Claims
- 1. A radiation-sensitive composition comprising, based on the overall quantity of components A) and B),
- A) from 80 to 99.9% by weight of a polymer having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR6## in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen; R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl; R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen; and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ##STR7## which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50; and
- B) from 0.1 to 20% by weight of a substance which forms an acid under the action of actinic radiation.
- 2. The radiation-sensitive composition according to claim 1, wherein said polymer comprises structural repeating units of the formulae V-VIII: ##STR8## in which R.sub.1 to R.sub.10, w, x, y and z are as defined in claim 1.
- 3. The radiation-sensitive composition according to claim 1, in which the quotient Q obeys 0.15.ltoreq.Q.ltoreq.0.45.
- 4. The radiation-sensitive composition according to claim 1, in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen.
- 5. The radiation-sensitive composition according to claim 1, in which R.sub.7, R.sub.8, R.sub.9 and R.sub.10 are hydrogen.
- 6. The radiation-sensitive composition according to claim 1, in which R.sub.5 and R.sub.6 independently of one another are methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl or tert-butyl.
- 7. The radiation-sensitive composition according to claim 1, in which R.sub.5 and R.sub.6 are ethyl or tert-butyl.
- 8. The radiation-sensitive composition according to claim 1, wherein said polymer comprises, based on the total number of all structural units, 1-40% of structural units of the formulae III and IV and 60-99% of structural units of the formulae I and II.
- 9. The radiation-sensitive composition according to claim 1, wherein said polymer comprises, based on the total number of all structural units, 2-15% of structural units of the formulae III and IV and 85-98% of structural units of the formulae I and II.
- 10. The radiation-sensitive composition according to claim 1, in which the quotient Q obeys 0.15.ltoreq.Q.ltoreq.0.45; in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 are hydrogen; and wherein said polymer comprises, based on the total number of all structural units 1-40% of structural units of formulae (III) and (IV) and 60-99% of structural units of formulae (I) and (II).
- 11. The radiation-sensitive composition according to claim 2, in which the quotient Q obeys 0.20.ltoreq.Q.ltoreq.0.40; in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are hydrogen; R.sub.5 and R.sub.6 independently of one another are methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl or tert-butyl; and wherein said polymer comprises, based on the total number of all structural units, 2-15% of structural units of formulae (VII) and (VIII) and 85-98% of structural units of formulae (V) and (VI).
- 12. A radiation-sensitive composition according to claim 1, comprising, based on the overall quantity of components A) and B),
- A) from 90 to 99.8% by weight of the polymer and
- B) from 0.2 to 10% by weight of the substance which forms an acid under the action of actinic radiation.
- 13. A radiation-sensitive composition according to claim 1, comprising not only components A) and B) but also an organic solvent as component C).
- 14. A radiation-sensitive composition according to claim 1, comprising as component B) a sulfonium trifluoromethane sulfonate, nitrobenzyl sulfonate, a disulfone or an .alpha.-(sulfonyloxy)-acetophenone derivative.
- 15. A process for the production of positive images by
- I.) coating a substrate with a radiation-sensitive composition according to claim 1,
- II.) exposing the coated substrate to actinic radiation in a predetermined pattern, and
- III.) developing the exposed substrate with a developer for positive-working photoresists.
- 16. A printing plate, printed circuit or integrated circuit according to the process of claim 15.
Priority Claims (1)
Number |
Date |
Country |
Kind |
3835/94 |
Dec 1994 |
CHX |
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CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation of application Ser. No. 08/572,340 filed Dec. 14, 1995, now abandoned. That parent application is incorporated herein by reference in its entirety.
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Continuations (1)
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Number |
Date |
Country |
Parent |
572340 |
Dec 1995 |
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