Number | Name | Date | Kind |
---|---|---|---|
3535137 | Haller et al. | Oct 1970 | |
3934057 | Moreau et al. | Jan 1976 | |
3985597 | Zielinski | Oct 1976 | |
4004044 | Franco et al. | Jan 1977 | |
4181755 | Liu et al. | Jan 1980 | |
4224361 | Romankiw | Sep 1980 | |
4272561 | Rothman et al. | Jun 1981 | |
4328263 | Kurahashi et al. | May 1982 |
Entry |
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Gregor et al., "Method for Use and Removal of Photosensitive Chemical Resist Layers" IBM TDB, vol. 7, No. 11, Apr. 1965. |
IBM Technical Disclosure Bulletin, "Solventless Development of Polymeric Films" C. A. Cortellino et al., vol. 15, No. 1, Jun. 1972, p. 174. |
IBM Technical Disclosure Bulletin, vol. 22, No. 2, Jul. 1979, pp. 541 and 542. |
Photoresist Materials and Process, W. S. DeForest, McGraw-Hill, pp. 24, 25, 28, 29 and 60 (1975). |