This application claims priority to Japanese Patent Application No. 2016-081246 filed on Apr. 14, 2016. The entire disclosure of Japanese Patent Application No. 2016-081246 filed on Apr. 14, 2016 is incorporated herein by reference in its entirety.
The present invention relates to a plating apparatus and a plating method.
There has been conventionally known a plating apparatus (for example, see Japanese Patent No. 3979847) which vertically places a substrate held by a substrate holder into a plating bath containing a plating solution and performs electroplating on the substrate. In such a plating apparatus, the substrate holder is stored in a stocker for storing the substrate holder before the operation of the apparatus starts. When the operation of the apparatus starts, the substrate holder is taken out of the stocker to hold a substrate such as a wafer to be processed. The substrate holder holding the substrate is transported by a substrate holder transport device to the plating bath and other treatment baths, where required plating processes are sequentially performed. For example, when a power feed failure is detected in a substrate holder, the substrate holder is returned to the stocker, and the use of the substrate holder is restricted until completion of maintenance.
In such a plating apparatus, the stocker storing the substrate holder is a part of the plating apparatus and integrated with the plating apparatus so as not to be separated from each other. Accordingly, the stocker itself storing the substrate holder cannot be taken out of the plating apparatus. Thus, when maintenance of the substrate holder stored in the stocker is needed, the substrate holder is taken out of the stocker manually or by a dedicated hoist. Alternatively, there has been used another method in which the substrate holder is transported from the stocker to a delivery bath or a service area accessible from outside in the plating apparatus and then taken out of the stocker manually or by a dedicated hoist when maintenance is needed.
In light of this, there has been proposed a plating apparatus (see Japanese Patent No. 5642517) having a wagon storing the substrate holder which can be taken out of the plating apparatus so as to be able to reduce the burden of taking such a substrate holder out of the plating apparatus and to easily perform maintenance on the substrate holder.
The plating apparatus disclosed in Japanese Patent No. 5642517 has a single stocker (wagon) only. Thus, when a stocker is taken out of the plating apparatus for maintenance, the plating apparatus has no stocker therein, which means that there is no place to return the substrate holder in use. In other words, in the state where the stocker is taken out of the plating apparatus, the continuous operation of the plating apparatus is disabled and thus the operation of the apparatus is forced to stop. Even if the stocker is configured to store an anode holder, a similar problem may arise.
In view of the above problems, the present invention has been made, and an object of the present invention is to provide a plating apparatus and a plating method enabling continuous operation even while the stocker is taken out of the plating apparatus.
An aspect of the present invention provides a plating apparatus. This plating apparatus includes a plating treatment section performing plating on a substrate; and a plurality of stockers configured to be able to store a holder configured to hold a substrate or an anode, wherein at least one of the plurality of stockers is configured to be movable into and out of the plating apparatus.
This aspect provides a plurality of stockers and at least one of the stockers can be taken out of the plating apparatus. Thus, a stocker storing a holder requiring maintenance can be taken out of the plating apparatus and maintenance can be performed on the holder. In addition, during maintenance, another stocker is in a state of being disposed in the plating apparatus. This enables continuous operation of the plating apparatus even while the holder is in maintenance. Thus, this aspect can increase the amount of production as compared with the conventional case where the plating apparatus is stopped. It has been found that the substrate holders and anode holders include some holders having no structural defect in the holder itself, but having a difference in the number of errors occurring in the plating process as the plating process continues, namely, some holders with a large number of errors and other holders with a small number of errors. This aspect provides a plurality of stockers in the plating apparatus. Therefore, for example, holders with a history of errors are stored in a first stocker and the other holders are stored in a second stocker, whereby the first stocker to be maintained can be moved out of the plating apparatus. Further, this aspect provides a plurality of stockers in the plating apparatus. Therefore, for example, the stocker taken out of the plating apparatus can store a holder with a specification different from the holders remaining in the plating apparatus. As a result, even if substrates with different specifications are mixed and processed, this aspect can continue the production without stopping the entire apparatus to replace the holders and thus can improve the productivity of the apparatus.
In an aspect of the present invention, the plating apparatus includes an opening portion for taking the stocker out of the plating apparatus; and the stocker has a partition wall on a side surface thereof, the partition wall covering at least a part of the opening portion so as to partition an inside of the plating apparatus and an outside of the plating apparatus.
According to this aspect, the partition wall of the stocker partitions the inside and the outside of the plating apparatus. Thus, when the stocker is disposed inside the plating apparatus, the operator can be prevented from entering the plating apparatus through the opening portion. Therefore, while the stocker is disposed inside the plating apparatus and the plating apparatus is operating, this aspect can prevent the operator from accidentally entering the plating apparatus and thus can ensure the safety of the operator. Note that in the plating apparatus disclosed in Japanese Patent No. 5642517, a shutter partitioning between the inside of the plating apparatus and the stocker is configured to be a spring-up type by a shutter rotation mechanism. For this reason, in the plating apparatus disclosed in Japanese Patent No. 5642517, if the shutter rotation mechanism fails, the shutter cannot be opened or closed, and thus the shutter remains open or closed. While the shutter remains closed, the operator cannot enter the plating apparatus, and while the shutter remains open, the operator can take the stocker (wagon) with less safety. In contrast to this, according to this aspect, a movable stocker has a partition wall, thus eliminating the need for a special mechanism to move the partition wall and simplifying the device configuration. In addition, this aspect can reduce the risk of device failure and can eliminate the need for space to install a mechanism such as the shutter rotation mechanism.
