1. Field of the Invention
The present invention relates to movable body apparatuses, exposure apparatuses, exposure methods and device manufacturing methods, and more particularly to a movable body apparatus equipped with a movable body that moves along a predetermined two-dimensional plane, an exposure apparatus equipped with the movable body apparatus, an exposure method of exposing an object by irradiating the object with an energy beam, and a device manufacturing method that uses the exposure apparatus or the exposure method.
2. Description of the Background Art
Conventionally, in a lithography process for manufacturing electron devices (microdevices) such as liquid crystal display elements or semiconductor devices (integrated circuits or the like), an exposure apparatus such as a projection exposure apparatus by a step-and-repeat method (a so-called stepper), or a projection exposure apparatus by a step-and-scan method (a so-called scanning stepper, which is also called a scanner) is used.
In recent years, however, a substrate that is subject to exposure in an exposure apparatus (especially, a glass plate that is subject to exposure in a liquid crystal exposure apparatus) has tended to increasingly grow in size, and in the exposure apparatus as well, a size of a substrate table that holds the substrate has increased, and position control of the substrate becomes difficult owing to the weight increase accompanying the size increase. As the solution to solve such a problem, an exposure apparatus has been developed in which the empty weight of a substrate table is supported with an empty-weight cancelling device (empty-weight canceller) made up of a columnar member (e.g., refer to PCT International Publication No. 2008/129762 and the corresponding U.S. Patent Application Publication No. 2010/0018950, and the like).
In this type of the exposure apparatus, the empty-weight cancelling device moves integrally with the substrate table along the upper surface (guide surface) of a surface plate that is formed by, for example, stone.
However, in order to drive a substrate, which has grown in size, with a long stroke along a two-dimensional plane parallel to a horizontal plane, it is necessary to increase the size of the surface plate having the guide surface used when the empty-weight cancelling device moves, and therefore, the machining, the transportation and the like of the surface plate become difficult.
Further, in the exposure apparatus described in PCT International Publication No. 2008/129762, in order to integrally move the empty-weight cancelling device and the substrate table along the two-dimensional plane, the empty-weight cancelling device and a part of a stage device that includes the substrate table are mechanically coupled. Therefore, the measures to restrain vibration from being transmitted from the outside via the stage device needs to be taken with respect to the empty-weight cancelling device.
According to a first aspect of the present invention, there is provided a first movable body apparatus, comprising: a first movable body that is movable along a two-dimensional plane that includes a first axis and a second axis orthogonal to each other; an empty-weight supporting member that supports an empty weight of the first movable body, and moves along a plane parallel to the two-dimensional plane integrally with the first movable body within a predetermined range; and a movable support member arranged extending in a direction parallel to the first axis at least within the predetermined range, which supports the empty-weight supporting member and moves integrally with the empty-weight supporting member in a direction parallel to the second axis.
With this apparatus, since the movable support member is arranged extending in the direction parallel to the first axis, the movable support member can support the empty-weight supporting member even if the empty-weight supporting member moves in the direction parallel to the first axis. Further, when the empty-weight supporting member moves in the direction parallel to the second axis, the movable support member moves integrally with the empty-weight supporting member in the direction parallel to the second axis, and therefore, the movable support member can support the empty-weight supporting member even in the case when the empty-weight supporting member moves in the direction parallel to the second axis (which also includes the case when such movement is accompanied by movement in the direction parallel to the first axis). Accordingly, a member (e.g. a surface plate) having a guide surface that is large enough to cover a movement range of the empty-weight supporting member so as to support the empty-weight supporting member does not have to be provided.
According to a second aspect of the present invention, there is provided a second movable body apparatus, comprising: a first movable body that is movable along a two-dimensional plane that includes a first axis and a second axis orthogonal to each other; a second movable body that supports the first movable body, and drives the first movable body along a plane parallel to the two-dimensional plane by moving along a plane parallel to the two-dimensional plane within a predetermined range; an empty-weight supporting member that supports an empty weight of the first movable body, and moves along a plane parallel to the two-dimensional plane integrally with the second movable body; and a static gas bearing that blows out a gas to between the second movable body and the empty-weight supporting member, wherein the second movable body presses the empty-weight supporting member in a noncontact manner via the gas blown out from the static gas bearing when the second movable body moves along the plane parallel to the two-dimensional plane.
With this apparatus, the empty-weight supporting member moves along the plane parallel to the two-dimensional plane integrally with the second movable body by being pressed by the second movable body via the gas blown out from the static gas bearing. Accordingly, vibration from the second movable body or the like (disturbance) does not travel to the empty-weight supporting member and the empty-weight supporting member can stably support the first movable body.
