layer L


1


is processed by a hierarchy developing L


1


sub-unit


310


and, as the processing is completed, the design layer L


2


is processed by a hierarchy developing L


2


sub-unit


311


.




In the trapezoid division unit


305


, figures with a developed hierarchy output by the hierarchy developing unit


304


undergo trapezoid-division processes in parallel in a trapezoid division P


1


sub-unit


312


for carrying out trapezoid division for the fabrication process P


1


and a trapezoid division P


2


sub-unit


313


for carrying out trapezoid division for the fabrication process P


2


by using different CPUs described above. To be more specific, in the trapezoid division process, first of all, the polygon data is divided among specified drawing regions and then divided among segment regions. The data is further divided among stripe regions, regions of division in the vertical direction of the EB format. Figures divided in this way are further divided into trapezoids. Two of the four CPUs


101




a


to


101




d


shown in

FIG. 1

are each allocated to one of the trapezoid division processes for the fabrication process P


1


and the trapezoid division processing for the fabrication process P


2


so that the two parts of trapezoid division processes can be carried out in parallel by the two separate CPUs. As a result, due to the parallel execution, processing of data at a high speed can be implemented.




Since pacts of the processes which are carried out after the trapezoid division processing are the same as the first embodiment, their explanation is omitted. As described above, according to the second embodiment, since as many pieces of trapezoid division processes as fabrication processes can be carried out in parallel in the trapezoid division unit


305


, the processing time required for carrying out the conversion into EB data can be shortened, allowing fabrication processes having a short process time to be implemented.




Third Embodiment





FIG. 4

is a functional block diagram showing an EB data generating apparatus as implemented by a third embodiment of the present invention. Data, units and sub-units in this figure which are identical with or equivalent to those of the first and second embodiments described earlier are denoted by the same reference numerals for denoting the latter and their description is omitted to avoid duplication of explanation. It should be noted that, like the first and second embodiments, operations of the third embodiment are also implemented by software executed on the hardware shown in FIG.


1


.




The configuration of the third embodiment is different from that of the first embodiment in the following areas. In place of the hierarchy developing unit


204


and the trapezoid-file sorting unit


206


, the hierarchy developing unit


304


and a trapezoid-file sorting unit (data processing unit)


406


are respectively provided. Since the hierarchy developing unit


304


is the same as that of the second embodiment, its description is omitted to avoid duplication of explanation.




The trapezoid-file sorting unit


406


carries out a file sorting process on trapezoid data produced by the trapezoid division unit


205


for each fabrication process and each segment by using data such as the X-direction coordinate or a data code resulting from coding of a trapezoidal shape, a stripe or a segment as a key. To be more specific, in the trapezoid-file sorting unit


406


, a trapezoid-file sorting process on trapezoid data is carried out for each combination of the fabrication processes P


1


and P


2


and the segments S


1


and S


2


. The trapezoid-file sorting processes are carried out for the combinations in parallel by separately allocating the four CPUs


101




a


to


101




d


shown in

FIG. 1

to the processes.




Since operations carried out by units other than the trapezoid-file sorting unit


406


are the same as those of the first and second embodiments, their description is omitted to avoid duplication of explanation. Operations carried out by the trapezoid-file sorting unit


406


are explained as follows.




Trapezoid files completing trapezoid division in the trapezoid division unit


205


undergo a trapezoid-file sorting process for the fabrication process P


1


and the segment S


1


in the trapezoid-file sorting P


1


S


1


sub-unit


414


, a trapezoid-file sorting process for the fabrication process P


1


and the segment S


2


in the trapezoid-file sorting P


1


S


2


sub-unit


415


, a trapezoid-file sorting process for the fabrication process P


2


and the segment S


1


in the trapezoid-file sorting P


2


S


1


sub-unit


416


and a trapezoid-file sorting process for the fabrication process P


2


and the segment S


2


in the trapezoid-file sorting P


2


S


2


sub-unit


417


in parallel. In this case, the four CPUs


101




a


to


101




d


shown in

FIG. 1

are allocated separately to the pieces of processing carried out in the trapezoid-file sorting P


1


S


1


sub-unit


414


, the trapezoid-file sorting P


1


S


2


sub-unit


415


, the trapezoid-file sorting P


2


S


1


sub-unit


416


and the trapezoid-file sorting P


2


S


2


sub-unit


417


. As a result, data can be processed at a high speed.




As described above, according to the third embodiment, since as many trapezoid-file sorting processes as combinations of fabrication processes and segments can be carried out in parallel in the trapezoid-file sorting unit


406


, there is resulted in an effect that the processing time required for carrying out the conversion into EB data can be shortened, allowing fabrication processes having a short process time to be implemented.