In an aspect of the present invention, the plating apparatus includes a rear partition wall disposed on an opposite side of the partition wall with the stocker interposed therebetween and configured so as to cover at least a part of the opening portion, the rear partition wall is configured to be movable with the stocker, and the plating apparatus includes a stopper stopping the rear partition wall moved to the opening portion.
According to this aspect, when the stocker is moved, the rear partition wall is moved; and when the rear partition wall is moved to the opening portion, the stopper stops the rear partition wall at the opening portion. Thus, even when the stocker is taken out of the apparatus, the rear partition wall stopping at the opening portion covers at least a part of the opening portion. Thus, this aspect can prevent the operator from accidentally entering the plating apparatus during maintenance of the holder stored in the stocker and can ensure the safety of the operator.
An aspect of the present invention includes a guide member for guiding the stocker into and out of the plating apparatus.
This aspect can facilitate the loading and unloading operation of the stocker.
In an aspect of the present invention, the guide member includes a sliding body slidably supporting the stocker.
According to this aspect, the sliding body slidably supports the stocker. Thus, when the stocker is moved into and out of the plating apparatus, less power is needed to load and unload the stocker and thus can facilitate the operation. In addition, the guide member includes a sliding body, thus eliminating the need to attach a moving caster or the like to the stocker.
In an aspect of the present invention, the plating apparatus includes a fixing member for fixing the stocker disposed in the plating apparatus.
This aspect can fix the stocker at an appropriate position when the stocker taken out of the plating apparatus is returned to the plating apparatus.
In an aspect of the present invention, the plating apparatus includes a stocker sensor detecting whether or not the stocker is present at a predetermined position inside the plating apparatus.
This aspect can detect whether or not the stocker is in a state of being taken out of the plating apparatus. Thus, the plating apparatus can recognize a usable stocker and can perform a plating process using only the stocker disposed in the plating apparatus without using the taken out stocker.
An aspect of the present invention includes an obstacle sensor detecting whether or not an obstacle is present in the opening portion.
This aspect can detect whether or not an obstacle is present in the opening portion. In the present plating apparatus, the obstacles that may be present in the opening portion are considered to include a partition wall, a stocker, a rear partition wall, and the like. Any one of the obstacles present in the opening portion prevents the operator from easily entering the plating apparatus. Thus, this aspect can ensure the safety of the operator by detecting whether or not an obstacle is present in the opening portion.
In an aspect of the present invention, the stocker includes a connecting portion configured to detachably connect the stocker to another stocker adjacent in a moving direction of the stocker.
According to this aspect, when a first stocker is moved out of the plating apparatus in the state where the first stocker is connected to a second stocker by the connecting portion, the second stocker can also be moved. Thus, the second stocker can be moved out of the plating apparatus together with the first stocker, and by releasing the connection when the second stocker is located at a position where the first stocker was present, the second stocker can also be moved to the position where the first stocker was present.
In an aspect of the present invention, the plating apparatus includes a support surface slidably supporting the stocker.
According to this aspect, the stocker is slidably supported by the support surface, and thus the stocker can be easily moved in any direction. Thus, for example, an extra stocker is disposed on the support surface, whereby one stocker is taken out of the plating apparatus, and then the extra stocker can be immediately stored in the plating apparatus. Thus, the substrate holder can be quickly interchanged.
In an aspect of the present invention, the plating apparatus includes a transport device configured to transport the holder and a control unit. The control unit is configured to select at least one of the plurality of stockers and instruct the transport device to store the holder in the selected stocker.
When an error occurs in a substrate holder or an anode holder or when a periodical maintenance time has come, the use of the holder needs to be stopped and the holder needs to be maintained. According to this aspect, for example, by selecting a stocker expected to store a holder needing its use to be stopped, the holder needing the use to be stopped can be stored in the stocker and taken out of the plating apparatus.
In an aspect of the present invention, the plating apparatus includes a transport device configured to transport the holder and a control unit. The control unit is configured to receive a signal indicating that an error occurred in the holder, select a stocker to store the holder in which the error occurred when the signal is received, and instruct the transport device to return at least the holder in which the error occurred to the selected stocker.
When an error occurs in a holder, this aspect can select a stocker expected to store the holder in which an error occurs, and store the holder in which the error occurred in the selected stocker to be taken out of the plating apparatus.
In an aspect of the present invention, the control unit is configured to control the plating treatment section and the transport device to perform plating on the substrate using the holder to be stored in a stocker other than the selected stocker.
