Tsukamoto et al., "Self-aligned titanium silicidation by lamp annealing" Extended Abstracts of the 16th (1984 International) Conference on Solid State Devices and Materials, Kobe, 1984, pp. 47-50. |
Moy et al., "Use of thin titanium salicides for submicron VLSI CMOS" Proc. 1st Int. Symp. ULSI Science and Technology, Philadelphia, 1987 (Electrochemical Society, Pennington, 1987), pp. 381-392. |
Ogawa et al., "Dependence of thermal stability of the titanium silicide/silicon structure on impurities" Appl. Phys. Lett. (1990) 56(8):725-727. |
Georgiou et al., "Thermal stability limits of thin TiSi.sub.2. Effect on submicron line resistance and shallow junction leakage" J. Electrochem. Soc. (1994) 141(5):1351-1356. |
Lasky et al., "Comparison of transformation to low-resistivity phase and agglomeration of TiSi.sub.2 and CoSi.sub.2 " IEEE Transactions on Electron Devices (1991) 38(2):262-268. |