Claims
- 1. A pattern forming material comprising a copolymer including:a first group for generating an acid through irradiation with a first energy beam having a first energy band; and a second group for generating a base through irradiation with a second energy beam having a second energy band different from said first energy band.
- 2. The pattern forming material of claim 1,wherein said first group is a group for generating sulfonic acid.
- 3. The pattern forming material of claim 1,wherein said copolymer is a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing said binary copolymer with another group: wherein R9 indicates a hydrogen atom or an alkyl group; R10 and R11 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R12 indicates a hydrogen atom or an alkyl group; R13 and R14 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.
Priority Claims (1)
Number |
Date |
Country |
Kind |
8-038100 |
Feb 1996 |
JP |
|
Parent Case Info
This application is a Divisional of application Ser. No. 09/551,656 filed Apr. 18, 2000, now U.S. Pat. No. 6,306,556 B1 which is a Divisional of application Ser. No. 09/326,541 filed Jun. 7, 1999 and now U.S. Pat. No. 6,120,974, which is a Divisional of application Ser. No. 08/805,702 filed Feb. 25, 1997 and now U.S. Pat. No. 5,965,325.
US Referenced Citations (11)
Foreign Referenced Citations (18)
Number |
Date |
Country |
0 515 212 |
Nov 1992 |
EP |
0 519 128 |
Dec 1992 |
EP |
0 691 674 |
Jan 1996 |
EP |
58-93047 |
Jun 1983 |
JP |
58-93048 |
Jun 1983 |
JP |
1-124848 |
May 1989 |
JP |
1-149040 |
Jun 1989 |
JP |
1-163736 |
Jun 1989 |
JP |
2-132446 |
May 1990 |
JP |
4-25847 |
Jan 1992 |
JP |
4-142541 |
May 1992 |
JP |
4-253060 |
Sep 1992 |
JP |
6-27668 |
Feb 1994 |
JP |
6-250393 |
Sep 1994 |
JP |
7-261393 |
Oct 1995 |
JP |
8-76385 |
Mar 1996 |
JP |
8-328265 |
Dec 1996 |
JP |
9-189998 |
Jul 1997 |
JP |
Non-Patent Literature Citations (3)
Entry |
Tsunooka et al., Journal of Polymer Science, Polymer Chemistry Edition, vol. 15 (1977), pp. 107-117. |
“Photosensitive Polymers Bearing Iminooxysulfonyl Groups. A Water Soluble Positive-Type Photoresist”, by Shirai et al, Die Markomol. Chemie. Macromolecular Chemistry and Physics, vol. 90, No. 9, pp. 2099-2107 (1989). |
Shirai et al, 114:63167, Chemical Abstracts, America Chemical Society, Columbus, Ohio, Abstract of J. Appl. Polym. Sci. (1990), vol. 41, No. 9-10, pp. 2527-2532. |