This aspect performs a plating process using a holder to be stored in a stocker other than the selected stocker and thus can perform continuous operation even while the stocker is being taken out of the plating apparatus.
In an aspect of the present invention, the control unit is configured to determine whether or not the taken out stocker or a stocker different from the stocker is stored in the plating apparatus after the selected stocker is taken out of the plating apparatus, and control the plating treatment section and the transport device to perform plating on the substrate using the holder to be stored in all the stockers when the taken out stocker or a stocker different from the stocker is stored in the plating apparatus.
This aspect can perform a plating process using a holder stored in all the stockers including the stocker when the stocker is stored in the plating apparatus. Thus, after the stocker is returned to the plating apparatus, the plating process is performed using all the holders in the same way as normal. Thus, this aspect can prevent reduction in the amount of production of the plating apparatus.
In an aspect of the present invention, the plurality of stockers includes a maintenance-dedicated stocker to store a holder to be maintained, and the stocker to store the holder in which the error occurred is the maintenance-dedicated stocker.
According to this aspect, the holder in which an error occurred is stored in the maintenance-dedicated stocker. As used herein, the maintenance-dedicated stocker refers to a stocker which is not used at a normal plating process, but is used to store a holder to be maintained. Therefore, even if the maintenance-dedicated stocker is moved out of the plating apparatus for maintenance, the number of stockers for use in the normal plating process is unchanged. Thus, this aspect can maintain the number of usable stockers even during maintenance and thus can suppress reduction in the amount of production of the plating apparatus.
In an aspect of the present invention, the plating apparatus includes a moving device moving the stocker out of the plating apparatus, and the control unit is configured to determine whether or not the holder expected to be stored in the selected stocker is returned to the stocker and when the holder is returned to the selected stocker, control the moving device to take the selected stocker out of the plating apparatus.
This aspect can automatically unload the stocker when the holder is returned to the selected stocker, and thus can reduce the amount of operation of the operator.
In an aspect of the present invention, the moving device is configured to move the stocker into the plating apparatus.
This aspect can automatically store the stocker into the plating apparatus, and thus can reduce the amount of operation of the operator.
An aspect of the present invention provides a plating method using a plating apparatus including a plating treatment section performing plating on a substrate; and a plurality of stockers configured to be able to store a holder holding a substrate or an anode. This plating method includes a takeout step of moving at least one of the plurality of stockers out of the plating apparatus.
This aspect can take a stocker storing a holder requiring maintenance out of the plating apparatus and can perform maintenance on the holder. In addition, during maintenance, another stocker is in a state of being disposed in the plating apparatus. This enables continuous operation of the plating apparatus even while the holder is in maintenance. Thus, this aspect can increase the amount of production as compared with the conventional case where the plating apparatus is stopped. It has been found that the substrate holders and anode holders include some holders having no structural defect in the folder itself, but having a difference in the number of errors occurring in the plating process as the plating process continues, namely, some holders with a large number of errors and other holders with a small number of errors. This aspect provides a plurality of stockers in the plating apparatus. For example, holders with a history of errors are stored in a first stocker and the other holders are stored in a second stocker, whereby the first stocker to be maintained can be moved out of the plating apparatus. Further, this aspect provides a plurality of stockers in the plating apparatus. For example, a substrate holder for holding a substrate with a first specification can be stored in the first stocker, and the other substrate holders can be stored in the second stocker. Thus, even if substrates with different specifications are simultaneously or continuously transported to the plating apparatus, the plating process can be continued without stopping the apparatus. As a result, the plating process can be performed on the substrates with different specifications without reducing the throughput per unit time of the entire apparatus.
In an aspect of the present invention, the plating method includes a storage step of moving a stocker moved out of the plating apparatus or a stocker different from the stocker, into the plating apparatus.
This aspect can return the stocker moved out of the plating apparatus to the original position or can move a stocker different from the stocker moved out of the plating apparatus into the plating apparatus. Therefore, after the stocker is taken out of the plating apparatus for maintenance, the number of stockers can be returned to the original number. Note that when a stocker different from the stocker moved out of the plating apparatus is moved into the plating apparatus, the different stocker can be returned to the plating apparatus before the maintenance of the holder to be stored in the stocker moved out of the plating apparatus is completed. Therefore, this aspect does not reduce the number of stockers disposed in the plating apparatus during maintenance and thus can suppress reduction in the amount of production of the plating apparatus.
In an aspect of the present invention, the plating method includes a step of selecting at least one of the plurality of stockers and a step of returning a holder to the selected stocker. The takeout step includes a step of taking the selected stocker out of the plating apparatus.
When an error occurs in a substrate holder or an anode holder or when a periodical maintenance time has come, the use of the holder needs to be stopped and the holder needs to be maintained. According to this aspect, for example, by selecting a stocker expected to store a holder needing its use to be stopped, the holder needing the use to be stopped can be stored in the stocker and taken out of the plating apparatus.
