Claims
- 1. A semiconductor device comprising a heat radiating fin, a semiconductor element, a semiconductor packaging device for accommodating said semiconductor element, means for attaching said heat radiating fin to said packaging device for externally diffusing heat generated by said semiconductor element, said heat radiating fin being made of a member selected from the group consisting of pure aluminum and an aluminum alloy; said means for attaching comprising a connecting member made of a composite material selected from the group consisting of Mo--Cu, Cu--W and Al--Si and a rotational friction welding between said connecting member and said heat radiating fin, said rotational friction welding penetrating an aluminum oxide film on said heat radiating fin thereby forming an alloying metallic bond directly between said heat radiating fin and said connecting member.
- 2. The device according to claim 1, wherein said Mo--Cu composite material has a copper content within the range of 2 to 30 wt. %.
- 3. The device according to claim 1, wherein said Mo--Cu composite material has a specific gravity within the range of 9 to 10 g/cc.
- 4. The device according to claim 1, wherein said Mo--Cu composite material or said Cu--W composite material includes an iron family element.
- 5. The device according to claim 4, wherein said iron family element is present up to and including 20 wt. % at the most.
- 6. The device according to claim 1, wherein said Cu--W composite material has a copper content within the range of 2 to 30 wt. %.
- 7. The device according to claim 1, wherein an interface between said fin and said connecting member is flat.
- 8. The device according to claim 1, wherein said connecting member has a conical tip for penetrating into said fin.
- 9. The device according to claim 8, wherein said tip has a tip angle of 160.degree. at the most.
- 10. The device according to claim 1, wherein said Al alloy comprises an Al--Si alloy.
- 11. The device of claim 1, wherein said connecting member has a projecting portion reaching into said heat radiating fin to form said friction welding metallic bond.
- 12. The semiconductor device according to claim 1, wherein said rotational friction welding between said connecting member and said heat radiating fin has been formed by bringing junction surfaces into contact and by rotating said connecting member and said heat radiating fin in directions opposite to each other while applying pressure in a direction of the axis of rotation.
Priority Claims (1)
Number |
Date |
Country |
Kind |
1-339981 |
Dec 1989 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 07/632,153, filed on Dec. 21, 1990, abandoned.
US Referenced Citations (5)
Foreign Referenced Citations (7)
Number |
Date |
Country |
0158654 |
Dec 1980 |
JPX |
58-70561 |
Apr 1983 |
JPX |
58-147050 |
Sep 1983 |
JPX |
62-279089 |
Dec 1987 |
JPX |
63-34495 |
Feb 1988 |
JPX |
64-86542 |
Mar 1989 |
JPX |
2-31863 |
Jul 1990 |
JPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
632153 |
Dec 1990 |
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