According to a third aspect of the present invention, there is provided a first exposure apparatus to expose an object by irradiating the object with an energy beam, the apparatus comprising: one of the first and second movable body apparatuses of the present invention in which the object is held by the first movable body; and a patterning device that irradiates the object mounted on the first movable body with the energy beam.
According to a fourth aspect of the present invention, there is provided a device manufacturing method, comprising: exposing an object using the first exposure apparatus of the present invention; and developing the object that has been exposed.
According to a fifth aspect of the present invention, there is provided a first exposure method of exposing an object by irradiating the object with an energy beam, the method comprising: driving a first movable body that holds the object, along a two-dimensional plane that includes a first axis and a second axis orthogonal to each other, within a predetermined range in the two-dimensional plane; causing an empty-weight supporting member to move along a plane parallel to the two-dimensional plane integrally with the first movable body, the empty-weight supporting member supporting an empty weight of the first movable body; driving a movable support member integrally with the empty-weight supporting member in a direction parallel to the second axis, the movable support member being arranged extending in a direction parallel to the first axis at least within the predetermined range and supporting the empty-weight supporting member; and irradiating the object with the energy beam.
With this method, since the movable support member is arranged extending in the direction parallel to the first axis, the movable support member can support the empty-weight supporting member even if the empty-weight supporting member moves in the direction parallel to the first axis. Further, when the empty-weight supporting member moves in the direction parallel to the second axis, the movable support member moves integrally with, the empty-weight supporting member in the direction parallel to the second axis, and therefore, the movable support member can support the empty-weight supporting member even in the case when the empty-weight supporting member moves in the direction parallel to the second axis (which also includes the case when such movement is accompanied by movement in the direction parallel to the first axis). Accordingly, a member (e.g. a surface plate) having a guide surface that is large enough to cover a movement range of the empty-weight supporting member so as to support the empty-weight supporting member does not have to be provided.
According to a sixth aspect of the present invention, there is provided a second exposure method of exposing an object by irradiating the object with an energy beam, the method comprising: driving a first movable body that holds the object along a plane parallel to a predetermined two-dimensional plane using a second movable body that is movable along a plane parallel to the two-dimensional plane; causing an empty-weight supporting member that supports an empty weight of the first movable body to move along a plane parallel to the two-dimensional plane integrally with the second movable body; causing the second movable body to press the empty-weight supporting member in a noncantact manner via a gas blown out from a static gas bearing to between the second movable body and the empty-weight supporting member, when the second movable body moves along the plane parallel to the two-dimensional plane; and irradiating the object with the energy beam.
With this method, the empty-weight supporting member moves along the plane parallel to the two-dimensional plane integrally with the second movable body by being pressed by the second movable body via the gas blown out from the static gas bearing. Accordingly, vibration from the second movable body or the like (disturbance) does not travel to the empty-weight supporting member and the empty-weight supporting member can stably support the first movable body.
According to a seventh aspect of the present invention, there is provided a device manufacturing method, comprising: exposing an object using one of the first and second exposure methods of the present invention; and developing the object that has been exposed.
According to an eighth aspect of the present invention, there is provided a second exposure apparatus to expose an object by irradiating the object with an energy beam, the apparatus comprising: a first stage that is movable along a two-dimensional plane that includes a first axis and a second axis orthogonal to each other, while holding the object; an empty-weight supporting member that supports an empty weight of the first stage, and moves along a plane parallel to the two-dimensional plane integrally with the first stage within a predetermined range; a movable support member arranged extending in a direction parallel to the first axis at least within the predetermined range, which supports the empty-weight supporting member and moves integrally with the empty-weight supporting member in a direction parallel to the second axis; and a patterning device that irradiates the object held by the first stage with the energy beam.
With this apparatus, since the movable support member is arranged extending in the direction parallel to the first axis, the movable support member can support the empty-weight supporting member even if the empty-weight supporting member moves in the direction parallel to the first axis. Further, when the empty-weight supporting member moves in the direction parallel to the second axis, the movable support member moves integrally with the empty-weight supporting member in the direction parallel to the second axis, and therefore, the movable support member can support the empty-weight supporting member even in the case when the empty-weight supporting member moves in the direction parallel to the second axis (which also includes the case when such movement is accompanied by movement in the direction parallel to the first axis). Accordingly, a member (e.g. a surface plate) having a guide surface that is large enough to cover a movement range of the empty-weight supporting member so as to support the empty-weight supporting member does not have to be provided.