In an aspect of the present invention, the plating method includes a step of detecting that an error occurs in a holder, a step of selecting a stocker to store a holder in which the error occurred, and a step of returning at least the holder in which the error occurred to the selected stocker. The takeout step includes a step of taking the selected stocker out of the plating apparatus.
When an error occurs in a holder, this aspect can select a stocker expected to store the holder in which the error occurs, and store the holder in which the error occurred in the stocker to be taken out of the plating apparatus.
In an aspect of the present invention, the plating method includes a step of performing plating on a substrate using a holder to be stored in a stocker other than the selected stocker.
This aspect performs a plating process using a holder to be stored in a stocker other than the selected stocker and thus can perform continuous operation even while the stocker is being taken out of the plating apparatus.
In an aspect of the present invention, the plating method includes a holder presence or absence determination step of determining whether or not the holder expected to be stored in the selected stocker is returned to the stocker, and the takeout step of taking the selected stocker out of the plating apparatus is executed when the holder is determined to have been returned to the selected stocker.
This aspect determines whether or not the holder is returned to the selected stocker, and thus can take the stocker out of the plating apparatus after the holder is surely returned to the stocker.
In an aspect of the present invention, the plating method includes a stocker presence or absence determination step determining whether or not the stocker taken out of the plating apparatus or a stocker different from the stocker is stored in the plating apparatus after the selected stocker is taken out of the plating apparatus, and a step of performing plating on the substrate using the holder to be stored in all the stockers when the stocker taken out of the plating apparatus or a stocker different from the stocker is stored in the plating apparatus.
This aspect can perform a plating process using the holders stored in all the stockers including the stocker when the stocker is stored in the plating apparatus. Thus, after the stocker is returned to the plating apparatus, the plating process is performed using all the holders in the same way as normal. Thus, this aspect can prevent reduction in the amount of production of the plating apparatus.
In an aspect of the present invention, the plurality of stockers includes a maintenance-dedicated stocker to store a holder to be maintained, and the stocker to store the holder in which the error occurred is the maintenance-dedicated stocker.
According to this aspect, a holder in which an error occurred is stored in a maintenance-dedicated stocker. As used herein, the maintenance-dedicated stocker refers to a stocker which is not used at a normal plating process, but is used to store only the holder in which an error occurred. Therefore, even if the maintenance-dedicated stocker is moved out of the plating apparatus for maintenance, the number of stockers for use in the normal plating process is unchanged. Thus, this aspect can maintain the number of usable stockers even during maintenance and thus can suppress reduction in the amount of production of the plating apparatus.
Hereinafter, a first embodiment of the present invention will be described with reference to the accompanying drawings. In the drawings described below, the same reference numerals or characters are assigned to the same or similar components, and the overlapping description is omitted.
The loading/unloading section 170A includes two cassette tables 102, an aligner 104 which aligns the positions such as an orientation flat and a notch of a substrate in a predetermined direction, and a spin rinse dryer 106 which dries the substrate after plating process by rotating the substrate at high speed. The cassette table 102 mounts a cassette 100 storing a substrate such as a semiconductor wafer. The loading/unloading section 170A also includes a substrate attaching/detaching section 120 which is provided near the spin rinse dryer 106 and places the substrate holder 11 thereon to attach and detach the substrate. The loading/unloading section 170A also includes a substrate transport device 122 which is disposed at a center of these units 100, 104, 106, and 120, and includes transporting robots for transporting substrates among these units.
The substrate attaching/detaching section 120 includes a flat plate-like placement plate 152 slidable in the lateral direction along the rail 150. The two substrate holders 11 are horizontally placed in parallel on the placement plate 152. After a substrate is transferred between one substrate holder 11 and the substrate transport device 122, the placement plate 152 laterally slides, and the substrate is transferred between the other substrate holder 11 and the substrate transport device 122.
The treatment section 170B of the plating apparatus includes a plurality of stockers 20, a pre-wet bath 126, a pre-soak bath 128, a first cleaning bath 130a, a blow bath 132, a second cleaning bath 130b, and a plating bath 10 (corresponding to an example of the plating treatment section). In the stocker 20, the substrate holder 11 is stored and temporarily placed. Note that in the present description, the place in the plating apparatus where the stocker 20 is installed is referred to as a stocker installation section. Note also that in the present embodiment, the stocker 20 is configured to store the substrate holder 11, but may be configured to store an anode holder for use in the plating bath 10. The treatment section 170B of the plating apparatus also includes an opening portion 21 formed to load and unload the stocker 20 into and from the plating apparatus. In the pre-wet bath 126, the substrate is immersed in pure water. In the pre-soak bath 128, an oxide film is removed by etching from the surface of a conductive layer such as a seed layer formed on the surface of the substrate. In the first cleaning bath 130a, the substrate after pre-soaking is cleaned with a cleaning fluid (pure water, etc.,) together with the substrate holder 11. In the blow bath 132, the substrate after cleaning is drained. In the second cleaning bath 130b, the substrate after plating is cleaned with a cleaning fluid together with the substrate holder 11. The stocker 20, the pre-wet bath 126, the pre-soak bath 128, the first cleaning bath 130a, the blow bath 132, the second cleaning bath 130b, and the plating bath 10 are disposed in this order.
