Claims
- 1. A photolithography apparatus for producing a selected pattern on a nonplanar surface of a workpiece, comprising:a stage having a receiving area adapted to receive the workpiece; a mask having an inner surface adapted to receive the nonplanar surface, the mask defining at least one aperture; and a stop associated with the stage and adapted to rotationally align the workpiece with the mask.
- 2. The apparatus of claim 1, further comprising:an exposing light source adapted to illuminate the workpiece through the at least one aperture.
- 3. A photolithography apparatus for forming an offset pattern in a tubular workpiece, comprising:a stage having a hemicylindrical substrate channel adapted to receive a tubular workpiece; a hemicylindrical mask defining at least one aperture; and at least one stop associated with the stage and adapted to position the workpiece relative to the mask.
- 4. The apparatus of claim 3, further comprising:an exposing light source adapted to illuminate the workpiece through the at least one aperture.
- 5. A photolithography apparatus comprising:a stage having a surface area adapted to receive a workpiece; the workpiece rotatably received by the stage; a rigid mask having an inner surface adapted to receive the workpiece, wherein the workpiece is rotatively positionable relative to the rigid mask and the stage, the stage including at least one stop adapted to allow selective positioning of the workpiece relative to the mask; and a light source.
- 6. The apparatus of claim 5 wherein the stage includes an indicator for determining angular position of the workpiece.
- 7. The apparatus of claim 5 wherein the light source includes multiple offset light sources.
- 8. The apparatus of claim 5 further comprising a stepping motor coupled to the workpiece.
- 9. The apparatus of claim 5 wherein the stage includes a hemicylindrical channel adapted to receive a tabular workpiece.
- 10. The apparatus of claim 5, wherein the mask includes a hemicylindrical surface.
- 11. A photolithography apparatus comprising:a non-planar workpiece; a non-planar mask configured to provide a selected pattern for a portion of the non-planar workpiece; a stage including a surface area configured to receive the non-planar workpiece, wherein the workpiece is configured to be selectively rotatable relative to the non-planar mask; a stop associated with the stage and configured to rotationally align the non-planar workpiece with the non-planar mask.
- 12. The apparatus of claim 11 further comprising a light source configured to illuminate the non-planar workpiece through an at least one aperture in the non-planar mask.
- 13. The apparatus of claim 11 further comprising an indicator removably disposed within the non-planar workpiece, the indicator configured to determine angular position of the non-planar workpiece relative to the non-planar mask.
Parent Case Info
This application is a divisional of Ser. No. 09/401,634, filed on Sep. 22, 1999 now U.S. Pat. No. 6,391,502 which claims benefit of provisional application Ser. No. 60/101,526, filed on Sep. 23, 1998.
US Referenced Citations (10)
Provisional Applications (1)
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Number |
Date |
Country |
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60/101526 |
Sep 1998 |
US |