According to a ninth aspect of the present invention, there is provided a third exposure apparatus to expose an object by irradiating the object with an energy beam, the apparatus comprising: a first stage that is movable along a two-dimensional plane that includes a first axis and a second axis orthogonal to each other, while holding the object; a second stage that supports the first stage, and drives the first stage along a plane parallel to the two-dimensional plane by moving along a plane parallel to the two-dimensional plane within a predetermined range; an empty-weight supporting member that supports an empty weight of the first stage, and moves along a plane parallel to the two-dimensional plane integrally with the second stage; a static gas bearing that blows out a gas to between the second stage and the empty-weight supporting member; and a patterning device that irradiates the object held by the first stage with the energy beam, wherein the second stage presses the empty-weight supporting member in a noncontact manner via the gas blown out from the static gas bearing, when the second stage moves along the plane parallel to the two-dimensional plane.
With this apparatus, the empty-weight supporting member moves along the plane parallel to the two-dimensional plane integrally with the second stage by being pressed by the second stage via the gas blown out from the static gas bearing. Accordingly, vibration from the second stage or the like (disturbance) does not travel to the empty-weight supporting member and the empty-weight supporting member can stably support the first stage.
According to a tenth aspect of the present invention, there is provided a device manufacturing method, comprising: exposing a substrate using any one of the first to third exposure apparatuses of the present invention; and developing the substrate that has been exposed.
In this case, there is provided a manufacturing method of manufacturing a flat-panel display as a device by using, as the substrate, a substrate for a flat-panel display. The substrate for a flat-panel display includes a film-like member or the like, besides a glass substrate or the like.
In the accompanying drawings;
An embodiment of the present invention is described below, with reference to
As shown in
Illumination system IOP is configured similar to the illumination system that is disclosed in, for example, U.S. Pat. No. 6,552,775 and the like. More specifically, illumination system IOP irradiates mask M with a light emitted from a mercury lamp (not illustrated), as an illumination light for exposure (illumination light) IL, via a reflection mirror, a dichroic mirror, a shutter, a wavelength selecting filter, various types of lenses and the like, which are not illustrated. As illumination light IL, for example, a light such as an i-line (with a wavelength of 365 nm), a g-line (with a wavelength of 436 nm) or an h-line (with a wavelength of 405 nm) (or a synthetic light of the i-line, the g-line and the h-line described above) is used. Further, the wavelength of illumination light IL can be appropriately switched by the wavelength selecting filter according to the required resolution. Incidentally, the light source is not limited to an ultrahigh pressure mercury lamp, but for example, a pulsed laser light source such as an excimer laser, or a solid state laser device or the like can also be used.
On mask stage MST, mask M having a pattern surface (the lower surface in
Positional information (including rotational information in the θz direction) of mask stage MST within the XY plane is constantly measured at a resolution of, for example, around 0.5 to 1 nm with a mask laser interferometer (hereinafter, referred to as a “mask interferometer”) 91, via a reflection surface fixed (or formed) on mask stage MST. The measurement values of mask interferometer 91 are sent to a main controller (the illustration is omitted) that performs the overall control of the respective elements constituting liquid crystal exposure apparatus 10, and the main controller controls the position (and the speed) of mask stage MST in the X-axis direction, the Y-axis direction and the θz direction via the mask stage driving system, based on the measurement values of mask interferometer 91.
Projection optical system PL is supported below mask stage MST in
Therefore, when an illumination area on mask M is illuminated with illumination light IL from illumination system IOP, by illumination light IL that has passed through mask M whose pattern surface is placed substantially coincident with the first plane (object plane) of projection optical system PL, a projected image (partial erected image) of a circuit pattern of mask M within the illumination area is formed on an irradiation area (exposure area) of illumination light IL that is conjugate to the illumination area, on substrate P which is placed on the second plane (image plane) side of projection optical system PL and whose surface is coated with a resist (sensitive agent), via projection optical system PL. Then, by moving mask M relative to the illumination area (illumination light IL) in the scanning direction (X-axis direction) and also moving substrate P relative to the exposure area (illumination light IL) in the scanning direction (X-axis direction) by synchronous drive of mask stage MST and fine movement stage 21, scanning exposure of one shot area (divided area) on substrate P is performed, and a pattern of mask M is transferred onto the shot area. More specifically, in the embodiment, a pattern of mask M is generated on substrate P by illumination system IOP and projection optical system PL, and the pattern is formed on substrate P by exposure of a sensitive layer (resist layer) on substrate P with illumination light IL.
As disclosed in, for example, U.S. Patent Application Publication No. 2008/0030702 and the like, body BD has substrate stage mountings 33 and barrel surface plate 31 that is horizontally supported via support members 32 placed on substrate stage mountings 33. As can be seen from
As shown in
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Each of the pair of X guides 12 is a columnar (bar-like) member having a rectangular sectional shape that is formed by, for example, stone and has its longitudinal direction in the X-axis direction, and X guides 12 are placed on the inner side of the pair of base frames 14, in a state of being installed over the two substrate stage mountings 33. The upper surface of each of the pair of X guides 12 is made to be parallel to the XY plane and is finished so as to have a very high flatness degree.