The plating bath 10 includes a plurality of plating cells 50 including, for example, an overflow bath 54. Each plating cell 50 has a substrate stored therein and each substrate is immersed in a plating solution therein and the substrate surface is subjected to plating such as copper plating. Here, the type of the plating solution is not particularly limited, but various plating solutions may be used depending on the application. For example, in the case of a plating solution for a through silicon via (TSV) plating process, available plating solutions are listed in the following Table 1. More specifically, the base solution for TSV may contain Cu, H2SO4, and Cl each having a concentration listed in Table 1, and the organic additives may include an additive A (suppressor), an additive B (accelerator), and an additive C (leveler) each having a concentration listed in Table 1.
In addition, the plating solution may contain cobalt-tungsten-boron (CoWB), cobalt-tungsten-phosphide (CoWP), and other compounds for use in forming a metal film on the substrate surface having a Cu wiring. Further, the plating solution may contain CoWB or Ta (tantalum) compounds for use in forming a barrier film provided on the substrate surface or the surface of concave portions of the substrate before the Cu wiring is formed in order to prevent Cu from diffusing into an insulating film thereof.
The plating apparatus includes a substrate holder transport device 140 (corresponding to an example of the transport device) which uses, for example, a linear motor system and is located on a side of each of these devices to transport the substrate holder 11 together with the substrate to and from each of these devices. This substrate holder transport device 140 includes a first transporter 142 and a second transporter 144. The first transporter 142 is configured to transport the substrate holder 11 to and from the substrate attaching/detaching section 120, the stocker 20, the pre-wet bath 126, the pre-soak bath 128, the first cleaning bath 130a, and the blow bath 132. The second transporter 144 is configured to transport the substrate holder 11 to and from the first cleaning bath 130a, the second cleaning bath 130b, the blow bath 132, and the plating bath 10. In another embodiment, the plating apparatus may include only one of the first transporter 142 and the second transporter 144.
The overflow bath 54 has a paddle drive device 19 which is disposed on both sides thereof and drives a paddle which is located inside each of the plating cells 50 and serves as a stirring bar for agitating the plating solution in each of the plating cells 50.
The thus configured plating apparatus includes a controller 175 configured to control each of the aforementioned sections. The controller 175 may control the entire plating process system including a plurality of the plating apparatuses illustrated in
Before the plating process, the substrate holder 11 is stored in the stocker 20. During the plating process, the substrate holder 11 is moved between the placement plate 152 of the substrate attaching/detaching section 120 and each bath by the substrate holder transport device 140. After the substrate is plated, the substrate holder 11 is stored again in the stocker 20. When the substrate is plated, the substrate held by the substrate holder 11 is vertically immersed in the plating solution stored in the plating cell 50 of the plating bath 10. In the state where the substrate is immersed in the plating solution, the plating solution is introduced from below the plating cell 50 and plating is performed while being overflowed into the overflow bath 54.
Each of the plating cells 50 constituting the plating bath 10 is configured to store one substrate holder holding one substrate and perform plating on the substrate. Each of the plating cells 50 preferably includes a conducting portion to the substrate holder 11, an anode held by an anode holder, the paddle drive device 19, and a shielding plate. The exposed surface of the anode held by the anode holder is formed concentrically with the substrate. The substrate held by the substrate holder 11 is treated with a processing fluid in each bath.
In addition, a hanger portion 112 having a rectangular parallelepiped shape or a cubic shape is provided at both upper ends of the substrate holder 11. When the substrate holder 11 is disposed in each bath, the hanger portion 112 is disposed above a hanger receiving member of each bath, thereby to function as a support portion for suspending the substrate holder 11. Note that when the plating bath is an electroplating bath, a mutual contact between a power supply contact 114 provided at the hanger portion 112 and an electrical contact provided at the hanger receiving member causes an electric current to be supplied from an external power source to a to-be-plated surface of a substrate W. When the substrate holder 11 is suspended on the hanger receiving member, the power supply contact 114 is provided at a position not contacting the plating solution in the plating bath. When the substrate holder 11 is stored in the stocker 20, the hanger portion 112 is supported by a hanger receiving member 22 of the stocker 20 to be described later.
The hanger portion 112 may be designed so as to prevent the substrate holder 11 from swinging during movement when a force is applied by the substrate holder transport device 140 from the direction of arrows A1 illustrated in
The substrate holder 11 illustrated in
At least one of the plurality of stockers 20 according to the present embodiment is configured to be independently movable into and out of the plating apparatus. In other words, each of the plurality of stockers 20 can be independently moved into and out of the plating apparatus, or some of the plurality of stockers 20 are fixed inside the plating apparatus and each of the remaining stockers 20 can be independently moved into and out of the plating apparatus.
