The present invention relates to a probing system, and particularly to the probing system utilizes vacuum suction device to adjust testing position.
Generally, the electricity of a wafer is tested when manufacturing semiconductor on the wafer or after. A conventional method, that a prober moves the wafer upward to contact the probes for testing, is not suitable for the discrete wafer. The movable part of the wafer might be damaged by the downward pressure.
For solving the above problems, especially for wafers with discrete structure, the present invention provides a probing system, comprising:
The present invention utilizes vacuum suction to suck the movable part of a discrete wafer and to automatically adjust the relative height between the wafer and the probes to generate the contact pressure for probing. The relative height adjustment can be optimized for different conditions of the probing system to have the feasibility of mass production and to enhance usage life.
Below embodiments accompanied with drawings are used to explain the spirit of this invention to have better understanding for the person in this art, not used to limit the scope of this invention, which is defined by the claims. The applicant emphasizes the element quantity and size are schematic only. Moreover, some parts might be omitted to skeletally represent this invention for conciseness.
A suction nozzle 13 having an aisle 133 is able to suck the movable part 102 via at least a suction zone 105 of the surface of the movable part 102, and the movable part 102 can be moved vertically upwards, as shown in
In an embodiment, the probing system further comprising a driving unit (not shown in the figure) connects to the platform and the suction nozzle 13, the driving unit is configured to move the platform and the suction nozzle 13 vertically. The vertical movement is determined by a distance between the probes 14 and the discrete wafer 10 or between the probes 14 and the suction nozzle 13. A measuring unit (not shown in the figure) is designed to measure the distance and then to output a distance signal to a control unit (not shown in the figure). The control unit converts the distance signal to a control signal and output the control signal to the driving unit to adjust the relative vertical position between the suction nozzle 13 and the discrete wafer 10.
In an embodiment, when the probing system is in ready state, the head of the suction nozzle 13 is located at the height H1 above the movable part 102 and the heads of the probes 14 are at same height, as shown in
In another embodiment, the probing system is in ready state, the head of suction nozzle 13 located at the height H2 and probes 14 at the height H1 above the discrete wafer 10, as shown in
The probing system utilizes vacuum suction to suck the movable part of a discrete wafer and to adjust the relative height between the wafer and the probes to generate a contact pressure for probing. The relative height adjustment can be optimized for different conditions of the probing system to have the feasibility of mass production and to enhance usage life.
Number | Date | Country | Kind |
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109140651 | Nov 2020 | TW | national |
Number | Name | Date | Kind |
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6480012 | Komori | Nov 2002 | B1 |
20110156734 | Berry | Jun 2011 | A1 |
20220120785 | Fu | Apr 2022 | A1 |
Number | Date | Country |
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2002100666 | Apr 2002 | JP |
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JP 2002100666A—Description Espacenet Translation Accessed Nov. 2022 https://worldwide.espacenet.com/ (Year: 2022). |
Number | Date | Country | |
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20220163563 A1 | May 2022 | US |