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With the configuration as described above, in substrate stage device PST, fine movement stage 21 (i.e. substrate P) is movable (coarsely movable) with a long stroke in the two axes e. X-axis and Y-axis) directions, and also is movable (finely movable) with a minute stroke in directions of six degrees of freedom (the X-axis, Y-axis and Z-axis directions and the θx, θy and θz directions). Incidentally, in the embodiment, while the X-axis VCMs and the Y-axis VCMs are each the voice coil motor by a moving magnet type in which the mover has the magnetic unit, this is not intended to be limiting, and for example, the X-axis VCMs and the Y-axis VCMs can each be a voice coil motor by a moving coil type in which a mover has a coil unit. Further, while the Z-axis VCMs in the embodiment are each the voice coil motor by a moving coil type in which the mover has the coil unit, this is not intended to be limiting, and for example, the Z-axis VCMs can each be a voice coil motor by a moving magnet type in which a mover has a magnetic unit. Further, the drive method can be a drive method other than the Lorentz force drive method. Similarly, each of the linear motors such as the X-linear motor and the Y-linear motor described above, which exposure apparatus 10 is equipped with, can be of either the moving magnet type or the moving coil type, and the drive method of each of the linear motors is not limited to the Lorentz force drive method, but can be another drive method such as a variable magnetoresistance drive method.
Empty-weight cancelling device 60 (which is also referred to as a central pillar) is a member that supports the empty weight of a system including at least fine movement stage 21 (to be more specific, a system composed of fine movement stage 21, substrate holder PH, movable mirrors 22X and 22Y, fixed members 24X and 24Y, and the like, in the embodiment), and is made up of a columnar member arranged extending in the Z-axis direction, and as shown in
Housing 61 is made up of a cylinder-like member having a bottom whose +Z side is opened. As can be seen from
Air spring 62 is housed in the lowermost section within housing 61. A gas (e.g, air) is supplied from a gas supplying device, which is not illustrated, to air spring 62, which causes the inside of air spring 62 to be set to a positive pressure space whose atmospheric pressure is higher compared with the outside. Empty-weight cancelling device 60 reduces the burden on Z-axis VCMs 55Z by air spring 62 absorbing (cancelling) the empty weight of fine movement stage 21, in a state of supporting fine movement stage 21. Further, air spring 62 also functions as a Z-axis air actuator that drives fine movement stage 21 (i.e. substrate P) in the Z-axis direction with a long stroke by the change of its inner pressure. Instead of air spring 62, a damper also serving as an actuator (e.g. a shock absorber corresponds thereto) that can absorb (cancel) the empty weight of fine movement stage 21 in a state of supporting fine movement stage 21 and can also drive fine movement stage 21 in the Z-axis direction can be used. In this case, a spring by another method such as a bellows method or a hydraulic method can be used.
Slide section 63 is a cylinder-like member housed inside housing 61. On the inner side of the peripheral wall of housing 61, a plurality of air bearing 66 are attached and form a guide used when slide section 63 moves in the Z-axis direction. An air bearing 67 (which is also referred to as a ceiling pad) whose bearing surface faces the +Z direction is attached on the upper surface of slide section 63, and supports a leveling device 80 by levitation.
Leveling device 80 is a member that supports a support subject (a system made up of fine movement stage 21, substrate holder PH, movable mirrors 22X and 22Y, fixed members 24X and 24Y and the like), supported by empty-weight cancelling device 60, such that the support subject can be tilted in the θx and θy directions with a gravity center position CG1 of the support subject serving as the center, and as shown in
Leveling cup 81 is supported in a noncontact manner above slide section 63 by the static pressure of a gas blown out from air bearing 67, for example, a high-pressure gas. Further, each of a plurality of air bearings 83 is capable of blowing out a high-pressure gas, for example, air, supplied from a gas supplying device that is not illustrated, to each of the side surfaces (tilted surfaces) of polyhedral member 21a. Therefore, polyhedral member 21a (i.e. a system composed of fine movement stage 21 and the like) is supported in a noncontact manner above by leveling cup 81 in a state where a predetermined clearance is formed between polyhedral member 21a and each air bearing 83, owing to the static pressure of the gas blown out from each air bearing 83. Further, since each air bearing 83 is attached to leveling cup 81 via ball joint 82, fine movement stage 21 is capable of freely oscillating (tilting) in the θx and θy directions in a state where the above-described clearance is maintained. Incidentally, the detailed configurations of empty-weight cancelling device 60, the Z sensors, leveling device 80 and the like are disclosed in, for example, PCT International Publication No. 2008/129762 (the corresponding U.S. Patent Application Publication No. 2010/0018950) and the like.
