Claims
- 1. A method for treating a workpiece with one or more active species from a plasma, comprising the steps of:
(a) applying power to generate an electric field within a plasma-generation region to generate a one atmosphere uniform glow discharge OAUGD plasma; (b) convecting the one or more active specie(s) away from the plasma-generation region to the workpiece; and (c) subjecting the workpiece to the one or more active specie(s), wherein the workpiece is located outside of the plasma-generation region such that the workpiece is not directly subjected to the plasma or to the electric field within the plasma-generation region.
- 2. The method of claim 1, wherein the active specie(s) are convected away using a paraelectric electrohydrodynamic (EHD) technique.
- 3. The method of claim 1, wherein the active specie(s) are convected away using a peristaltic EHD technique.
- 4. The method of claim 1, wherein the active specie(s) are convected away using a DC mobility drift technique.
- 5. The method of claim 1, wherein the active specie(s) are convected away using a self-propelled plasma.
- 6. The method of claim 1, wherein the active specie(s) are convected away by a blower.
- 7. The method of claim 1, wherein the plasma is generated in air at one atmosphere.
- 8. The method of claim 1, wherein the plasma is generated at room temperature.
- 9. The method of claim 1 wherein the self-propelled plasma conveys oxidizing species with a low heat flux to the workpieces.
- 10. The method of claim 1 wherein the oxidizing species are atomic oxygen, ozone, or nitrogen oxides.
- 11. The method of claim 1, wherein the power is applied to one or more plasma panels located within the plasma-generation region.
- 12. The method of claim 9, wherein each plasma panel comprises a dielectric substrate with an array of strip electrodes on one side of the substrate and a sheet electrode on another side of the substrate.
- 13. The method of claim 9, wherein each plasma panel comprises a dielectric substrate with a first array of strip electrodes on one side of the substrate and a second array of strip electrodes on another side of the substrate, wherein the strip electrodes of the first array are positioned asymmetrically with respect to the strip electrodes of the second array.
- 14. The method of claim 1, wherein the method is used to sterilize or decontaminate the workpiece.
- 15. The method of claim 1, wherein the workpiece comprises one or more electronic components and the method is used to treat the one or more electronic components.
- 16. The method of claim 1, wherein the workpiece is a film or fabric and the method is used to change one or more surface characteristics of the film or fabric.
- 17. The method of claim 1, wherein the method is used to perform plasma chemical vapor deposition on the workpiece.
- 18. The method of claim 1, wherein the method is used to perform plasma etching on the workpiece.
- 19. A remote-exposure reactor, comprising:
(a) a plasma generator defining a plasma-generation region and having one or more plasma panels adapted to be configured to a power supply to generate an OAUGD plasma within the plasma-generation region, wherein one or more active specie(s) of the plasma are convected away from the plasma-generation region to the workpiece by conveying away means; and (b) means for subjecting a workpiece located outside of the plasma-generation region to the one or more active specie(s) such that the workpiece is not directly subjected to the plasma or to the electric field within the plasma-generation region.
- 20. The reactor of claim 19, wherein the convection away of the plasma past the panels is by using a paraelectric EHD technique.
- 21. The reactor of claim 19, wherein the convection away of the plasma past the panels is by using a peristaltic EH) technique.
- 22. The reactor of claim 19, wherein the convection away of the plasma past the panels is by using a DC mobility drift technique.
- 23. The reactor of claim 19, wherein the convection away of the plasma past the panels is by a self-propelled plasma.
- 24. The reactor of claim 19, wherein the convection away from the plasma generating region by a blower means.
- 25. The reactor of claim 19, wherein the plasma is generated in air at one atmosphere.
- 26. The reactor of claim 19, wherein the active species are oxidizing species carried within a low heat flux of the plasma.
- 27. The reactor of claim 26, wherein the active species are atomic oxygen, ozone or nitrogen oxides.
- 28. The reactor of claim 20, wherein the plasma is a one-atmosphere uniform glow discharge plasma.
- 29. The reactor of claim 19, wherein each plasma panel comprises a dielectric substrate with an array of strip electrodes on one side of the substrate and a sheet electrode on another side of the substrate.
- 30. The reactor of claim 19, wherein each plasma panel comprises a dielectric substrate with a first array of strip electrodes on one side of the substrate and a second array of strip electrodes on another side of the substrate, wherein the strip electrodes of the first array are positioned asymmetrically with respect to the strip electrodes of the second array.
- 31. The reactor of claim 19, further comprising a blower means to assist in convecting the one or more active species away from the plasma-generation region.
- 32. The reactor of claim 19, wherein the plasma generator comprises a plurality of plasma panels configured in an air baffle such that the one or more active species are convected in a serpentine manner through the plasma-generation region.
- 33. The reactor of claim 19, wherein means (b) comprises a remote-exposure chamber configured to receive the one or more active species that are convected away from the plasma-generation region and adapted to hold the workpiece, whereby the workpiece is subjected to the one or more active species within the remote-exposure chamber.
- 34. The reactor of claim 33, further comprising tubing configured to supply gas to the plasma-generation region and to remove gas from the remote-exposure chamber.
- 35. The reactor of claim 34, wherein the tubing is configured with one or more valves to control whether the gas removed from the remote-exposure chamber is recirculated back through the gas-generation region or exhausted from the remote-exposure reactor.
- 36. The reactor of claim 19, wherein means (b) comprises tubing configured to receive the one or more active species that are convected away from the plasma-generation region and to direct the one or more active species onto the workpiece.
- 37. The reactor of claim 34, wherein the remote-exposure reactor is configured as a portable backpack unit and the tubing comprises a hand-held wand for directing the one or more active species onto the workpiece.
Priority Claims (1)
Number |
Date |
Country |
Kind |
PCT/US99/00480 |
Jan 1999 |
US |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the benefit of the filing date of U.S. provisional application No. 60/070,779, filed on Jan. 8, 1998 as attorney docket no. 372.6620PROV, and U.S. provisional application No. 60/082,645, filed on Apr. 22, 1998 as attorney docket no. 372.6654PROV.
Provisional Applications (2)
|
Number |
Date |
Country |
|
60070779 |
Jan 1998 |
US |
|
60082645 |
Apr 1998 |
US |
Divisions (1)
|
Number |
Date |
Country |
Parent |
09362471 |
Jul 1999 |
US |
Child |
10156394 |
May 2002 |
US |