Number | Name | Date | Kind |
---|---|---|---|
3819265 | Feldman et al. | Jun 1974 | |
4171870 | Bruning et al. | Oct 1979 | |
4748477 | Isohata et al. | May 1988 | |
4749867 | Matsushita et al. | Jun 1988 | |
5285236 | Jain | Feb 1994 | |
5298939 | Swanson et al. | Mar 1994 | |
5369521 | Yoshino | Nov 1994 | |
5401934 | Ainsworth et al. | Mar 1995 |
Number | Date | Country |
---|---|---|
0 354 148 | Feb 1990 | EPX |
Entry |
---|
Goodall, F., et al., "Excimer Lasers As Deep UV Sources for Photolithographic System", Microelectronic Engineering, 5:455-452 (1986). |
Muller et al., "Large Area Fine Line Patterning by Scanning Projection Lithography," MCI '94 Proceedings, 1994, pp. 100-104. |
Greed, Jr., et al., "Variable Magnification in a 1:1 Projection Lithography System," SPIE vol. 334 Optical Microlithography Technology for Mid-1980s 1982, pp. 2-9. |