Fourth Embodiment





FIG. 5

is a functional block diagram showing an EB data generating apparatus as implemented by a fourth embodiment of the present invention. Data, units and sub-units in this figure which are identical with or equivalent to those of the first and second embodiments described earlier are denoted by the same reference numerals for denoting the latter and their description is omitted to avoid duplication of explanation. It should be noted that, much like the first to third embodiments, operations of the fourth embodiment are also implemented by software executed on the hardware shown in FIG.


1


.




The configuration of the fourth embodiment is different from that of the first embodiment in the following areas. In place of the hierarchy developing unit


204


and the data compressing unit


207


, the hierarchy developing unit


304


and a data compressing unit (data processing unit)


507


are provided respectively. Since the hierarchy developing unit


304


is the same as that of the second embodiment, its description is omitted to avoid duplication of explanation.




The data processing unit


507


compresses figure file data output by the trapezoid-file sorting unit


206


. In the data compression, data of the same type in the X and Y directions is searched for data located at equal intervals to be summarized as iteration data. In the data compressing unit


507


, parts of processing to compress sorted trapezoid files are carried out for respective combinations of the fabrication processes P


1


and P


2


and the segments S


1


and S


2


. The four CPUs


101




a


to


101




d


shown in

FIG. 1

are separately allocated to the parts of processing so that the parts of processing can be carried out in parallel.




In the data compressing unit


507


, data compression for the fabrication process P


1


and the segment S


1


in the data compressing P


1


S


1


sub-unit


518


, data compression for the fabrication process P


1


and the segment S


2


in the data compressing P


1


S


2


sub-unit


519


, data compression for the fabrication process P


2


and the segment S


1


in the data compressing P


2


S


1


sub-unit


520


and data compression for the fabrication process P


2


and the segment S


2


in the data compressing P


2


S


2


sub-unit


521


are thus carried out in parallel by different CPUs, that is, the four CPUs


101




a


to


101




d


shown in FIG.


1


. That is to say, the four CPUs


101




a


to


101




d


shown in

FIG. 1

are separately allocated to the parts of processing in the data compressing P


1


S


1


sub-unit


518


, the data compressing P


1


S


2


sub-unit


519


, the data compressing P


2


S


1


sub-unit


520


and the data compressing P


2


S


2


sub-unit


521


so that the parts of the processes can be carried out in parallel.




As described above, according to the fourth embodiment, since as many parts of data compression processes as combinations of fabrication processes and segments can be carried out in parallel in the data compressing unit


507


, the processing time required for carrying out the conversion into EB data can be shortened, allowing fabrication processes having a short process time to be implemented.




Fifth Embodiment





FIG. 6

is a functional block diagram showing an EB data generating apparatus as implemented by a fifth embodiment of the present invention. Data, units and sub-units in this figure which are identical with or equivalent to those of the first and second embodiments described earlier are denoted by the same reference numerals for denoting the latter and their description is omitted to avoid duplication of explanation. It should be noted that, like the first to fourth embodiments, operations of the fifth embodiment are also implemented by software executed on the hardware shown in FIG.


1


.




The configuration of the fifth embodiment is different from that of the first embodiment in the following areas. In place of the hierarchy developing unit


204


and the format converting unit


208


, the hierarchy developing unit


304


and a format converting unit (data processing unit)


608


are provided, respectively. Since the hierarchy developing unit


304


is the same as that of the second embodiment, its description is omitted to avoid duplication of explanation.




The format converting unit


608


comprises a format converting P


1


sub-unit


622


and a format converting P


2


sub-unit


623


for format conversion to generate the EB data


609




a


and the EB data


609




b


for the fabrication processes P


1


and P


2


respectively. Two of the four CPUs


101




a


to


101




d


shown in

FIG. 1

are each allocated to one of the format conversion for the fabrication process P


1


in the format converting P


1


sub-unit


622


and the format conversion for the fabrication process P


2


in the format converting P


2


sub-unit


623


so that the two format-conversion processes can be carried out in parallel by the two CPUs.




As described above, according to the fifth embodiment, since as many format-conversion processes as fabrication processes can be carried out in parallel in the format converting unit


608


, the processing time required for carrying out the conversion into EB data can be shortened, allowing fabrication processes having a short process time to be implemented.




Sixth Embodiment





FIG. 7

is a functional block diagram showing an EB data generating apparatus as implemented by a sixth embodiment of the present invention. Data, units and sub-units in this figure which are identical with or equivalent to those of the first to fifth embodiments described earlier are denoted by the same reference numerals for denoting the latter and their description is omitted to avoid duplication of explanation. It should be noted that, like the first to fifth embodiments, operations of the sixth embodiment are also implemented by software executed on the hardware shown in FIG.


1


.




In the EB data generating apparatus implemented by the sixth embodiment, parts of processing carried out on the layout-pattern data


201


up to the hierarchy development performed by the hierarchy developing unit


204


are the same as those of the first embodiment. Thus, two of the four CPUs


101




a


to


101




d


shown in

FIG. 1

are each allocated to one of two parts of parallel processing for the design layers.




