Claims
- 1. An apparatus for the rapid thermal processing of a substrate, comprising:
- a plurality of radiant energy sources;
- a plurality of light pipes, each light pipe surrounding and extending beyond an associated radiant energy source, said light pipes being mounted next to each other and each serving to direct radiant energy from its associated radiant energy source along an axis of said light pipe towards a backside surface of said substrate to radiate a limited area of said substrate with a pattern of relative radiation intensity, said light pipes and radiant energy sources being spaced so that a portion of the predetermined radiated area of adjacent radiant energy sources overlaps and the intensities at said portions add to provide a radiation intensity across said substrate which is dependent upon the intensity of adjacent radiant energy sources;
- a support on which said substrate sits; and
- a source of processing gas for said substrate, said processing gas source including a gas inlet manifold having a plurality of openings for passing a processing gas to a frontside surface of said substrate.
- 2. An apparatus according to claim 1 wherein said substrate support is rotatable.
- 3. An apparatus according to claim 1 wherein said light pipes extend through a cooling chamber for cooling said light pipes and said radiant energy sources.
- 4. An apparatus according to claim 1 further including a pair of windows sealed together and a plurality of light passageways positioned in a space between said windows in registration with said light pipes.
- 5. An apparatus according to claim 4 wherein said cooling chamber is evacuated.
- 6. An apparatus according to claim 1 wherein a plurality of hollow pipes are inserted into spaces between said light pipes and an optical pyrometer detector is positioned to detect radiant energy emitted from the substrate through said hollow pipes.
- 7. An apparatus according to claim 1 wherein said substrate support has a bearing assembly having a plurality of magnets mounted thereon, an external drive ring having a plurality of magnets so that the resultant magnetic fields are coupled, and a means of driving said external drive ring so that when said external drive ring is rotated, the substrate support within said chamber is rotated.
- 8. An apparatus for rapid thermal processing of a substrate, comprising:
- an evacuable chamber having a window;
- a plurality of radiant energy sources disposed outside of said chamber and positioned adjacent to said window, said radiant energy sources having a central longitudinal axis that extends in a substantially perpendicular direction relative to said window;
- reflectors associated with said radiant energy sources to direct radiant energy through said window to radiate predetermined regions of a backside surface of a substrate in said chamber with a pattern of radiation intensity, said reflectors extending along a major portion of said longitudinal axis of said radiant energy sources and the walls of said reflectors extending in a substantially perpendicular direction relative to said window, and said radiant energy sources and said reflectors positioned so that a portion of a predetermined region radiated by one radiant energy source overlaps a portion of a predetermined region radiated by an adjacent radiant energy source to provide a radiation intensity across the substrate that is dependent upon the intensity of adjacent radiant energy sources;
- a support on which said substrate sits; and
- an injection head to pass a processing gas to a frontside surface of said substrate.
- 9. An apparatus for the rapid thermal processing of a substrate, comprising:
- an evacuable chamber having a window;
- an assembly of radiant energy sources disposed outside of said chamber, said radiant energy sources having a central longitudinal axis that extends in a substantially perpendicular direction relative to said window and subsets of said radiant energy sources disposed at different radii of the assembly, with each radiant energy source terminating in a common plane adjacent to said window;
- reflectors associated with said radiant energy sources to direct radiant energy through said window to radiate predetermined regions of a substrate in said chamber with a pattern of radiation intensity, said reflectors extending along a major portion of said longitudinal axis of said radiant energy sources, and said radiant energy sources and said reflectors positioned so that a portion of a predetermined region radiated by one radiant energy source overlaps a portion of a predetermined region radiated by an adjacent radiant energy source to provide a radiation intensity across the substrate that is dependent upon the intensity of adjacent radiant energy sources;
- a support on which said substrate sits; and
- a source of processing gas for said substrate, said processing gas source including a gas inlet manifold for passing a processing gas to a frontside surface of said substrate.
- 10. An apparatus for the rapid thermal processing of a substrate, comprising:
- an evacuable chamber having a window;
- an assembly of radiant energy sources disposed outside of said chamber, said radiant energy sources having a central longitudinal axis that extends in a substantially perpendicular direction relative to said window and subsets of said radiant energy sources disposed at different radii of the assembly, with each radiant energy source terminating in a common plane adjacent to said window;
- reflectors associated with said radiant energy sources to direct radiant energy through said window to radiate predetermined regions of a substrate in said chamber with a pattern of radiation intensity, said reflectors extending along a major portion of said longitudinal axis of said radiant energy sources and the walls of said reflectors extending in a substantially perpendicular direction relative to said window, and said radiant energy sources and said reflectors positioned so that a portion of one of said predetermined regions radiated by one of said radiant energy sources overlaps a portion of a predetermined region radiated by an adjacent one of said radiant energy sources to provide a radiation intensity across the substrate that is dependent upon the intensity of adjacent radiant energy sources;
- a support on which said substrate sits; and
- a source of processing gas for said substrate, said processing gas source including a gas inlet manifold for passing a processing gas to a frontside surface of said substrate.
- 11. A system for the rapid thermal processing of a substrate, comprising:
- plurality of radiant energy sources having a longitudinal axis;
- light pipes associated with said radiant energy sources to direct radiant energy onto a backside surface of the substrate to radiate predetermined regions of the substrate with a pattern of radiation intensity, said light pipes surrounding and extending along a major portion of said longitudinal axis of said radiant energy sources, and said radiant energy sources and said light pipes positioned so that a portion of one of said predetermined regions radiated by one of said radiant energy sources overlaps a portion of a predetermined region radiated by an adjacent one of said radiant energy sources to provide a radiation intensity across the substrate that is dependent upon the intensity of adjacent radiant energy sources;
- a support on which the substrate sits; and
- a source of processing gas including a gas manifold having a plurality of openings for passing a gas to a frontside surface of the substrate.
- 12. The system of claim 11 wherein said light pipes extend in a substantially perpendicular direction relative to a horizontal plane extending through the substrate.
Parent Case Info
This is a continuation of application Ser. No. 08/508,881, filed Jul. 28, 1995, now abandoned; which is a division of application Ser. No. 08/131,830, filed Oct. 5, 1993, now U.S. Pat. No. 5,487,127; which is a division of application Ser. No. 07/882,656, filed May 13, 1992, now U.S. Pat. No. 5,317,492; which is a division of application Ser. No. 07/781,632, filed Oct. 24, 1991, now U.S. Pat. No. 5,155,336; which is a continuation of application Ser. No. 07/467,808, filed Jan. 19, 1990, now abandoned.
US Referenced Citations (48)
Foreign Referenced Citations (2)
Number |
Date |
Country |
308388 |
Mar 1989 |
EPX |
60-253939 |
Dec 1985 |
JPX |
Non-Patent Literature Citations (2)
Entry |
"Measurement of Dynamic Temperature Uniformity in Rapid Thermal Processing", Solid State Technolofy, May, 1988. |
"Critical Radial Temperature Gradiant Inducing Slip Dislocations in Silicon Epitaxy Using Dual Heating of the Two Surfaces of a Wafer", vol. 25, No. 11, Nov. 1986 pp. 1619-1622. |
Divisions (3)
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Number |
Date |
Country |
Parent |
131830 |
Oct 1993 |
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Parent |
882656 |
May 1992 |
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Parent |
781632 |
Oct 1991 |
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Continuations (2)
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Number |
Date |
Country |
Parent |
508881 |
Jul 1995 |
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Parent |
467808 |
Jan 1990 |
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