Number | Name | Date | Kind |
---|---|---|---|
4779004 | Tew et al. | Oct 1988 | A |
5710407 | Moore et al. | Jan 1998 | A |
5733711 | Juengling | Mar 1998 | A |
5852497 | Pramanik et al. | Dec 1998 | A |
5923996 | Shih et al. | Jul 1999 | A |
5982044 | Lin et al. | Nov 1999 | A |
6037671 | Kepler et al. | Mar 2000 | A |
6417076 | Holscher et al. | Jul 2002 | B1 |
Entry |
---|
Jeffrey P. Hebb and Klavs F. Jensen, The Effect of Patterns on Thermal Sress During Rapid Thermal Processing of Silicon Wafer, IEEE Transaction on Semiconductor Manufacturing, vol. II, No. 1, Feb. 1998. |