Number | Name | Date | Kind |
---|---|---|---|
4211834 | Lapadula et al. | Jul 1980 | A |
4871630 | Giammarco et al. | Oct 1989 | A |
4906552 | Ngo et al. | Mar 1990 | A |
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Richard D. Coyne et al.; Resist Processes on Highly Reflective Surfaces Using Antireflection Coatings- Brewer Science, Inc.; pp. 40-51; 1983. |
Ken Harrison et al.; The Use of Antireflection Coatings for Photoresist Linewidth Control- National Semiconductor Corporation; pp. 107-111; 1983. |
Stanley Wolf and Richard N. Tauber; Silicon Processing for the VSLI Era, vol. 1—Process Technology; p. 441; 1986. |
Harry J. Levinson; Principles of Lithography; pp. 85-88 and 121-124; 2001. |