Next, a coupling structure between empty-weight cancelling device 60 and Y coarse movement stage 23Y, which is used to move empty-weight cancelling device 60 and Y coarse movement stage 23Y in conjunction in the X-axis direction and the Y-axis direction, is described.
As shown in
Air bearings 84a and 86a blow out a high-pressure gas supplied from a gas supplying device that is not illustrated, for example, air to pressed members 89a and 89b respectively, air bearings 84b and 86b blow out the gas to the side surfaces on the −Y side of coupling members 81a and 81b respectively, and air bearings 84c and 86c blow out the gas to the side surfaces on the +Y side of coupling members 81a and 81b respectively. When Y coarse movement stage 23Y moves in the +Y direction (or the −Y direction) on X coarse movement stage 23X, empty-weight cancelling device 60 is pressed by Y coarse movement stage 23Y in a noncontact state, owing to the static pressure of the gas blown out to between air bearing 84b (or 84c) and coupling member 81a and the static pressure of the gas blown out to between air bearing 86b (or 86c) and coupling member 81b, and accordingly empty-weight cancelling device 60 moves in the +Y direction (or the −Y direction) integrally with Y coarse movement stage 23Y. Further, when Y coarse movement stage 23Y moves in the −X direction (or the +X direction) because X coarse movement stage 23X moves in the X-axis direction on base frames 14, empty-weight cancelling device 60 is pressed by Y coarse movement stage 23Y in a noncontact state, owing to the static pressure of the gas blown out to between air bearing 84a and pressed member 89a (or air bearing 86a and pressed member 89b) and accordingly empty-weight cancelling device 60 moves in the −X direction (or the −+X direction) integrally with Y coarse movement stage 23Y and X coarse movement stage 23X.
As described above, while movement in the Z-axis direction of empty-weight cancelling device 60 is not restricted with respect to Y coarse movement stage 23Y, empty-weight cancelling device 60 moves in the X-axis direction and the Y-axis direction integrally with Y coarse movement stage 23Y, by being pressed by a plurality of air bearings 84a to 84c and 86a to 86c. And, the plurality of air bearings 84a to 84c and 86a to 86c are placed such that the pressing forces used when pressing empty-weight cancelling device 60 act on coupling members 81a and 82a and pressed members 89a and 89b within a plane parallel to the XY plane that includes a gravity center position CG2 (see
Next, a configuration of Y beam 70 that supports empty-weight cancelling device 60 is described. As can be seen from
Further, on the lower surface of the end on the −Y side of Y beam 70, as shown in
Each of air bearings 73a and 73b blows out a high-pressure gas (e.g. air) supplied from a gas supplying device that is not illustrated, to the upper surface (the guide surface) of X guides 12. Y beam 70 is supported by levitation in a noncontact manner above the pair of X guides 12, by the static pressure of the gas blown out from air bearings 73a and 73b. Further, air bearings 73a and 73b respectively blow out a high-pressure gas (e.g. air) supplied from a gas supplying device that is not illustrated, to the surfaces on both sides of X guide 12 on the −Y side, and restricts relative movement of Y beam 70 in the Y-axis direction with respect to X guide 12 by the static pressure of the gas. Accordingly, Y beam 70 can move straight only in the X-axis direction above the pair of X guides 12. Incidentally, the placement of the air bearings to restrict the relative movement of the Y beam in the Y-axis direction with respect to the X guides is not limited to the above-described placement, but for example, a pair of air bearings can be placed such that their bearing surfaces are respectively opposed to the inner side surfaces of a pair of the X guides that are opposed to each other (or to the outer side surfaces of the pair of the X guides).
On the upper surface of Y beam 70, as can be seen from
Further, X coarse movement stage 23X and Y beam 70 are coupled such that Y beam 70 moves integrally with empty-weight cancelling device 60 in the X-axis direction when empty-weight cancelling device 60 is driven in the X-axis direction by X coarse movement stage 23X. In the description below, a coupling structure between X coarse movement stage 23X and Y beam 70 is described.
As shown in
Air bearings 44a and 46a respectively blow out a high-pressure gas (e,g. air) supplied from a gas supplying device that is not illustrated to the side surfaces on the +X side of coupling members 41a and 41b, and air bearings 44b and 46b respectively blow out the gas to the side surfaces on the −X side of coupling members 41a and 41b. When X coarse movement stage 23X moves in the −X direction (or the +X direction) on base frames 14, Y beam 70 is pressed in a noncontact mariner by X coarse movement stage 23X (see
As described above, while movement in the Z-axis direction of Y beam 70 is not restricted with respect to X coarse movement stage 23X, Y beam 70 moves in the X-axis direction integrally with X coarse movement stage 23X by being pressed by X coarse movement stage 23X via the gas blown out from a plurality of air bearings 44a, 44b, 46a and 46b. And, the plurality of air bearings 44a, 44b, 46a and 46b (see
In liquid crystal exposure apparatus 10 configured as described above, under control of the main controller that is not illustrated, mask M is loaded onto mask stage MST by a mask loader that is not illustrated and substrate P is loaded onto substrate holder PH on fine movement stage 21 by a substrate loader that is not illustrated. After that, the main controller executes alignment measurement using an alignment detection system that is not illustrated, and after the alignment measurement is completed, an exposure operation by a step-and-scan method is performed. Since this exposure operation is similar to the step-and-scan method that has conventionally been performed, the description thereabout is omitted.
