Hummel Rolf E. Electronic Properties of Materials 3rd ed., Springer Verlag 2001, pp. 166-174.* |
Hwang et al., “On the link between electron shadowing and charging damage,” J. Vac. Sci. Technol. B 15(5):1839-1842, Sep./Oct. 1997. |
Siu et al., “Effect of plasma density and uniformity, electron temperature, process gas, and chamber on electron shading damage,” Lam Research Corporation, Fremont. CA. |
Hashimoto et al., “Reduction of the charging damage from electron shading,” 1996 1st International Symposium on Plasma Process-Induced DamageMay 13-14, Santa Clara, CA., 1996 American Vacuum Society. |
Hashimoto, Koichi, “Charge damage caused by electron shading effect,” Jpn. J. Appl. Phys. vol. 33, Part 1(10):6013-6018, Oct. 1994. |