This is a divisional of copending application Ser. No. 08/378,750 filed on Jan. 26, 1995.
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4640004 | Thomas et al. | Feb 1987 | |
4782380 | Shankar et al. | Nov 1988 | |
4804636 | Groover, III et al. | Feb 1989 | |
4888297 | Aboelfotoh et al. | Dec 1989 | |
4912543 | Neppl et al. | Mar 1990 | |
4926237 | Sun et al. | May 1990 | |
4981550 | Huttemann et al. | Jan 1991 | |
5066615 | Brady et al. | Nov 1991 | |
5135878 | Bartur | Aug 1992 | |
5142438 | Reinberg et al. | Aug 1992 | |
5231055 | Smith | Jul 1993 | |
5240880 | Hindman et al. | Aug 1993 | |
5275715 | Tuttle | Jan 1994 | |
5278099 | Maeda | Jan 1994 | |
5281838 | Okumura et al. | Jan 1994 | |
5312772 | Yokoyama et al. | May 1994 | |
5341016 | Prall et al. | Aug 1994 |
Number | Date | Country |
---|---|---|
0269211 | Jun 1988 | EPX |
0431721 | Jun 1991 | EPX |
Entry |
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Kolawa, Elzbieta; Halperin, Louis E., Vu, Quat; Nicolet, Marc-A; "Amorphous Ternary Thin-Film Alloys as Diffusion Barriers in Silicon Metallizations," pp. 243-247; California Institute of Technology; 1990. |
Kwok, C.-K., Kolawa, E., Nicolet, M-A., Lee, Ray L.; "Stress and Resistivity in Reactively Supttered Amorphous Metallic Ta-Si-N Films"; California Institute of Technology. 1991. |
Kolawa, E., Molarius, C. W. Nieh, M.-A. Nicolet, "Amorphous Ta-Si-N thin-film alloys as diffusion barrier in Al/Si metallizations;" pp. 3006-3010, J. Vac. Sci. Technol. A8 (3); American Vacuum Society; May/Jun. 1990. |
Reid, J. S., Kolawa, E., Ruiz, P., Nicolet, M-A, "Evaluation of amorphous (Mo, Ta, W)--Si-N diffusion barriers for <Si> cu metallizations," pp. 319-324, California Institute of Technology, Pasadena, California. |
Number | Date | Country | |
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Parent | 378750 | Jan 1995 |