As described above, in substrate stage device PST that liquid crystal exposure apparatus 10 of the embodiment has, when X coarse movement stage 23X moves in the X-axis direction, Y coarse movement stage 23Y, empty-weight cancelling device 60 and Y beam 70 move in the X-axis direction integrally with X coarse movement stage 23X, and when Y coarse movement stage 23Y moves in the Y-axis direction on X coarse movement stage 23X, empty-weight cancelling device 60 moves in the Y-axis direction integrally with Y coarse movement stage 23Y on Y beam 70. Since Y beam 70 is a stringer-like member arranged extending in the Y-axis direction and the upper surface of Y beam 70 covers the movement range of empty-weight cancelling device 60 in the Y-axis direction, empty-weight cancelling device 60 is constantly supported by Y beam 70 regardless of its position. Accordingly, fine movement stage 21 (i.e. substrate P) can be guided along the XY plane with high precision, without providing a member (e.g. a surface plate or the like) that has a guide surface large enough to cover the entire movement range of empty-weight cancelling device 60 in the X-axis and Y-axis directions.
Further, since X guides 12 are made up of a pair of columnar (bar-like) members each having a size in the width direction and a size in the height direction that are shorter than a size in the longitudinal direction, the materials (e.g. stone materials) can be secured without difficulty, and also the machining and the carriage can be performed without difficulty. Further, since the width size of Y beam 70 is set to around the same as the outer size of empty-weight cancelling device 60, the weight of liquid crystal exposure apparatus 10 can be reduced, compared with the case where a surface plate or the like that can cover the movement range of empty-weight cancelling device 60 is provided.
Further, since empty-weight cancelling device 60 and Y coarse movement stage 23Y are coupled in a noncontact manner, the vibration (disturbance) can be restrained from being transmitted from the outside to empty-weight cancelling device 60 via Y coarse movement stage 23Y. Further, since Y beam 70 and X coarse movement stage 23X are coupled in a noncontact manner, the vibration (disturbance) can be restrained from being transmitted from the outside to empty-weight cancelling device 60 via X coarse movement stage 23X and Y beam 70. Further, since Y beam 70 is levitated above X guides 12, the vibration can be restrained from being transmitted from the outside to a system composed of Y beam 70 and empty-weight cancelling device 60 via substrate stage mountings 33 and the like.
Incidentally, while the both ends of Y beam 70 in the longitudinal direction are supported by the pair of X guides 12 in the embodiment above, an intermediate portion (which may be at a plurality of positions) in the longitudinal direction of Y beam 70, for example, can also be supported by a member similar to the X guide, along with the support of the both ends (i.e., three or more of the members corresponding to the X-guide can be arranged). In this case, a member (e.g. a tabular member) having a lower stiffness than the Y beam of the embodiment can be used in place of the Y beam.
Further, the empty-weight cancelling device can be supported in a noncontact manner above the Y beam via an air bearing and the like. In this case, since the vibration is restrained from being transmitted to the empty-weight cancelling device via the Y beam, the Y beam can be supported on the X guides in a contact manner via rolling bearings and the like. Further, a configuration can be employed in which the empty-weight cancelling device is supported above the Y beam in a noncontact manner and also the Y beam is supported above the X guides in a noncontact manner similar to the embodiment above. Further, in the embodiment above, the Y beam is supported by levitation above the X guides via a predetermined clearance owing to the stiffness of the gas membrane formed by the high-pressure gas blown out from the air bearings, but this is not intended to be limiting, and the Y beam can be levitated above the X guides, for example, in a magnetic method.