More specifically, the plating apparatus includes a rail 23 (corresponding to an example of the guide member) for guiding the stockers 20 to and from the plating apparatus. The upper surface of the rail 23 includes a plurality of sliding bodies 35 such as ball bearings for slidably supporting the stockers 20. The stockers 20 slide on the rail 23 while being supported by the sliding bodies 35 thereby to move into and out of the plating apparatus. When the stocker 20 is moved into and out of the plating apparatus, this configuration can facilitate the loading and unloading operation of the stocker 20. In addition, the rail 23 has sliding bodies 35, thus eliminating the need to attach moving casters or the like to the stocker 20.
Alternatively, the plating apparatus may include a support surface 36 slidably supporting the stockers 20. The upper surface of the support surface 36 includes a plurality of sliding bodies 35 slidably supporting the stockers 20. The stockers 20 disposed on the support surface 36 slide on the support surface 36 while being supported by the sliding bodies 35 thereby to move horizontally in any direction. Thus, for example, an extra stocker 20 is disposed on the support surface 36, whereby immediately after a first stocker 20 is taken out of the plating apparatus, the extra stocker 20 can be stored in the plating apparatus. Thus, the substrate holder 11 can be quickly interchanged.
The front side of the stocker 20 includes a partition wall member 27a configured to cover at least a part of the opening portion 21. The structure of the partition wall member 27a will be described in detail later. In addition, the plating apparatus includes rear partition walls 25 each disposed on a side opposite to the opening portion 21 of the stocker 20, namely, on a side opposite to the partition wall member 27a with the stocker 20 therebetween. The rear partition walls 25 are configured to be movable together with the stockers 20 and configured to cover at least a part of the opening portion 21. The plating apparatus includes a stopper 37 which is provided near the rail 23 to stop the rear partition wall 25 moved to the opening portion 21 near the opening portion 21. The stopper 37 is configured to contact a part of the rear partition wall 25 moved to the opening portion 21. This configuration prevents the rear partition wall 25 from moving beyond the stopper 37 out of the plating apparatus. Note that the stopper 37 is configured not to contact the stocker 20 and does not interfere with the movement of the stocker 20 into and out of the plating apparatus. In addition, the stopper 37 may be located at any position enabling the rear partition wall 25 moved to the opening portion 21 to stop and not interfering with the movement of the stocker 20. According to the present embodiment, when the stocker 20 is taken out, at least a part of the opening portion 21 is covered with the rear partition wall 25. Thus, the present embodiment can prevent the operator from accidentally entering the plating apparatus during maintenance of the substrate holder 11 stored in the stocker 20 and thus can ensure the safety of the operator.
Now, the description will focus on the detail of the stocker 20.
In addition, the stocker 20 includes a partition wall member 27a extending upward from the front of the stocker body 26. The partition wall member 27a and the front of the stocker body 26 constitute the partition wall 27. The partition wall 27 is configured to cover at least a part of the opening portion 21 illustrated in
As illustrated in
As illustrated in
Note that as described above, the plating apparatus of the present embodiment includes a plurality of stockers 20 and at least one of the stockers 20 is configured to be independently movable into and out of the plating apparatus. Hereinbefore, the stocker 20 illustrated in
Then, the description will move on to the detail of a connection structure of the stocker 20.
As illustrated in
When the operation end portion 32a of the operation bar 32 illustrated in
As illustrated in
Now, the description will move on to the configuration for detecting that the stocker 20 is disposed inside the plating apparatus.
Even if it is detected that the stocker 20 is present in the plating apparatus, but the stocker 20 is installed shifted from a desired position, there is a possibility that the substrate holder transport device 140 illustrated in
In addition, the plating apparatus includes an obstacle sensor 40 which is provided near the opening portion 21 and detects whether or not an obstacle is present in the opening portion 21. In the present plating apparatus, the obstacles that may be present in the opening portion 21 are considered to be the partition wall 27, the stocker 20, the rear partition wall 25, and the like. If any of the obstacles is present in the opening portion 21, the operator cannot easily enter the plating apparatus. Therefore, the safety of the operator can be ensured by detecting whether or not an obstacle is present in the opening portion 21. Note that the stocker 20 of the present embodiment includes a mutually connected structure and thus may have a small gap formed in the connecting portion. If only one obstacle sensor 40 is provided and the obstacle sensor 40 detects such a small gap, the obstacle sensor 40 may misdetect that no obstacle is present in the opening portion 21 though the stocker 20 is present in the opening portion 21. It is related to the safety of the operator whether or not an obstacle is present in the opening portion 21, namely, whether or not the operator is in a state capable of entering the plating apparatus from the opening portion 21. Thus, misdetection is preferably reduced as much as possible. For this reason, as illustrated in
Then, the description will move on to an example of a process of taking the stocker 20 out of the plating apparatus.
As illustrated in
Then, as illustrated in
Then, the description will move on to the takeout/storage control of the stocker 20.