When the processing carried out in the hierarchy developing unit


204


is finished, in the trapezoid division unit


305


explained in the description of the second embodiment, trapezoid-division processes are carried out in parallel for the respective fabrication processes by separately allocating two of the four CPUs


101




a


to


101




d


shown in

FIG. 1

to the trapezoid-division processes.




When the processing carried out in the trapezoid division unit


305


is finished, in the trapezoid-file sorting unit


406


explained in the description of the third embodiment, trapezoid-file sorting processes are carried out in parallel for the respective combinations of the fabrication processes and the segments by separately allocating the four CPUs


101




a


to


101




d


shown in

FIG. 1

to the trapezoid-file sorting processes.




When the processing carried out in the trapezoid-file sorting unit


406


is finished, in the data compressing unit


507


explained in the description of the fourth embodiment, data compressing processes are carried out in parallel for the respective combinations of the fabrication processes and the segments by separately allocating the four CPUs


101




a


to


101




d


shown in

FIG. 1

to the data compressing processes.




When the processing carried out in the data compressing unit


507


is finished, in the format converting unit


608


explained in the description of the fifth embodiment, data-conversion processes are carried out in parallel for the respective fabrication processes by separately allocating two of the four CPUs


101




a


to


101




d


shown in

FIG. 1

to the trapezoid-division processes.




As described above, since several parts of processing are carried out in the hierarchy developing unit


204


, the trapezoid division unit


305


, the trapezoid-file sorting unit


406


, the data compressing unit


507


and the format converting unit


608


by separately allocating a plurality of CPUs, processing of data at a high speed can be implemented. It should be noted that, while the sixth embodiment is built by combining components of all the first to fifth embodiments, any combination of components employed in the embodiments such as a combination of those employed in the first and third embodiments or a combination of those employed in the second and fourth embodiments will allow of data at a high speed to be implemented.




In addition, the number of CPUs is not limited to four. It is also possible to implement a configuration employing two, three, five or more CPUs depending on the number of segments, the number of design layers and the number of manufacturing processes.



Claims
  • 1. A method of generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit, said method comprising:parallel processing a layout pattern of a semiconductor integrated circuit with a parallel data processing unit based on at least one of (i) design layers of the semiconductor integrated circuit, (ii) fabrication processes used in fabricating a mask for the layout pattern, and (iii) segments, each segment being an electron-beam radiation region of the mask, by dividing data processing and assigning divided portions of the data processing to respective parallel-connected processing circuits wherein the parallel data processing unit includes a hierarchy developing unit for developing, in parallel processing, of a hierarchy of the layout pattern for respective design layers by assigning the developing of a hierarchy to respective parallel-connected processing circuits; and converting format of data processed by parallel processing into electron-beam data and outputting the electron-beam data.
  • 2. The method of generating electron-beam data according to claim 1 wherein parallel processing includes dividing figures of the layout pattern in a trapezoid division unit, for the respective fabrication processes, trapezoidally, by assigning the dividing to respective parallel-connected processing circuits, and outputting a plurality of trapezoid files.
  • 3. The method of generating electron-beam data according to claim 2 wherein parallel processing includes sorting the trapezoid files output by the trapezoid division unit using a key for respective combinations of the fabrication processes and the segments by assigning the sorting to respective processing circuits.
  • 4. The method of generating electron-beam data according to claim 3 wherein parallel processing includes data-compressing the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
  • 5. The method of generating electron-beam data according to claim 3 wherein converting format includes format-converting data of the layout pattern for respective fabrication processes by assigning the format-converting to respective processing circuits.
  • 6. The method of generating electron-beam data according to claim 2 wherein parallel processing includes data-compressing the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
  • 7. The method of generating electron-beam data according to claim 2 wherein converting format includes format-converting data of the layout pattern for respective fabrication processes by assigning the format-converting to respective processing circuits.
  • 8. The method of generating electron-beam data according to claim 1 wherein parallel processing includes data-compressing the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
  • 9. The method of generating electron-beam data according to claim 8 wherein converting format includes format-converting data of the layout pattern for respective fabrication processes by assigning the format-converting to respective processing circuits.
  • 10. The method of generating electron-beam data according to claim 1 wherein converting format includes format-converting data of the layout pattern for respective fabrication processes by assigning the format-converting to respective processing circuits.
Priority Claims (1)
Number Date Country Kind
9-138980 May 1997 JP
Parent Case Info

This disclosure is a divisional of patent application Ser. No. 08/975,164, filed on Nov. 20, 1997 now U.S. Pat. No. 6,056,785.

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5251140 Chung et al. Oct 1993
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5432714 Chung et al. Jul 1995
5546319 Satoh et al. Aug 1996
5812412 Moriizumi et al. Sep 1998
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Number Date Country
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2139911 May 1990 JP
8137086 May 1996 JP