Further, the coupling structure used to integrally move empty-weight cancelling device 60 and Y coarse movement stage 23Y and the coupling structure used to integrally move Y beam 70 and X coarse movement stage 23X are not limited to those described above in the embodiment above, but can appropriately be changed. For example, by using a coupling structure in which a thrust is transmitted only in one axial direction like the coupling structure between Y beam 70 and X coarse movement stage 23X, the +X side, the −X side, the +Y side and the −Y side of the empty-weight cancelling device and the Y coarse movement stage can be coupled. Further, by using a coupling structure in which a thrust is transmitted in two axial directions like the coupling structure between empty-weight cancelling device 60 and Y coarse movement stage 23Y, Y beam 70 and X coarse movement stage 23X can be coupled (in the embodiment above, air bearings 73c and 73d that restrict the movement of the Y beam in the Y-axis direction become unnecessary). Besides, the number, the placement and the like of the air bearings can appropriately be changed, and the point is that between empty-weight cancelling device 60 and Y coarse movement stage 23Y, the thrust should be transmitted, in a noncontact manner, in the orthogonal two axial directions which are the X-axis direction and the Y-axis direction, and between Y beam 70 and X coarse movement stage 23X, the thrust should be transmitted in a noncontact manner in the X-axis direction while the position of Y beam 70 in the Y--axis direction is restricted in a noncontact manner.
Further, in the embodiment above, X beam 70 and X coarse movement stage 23X, and empty-weight cancelling device 60 and Y coarse movement stage 23Y are respectively coupled in a noncontact manner via a plurality of air bearings. In the embodiment above, however, the Y beam and the X coarse movement stage, and the empty-weight cancelling device and the Y coarse movement stage can be mechanically coupled, respectively, using a member like the flexure that is disclosed in, for example, PCT International Publication No. 2008/129762 the corresponding U.S. Patent Application Publication No. 2010/0018950) and the like.
Further, in the embodiment above, while the configuration is employed in which the relative movement of Y beam 70 in the X-axis direction is restricted by the air bearings that blow out the high-pressure gas to X guides 12, this is not intended to be limiting, and for example, a configuration can be employed in which the relative movement of Y beam 70 in the X-axis direction is restricted by the air bearings that blow out the high-pressure gas to the X coarse movement stage. Further, the shape of a member (which is the Y beam in the embodiment above) that supports the empty-weight cancelling device is not limited the shape (the stringer-like member) in the embodiment above, but can be another shape (e.g. a tabular shape).
Further, in the embodiment above, while the Y beam is configured to be driven by the X coarse movement stage, the drive method of the Y beam is not limited thereto as far as the Y coarse movement stage and the X coarse movement stage are configured to integrally move in the X-axis direction, and for example, an actuator for exclusive use (e.g. a linear motor or the like) can be used. Further, in the embodiment above, while the empty-weight cancelling device is configured to be driven by the Y coarse movement stage, the drive method of the empty-weight cancelling device is not limited thereto as far as the empty-weight cancelling device and the Y coarse movement stage are configured to integrally move along the XY plane, and for example, an actuator for exclusive use (e.g. a liner motor or the like) can be used.
Further, the illumination light can be ultraviolet light, such as ArF excimer laser light (with a wavelength of 193 nm) and KrF excimer laser light (with a wavelength of 248 nm), or vacuum ultraviolet light such as F2 laser light (with a wavelength of 157 nm). Further, as the illumination light, for example, a harmonic wave, which is obtained by amplifying a single-wavelength laser light in the infrared or visible range emitted by a DFB semiconductor laser or fiber laser with a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium), and by converting the wavelength into ultraviolet light using a nonlinear optical crystal, can also be used. Further, solid state laser (with a wavelength of 355 nm, 266 nm) or the like can also be used.
Further, in the embodiment above, while the case has been described where projection optical system PL is a projection optical system by a multi-lens method that is equipped with a plurality of projection optical units, the number of the projection optical units is not limited thereto, and there should be one or more projection optical units. Further, projection optical system PL is not limited to the projection optical system by a multi-lens method, but for example, can be a projection optical system that uses a large-size mirror of the Offner type.
Further, in the embodiment above, while the case has been described where the projection optical system whose projection magnification is an equal magnification is used as projection optical system PL, this is not intended to be limiting, and the projection optical system can be either of a reduction system or a magnifying system.
Further, in the embodiment above, a light transmissive type mask is used, which is obtained by forming a predetermined light-shielding pattern (or a phase pattern or a light-attenuation pattern) on a light transmissive mask substrate. Instead of this mask, however, as disclosed in, for example, U.S. Pat. No. 6,778,257, an electron mask (a variable shaped mask) on which a light-transmitting pattern, a reflection pattern, or an emission pattern is formed according to electronic data of the pattern that is to be exposed, for example, a variable shaped mask that uses a DMD (Digital Micromirror Device) that is a type of a non-emission type image display element (which is also called a spatial light modulator) can also be used.
Incidentally, it is especially effective to apply the exposure apparatus of the embodiment above to an exposure apparatus in which a substrate with a size (which includes at least one of an outer diameter, a diagonal line and a side) not less than 500 mm, for example, a large substrate for a flat-panel display (FPD), such as a liquid crystal display element, is exposed. This is because the exposure apparatus of the embodiment above has been configured so as to cope with the increase in size of substrates.