First, the control unit 175C of the plating apparatus makes a takeout reservation on at least one stocker 20 (referred to as a maintenance stocker) storing the substrate holder 11 to be maintained from a plurality of stockers 20 (Step S1001). As used herein, the takeout reservation refers to an operation performed by the control unit 175C to select at least one stocker 20 as a target to be taken out of a plurality of stockers 20. More specifically, for example, when the operator selects a stocker 20 by operating the controller 175 of the plating apparatus, a takeout reservation is made on the stocker 20. In the present description, the stocker subjected to takeout reservation is referred to as a reserved stocker. Note that as described above, an anode holder subjected to maintenance can also be stored in the stocker 20. The control unit 175C stops the use of the substrate holder 11 corresponding to the reserved stocker, namely, the substrate holder 11 to be stored in the reserved stocker, and controls the substrate holder transport device 140 so as to return the substrate holder 11 into the reserved stocker (Step S1001).
The control unit 175C determines whether or not all the substrate holders 11 to be stored in the reserved stocker are returned to the reserved stocker (Step S1002). If it is determined that all the substrate holders 11 are returned to the reserved stocker (Step S1002: Yes), the control unit 175C turns on, for example, an unillustrated lamp provided in the controller 175 (Step S1003). The lighting of the lamp indicates that the reserved stocker may be taken out of the plating apparatus. Note that not all the substrate holders 11 corresponding to the reserved stocker but at least some of the substrate holders 11 needing maintenance may be returned to the reserved stocker.
The control unit 175C continues the operation of the plating apparatus using the remaining stockers 20 other than the reserved stocker (Step S1004). More specifically, the control unit 175C controls the treatment section 170B (see
Then, maintenance is performed on the substrate holder 11 stored in the reserved stocker taken out of the plating apparatus (Step S1006). When the maintenance of the substrate holder 11 is completed, the substrate holder 11 is returned to the plating apparatus in a state of being stored in the reserved stocker (Step S1007). When the reserved stocker is returned to the plating apparatus, the reserved stocker is detected by the stocker sensor 38 illustrated in
In the plating apparatus of the present embodiment, when an error occurs in the substrate holder 11 or an anode holder or when a periodical maintenance time has come, the use of the holder needs to be stopped and the holder needs to be maintained. According to the process flow illustrated in
In addition, according to the process flow illustrated in
Then, the description will move on to the takeout/storage control of the stocker 20 when an error occurs in the substrate holder 11 or an anode holder.
First, the control unit 175C of the controller 175 detects an error in the substrate holder 11 (Step S1101). More specifically, for example, when the substrate W is attached to the substrate holder 11 in the substrate attaching/detaching section 120, conduction confirmation is performed to detect whether or not the substrate W is conducted. Alternatively, it can be detected that an error occurs in a seal to the peripheral end portion of the substrate W in the substrate holder 11 or it can be detected that a plating solution enters the seal by the change in electric resistance value by monitoring the electric resistance at the time of plating. A well-known method can be adopted as a means of detecting such an error of the substrate holder 11. When a signal indicating that an error occurred in the substrate holder 11 is received from each section of the plating apparatus, the control unit 175C controls the substrate holder transport device 140 to return the substrate holder 11 to the stocker 20 corresponding to the substrate holder 11 in which the error occurred or to the stocker 20 expected to store the substrate holder 11 in which the error occurred (Step S1101). At this time, only the substrate holder 11 in which the error occurred may be returned to the stocker 20 or all the substrate holders 11 including the substrate holder 11 in which the error occurred may be returned to the stocker 20. Then, the control unit 175C stops the use of the stocker 20 expected to store the substrate holder 11 in which the error occurred, and automatically make a takeout reservation (Step S1101).
The control unit 175C determines whether or not all the substrate holders 11 to be stored in the reserved stocker are returned to the reserved stocker (Step S1102). Note that in step S1102, the control unit 175C may determine whether or not at least some of the substrate holders 11 in which the error occurred are returned to the reserved stocker. If it is determined that all the substrate holders 11 or at least some of the substrate holders 11 in which the error occurred are returned to the reserved stocker (S1102: Yes), the control unit 175C continues the operation of the plating apparatus using the remaining stockers 20 other than the reserved stocker (Step S1103). More specifically, the control unit 175C controls the treatment section 170B (see
Then, maintenance is performed on the substrate holder 11 stored in the reserved stocker taken out of the plating apparatus (Step S1105). When the maintenance of the substrate holder 11 is completed, the substrate holder 11 is returned to the plating apparatus in a state of being stored in the reserved stocker (Step S1106). When the reserved stocker is returned to the plating apparatus, the reserved stocker is detected by the stocker sensor 38 illustrated in
According to the process flow illustrated in
According to the process flow illustrated in
Next, the description will focus on the takeout/storage control of the stocker 20 when the plating apparatus includes a maintenance-dedicated stocker 20. The plating apparatus does not use at least one of the plurality of stockers 20 at a normal plating process, but may use the stocker as a stocker 20 (referred to as a maintenance-dedicated stocker) to store only the substrate holder 11 or the anode holder needing maintenance.