Incidentally, in the embodiment above, while the case has been described where the present invention is applied to a projection exposure apparatus that performs scanning type exposure that is accompanied by a step-and-scan operation of the plate, this is not intended to be limiting, and the exposure apparatus of the embodiment above can also be an exposure apparatus by a proximity method that does not use any projection optical systems. Further, the exposure apparatus of the embodiment above can also be an exposure apparatus by a step-and-repeat method (a so-called stepper) or an exposure apparatus by a step-and-stitch method, or the like.
Further, the use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal display elements in which a liquid crystal display element pattern is transferred onto a rectangular glass plate, but the present invention can also be widely applied, for example, to an exposure apparatus for manufacturing semiconductors, and an exposure apparatus for producing thin-film magnetic heads, micromachines, DNA chips, and the like. Further, the present invention can be applied not only to an exposure apparatus for producing microdevices such as semiconductor devices, but can also be applied to an exposure apparatus in which a circuit pattern is transferred onto a glass substrate, a silicon wafer or the like to produce a mask or a reticle used in a light exposure apparatus, an EUV exposure apparatus, an X-ray exposure apparatus, an electron-beam exposure apparatus, and the like. Incidentally, an object that is subject to exposure is not limited to a glass plate, but for example, can be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. Further, the present invention can also be applied to an exposure apparatus such as a liquid immersion type exposure apparatus in which a space between a projection optical system and a wafer is filled with a liquid, which is disclosed in, for example, U.S. Patent Application Publication No. 2005/0259234 and the like, as an exposure apparatus to transfer a circuit pattern onto a silicon wafer or the like.
Further, as disclosed in, for example, POT International Publication No. 2001/035168, the present invention can also be applied to an exposure apparatus (a lithography system) in which line-and-space patterns are formed on a wafer by forming interference fringes on the wafer.
Incidentally, the present invention can be applied not only to the exposure apparatus but also to, for example, an element manufacturing apparatus equipped with a functional liquid deposition device by an ink-jet method.
Incidentally, the above disclosures of all the publications, the PCT International Publications, and the U.S. Patent Application Publications, and the U.S. patents that are cited in the description above and related to exposure apparatuses and the like are each incorporated herein by reference.
Device Manufacturing Method
A manufacturing method of a microdevice that uses exposure apparatus 10 of the embodiment above in a lithography process is described next. In exposure apparatus 10 of the embodiment above, a liquid crystal display element as a microdevice can be obtained by forming a predetermined pattern (such as a circuit pattern or an electrode pattern) on a plate (a glass substrate).
Pattern Forming Process
First of all, a so-called optical lithography process in which a pattern image is formed on a photosensitive substrate (such as a glass substrate coated with a resist) is executed using exposure apparatus 10 described above. In this optical lithography process, a predetermined pattern that includes many electrodes and the like is formed on the photosensitive substrate. After that, the exposed substrate undergoes the respective processes such as a development process, an etching process and a resist removing process, and thereby the predetermined pattern is formed on the substrate.
Color Filter Forming Process
Next, a color filter in which many sets of three dots corresponding to R (Red), G (Green) and B (blue) are disposed in a matrix shape, or a color filter in which a plurality of sets of filters of three stripes of R, G and B are disposed in horizontal scanning line directions is formed.
Cell Assembling Process
Next, a liquid crystal panel (a liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming process, the color filter obtained in the color filter forming process, and the like. For example, a liquid crystal panel (a liquid crystal cell) is manufactured by injecting liquid crystal between the substrate having the predetermined pattern obtained in the pattern forming process and the color filter obtained in the color filter forming process.
Module Assembling Process
After that, a liquid crystal display element is completed by attaching respective components such as an electric circuit that causes a display operation of the assembled liquid crystal panel (liquid crystal cell) to be performed, and a backlight.
In this case, since exposure of the plate is performed with high throughput and high precision using the exposure apparatus of the embodiment above in the pattern forming process, the productivity of liquid crystal display elements can be improved as a consequence.
While the above-described embodiment of the present invention is the presently preferred embodiment thereof, those skilled in the art of lithography systems will readily recognize that numerous additions, modifications, and substitutions may be made to the above-described embodiment without departing from the spirit and scope thereof. It is intended that all such modifications, additions, and substitutions fall within the scope of the present invention, which is best defined by the claims appended below.
Number | Date | Country | Kind |
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2009-102714 | Apr 2009 | JP | national |
This non-provisional application claims the benefit of Provisional Application No. 61/213,027 filed Apr. 29, 2009, the disclosure of which is hereby incorporated herein by reference in its entirety.
Number | Date | Country | |
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61213027 | Apr 2009 | US |