First, the control unit 175C of the controller 175 detects an error in the substrate holder 11 (Step S1201). More specifically, for example, when the substrate W is attached to the substrate holder 11 in the substrate attaching/detaching section 120, conduction confirmation is performed to detect whether or not the substrate W is conducted. Alternatively, it can be detected that an error occurs in a seal to the peripheral end portion of the substrate W in the substrate holder 11 or it can be detected that a plating solution enters the seal by the change in electric resistance value by monitoring the electric resistance at the time of plating. A well-known method can be adopted as a means of detecting such an error of the substrate holder 11. When a signal indicating that an error occurred in the substrate holder 11 is received from each section of the plating apparatus, the control unit 175C controls the substrate holder transport device 140 to return the substrate holder 11 to the maintenance-dedicated stocker (Step S1201). Note that the maintenance-dedicated stocker is a stocker 20 which has been preliminarily selected as the takeout target by the control unit 175C.
The control unit 175C continues the operation of the plating apparatus using the remaining stockers 20 other than the maintenance-dedicated stocker (Step S1202). More specifically, the control unit 175C controls the treatment section 170B (see
Meanwhile, the maintenance-dedicated stocker is taken out of the plating apparatus (Step S1203). At this time, the stocker moving device 45 or the like may be used to automatically take the reserved stocker out of the plating apparatus as illustrated in
Then, maintenance is performed on the substrate holder 11 stored in the maintenance-dedicated stocker taken out of the plating apparatus (Step S1204). When the maintenance of the substrate holder 11 is completed, the substrate holder 11 is returned to the plating apparatus in a state of being stored in the maintenance-dedicated stocker (Step S1205). When the maintenance-dedicated stocker is returned to the plating apparatus, the maintenance-dedicated stocker is detected by the stocker sensor 38 illustrated in
According to the process flow illustrated in
As described above, the plating apparatus according to the first embodiment includes a plurality of stockers 20 and at least one of the stockers 20 can be taken out of the plating apparatus. Thus, the stocker 20 storing the substrate holder 11 or the anode holder requiring maintenance can be taken out of the plating apparatus and maintenance can be performed on the substrate holder 11 or the anode holder. In addition, during maintenance, another stocker 20 is in a state of being disposed in the plating apparatus. Thus, the first embodiment enables continuous operation of the plating apparatus even while the substrate holder 11 or the anode holder is in maintenance, and thus can increase the amount of production as compared with the conventional case where the plating apparatus is stopped. It has been found that some of the substrate holders 11 and anode holders have no structural defect in the folder itself, but having a difference in the number of errors occurring in the plating process as the plating process continues, namely, some of the substrate holders 11 or the anode holders with a large number of errors and others of the substrate holders 11 or the anode holders with a small number of errors. The first embodiment provides a plurality of stockers 20 in the plating apparatus. For example, the substrate holders 11 or the anode holders with a history of errors are stored in a first stocker 20 and the other holders are stored in a second stocker 20, whereby the first stocker 20 can be selected as the maintenance target and can be moved out of the plating apparatus. Further, the first embodiment provides a plurality of stockers 20 in the plating apparatus. For example, the substrate holder 11 for holding the substrate W with a first specification can be stored in the first stocker 20, and the other substrate holders 11 can be stored in the second stocker 20. Thus, even if substrates W with different specifications are simultaneously or continuously transported to the plating apparatus, the plating process can be continued without stopping the apparatus. As a result, the plating process can be performed on the substrates W with different specifications without reducing the throughput per unit time of the entire apparatus.
Hereinafter, the second embodiment of the present invention will be described with reference to the accompanying drawings.
As illustrated in
In this example, the treatment section 170B includes a blow bath, a rinse bath, a second plating bath, a rinse bath, a first plating bath, a rinse bath, a pre-treatment bath, and a pre-washing bath in this order from the cassette 100 side. The second embodiment is not limited to this, but may include the treatment section 170B having the same configuration as that of the plating apparatus of the first embodiment or another treatment section 170B having a different configuration. In other words, the type of bath, the number of baths, and the arrangement of the baths of the treatment section 170B can be freely selected according to the treatment purpose of the substrate W. Note that each bath is preferably arranged in the order in the direction from X to X′ illustrated in the Figure according to the order of the steps to shorten the transport path of the substrate holder 11.
The plating apparatus of the second embodiment is greatly different from that of the first embodiment in that a plurality of stockers 20 is arranged at a rear stage of the plating apparatus. Even if the plating apparatus is configured in this way, at least one of the plurality of stockers 20 can be independently moved into and out of the plating apparatus.
Hereinbefore, the embodiments of the present invention have been described. The above described embodiments of the invention are provided to facilitate the understanding of the present invention and are not intended to limit the present invention. It is apparent that the present invention may be changed or improved without departing from the spirit of the invention and such equivalents are included in the present invention. Further, the individual components described in the claims and the specification may be appropriately combined or omitted within a range in which at least some of the above described problems can be solved or within a range in which at least some of the effects can be exhibited.
Number | Date | Country | Kind |
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2016-081246 | Apr 2016 | JP | national |
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Number | Date | Country | |
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20170298531 A1 | Oct 2017 | US |