SEMICONDUCTOR DEVICE HAVING A PASSIVE DEVICE

Abstract
The present invention relates to a semiconductor device having a passive device. The semiconductor device includes a substrate and at least one passive device. The substrate has at least one via. The via has at least two conductive elements therein. The conductive elements are not electrically connected to each other. The passive device has at least two electrodes, and is disposed on the substrate. The electrodes are electrically connected to the conductive elements respectively. The passive device needs only one via, so the amount of vias can be reduced effectively. In addition, the conductive path formed by the conductive elements and the passive device is relatively short, so that the inductance is lowered and the electrical performance is raised.
Description

BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 shows a schematic view of a conventional semiconductor device having a passive device;



FIG. 2 shows a schematic exploded view of a semiconductor device having a passive device according to the present invention; and



FIG. 3 shows a schematic assembly view of a semiconductor device having a passive device according to the present invention.





DETAILED DESCRIPTION OF THE INVENTION


FIGS. 2 and 3 show a schematic exploded view and a schematic assembly view of a semiconductor device having a passive device according to the present invention, respectively. The semiconductor device 2 includes a substrate 21 and at least one passive device 22. The substrate 21 has an upper surface 211, a lower surface (not shown), a via 213, a ground layer 25, a power layer 26, and a plurality of dielectric layers 214. The via 213 opens to the first upper surface 211, and has at least two conductive elements therein. The conductive elements are exposed outside the first upper surface 211, and are not electrically connected to each other. The via 213 can be a blind hole or through hole. The ground layer 25 and the power layer 26 are completely distributed or partially distributed between two dielectric layers 214, respectively.


In this embodiment, the via 213 has a first conductive element 23 and a second conductive element 24 therein. The first conductive element 23 and the second conductive element 24 are separated and not electrically connected to each other, and are formed by, for example, filling a conductive element (for example, metal) in the via 213, and then cutting the conductive element into two halves by means of laser sawing. Moreover, the separated first conductive element 23 and second conductive element 24 can be formed by another method. In this embodiment, the first conductive element 23 and the second conductive element 24 are semicircular, and have substantially the same areas. However, it is understood that the first conductive element 23 and the second conductive element 24 can be in another configuration. In this embodiment, the first conductive element 23 is electrically connected to the ground layer 25 and is electrically insulated from the power layer 26. The second conductive element 24 is electrically connected to the power layer 26 and electrically insulated from the ground layer 25. That is, the first conductive element 23 and the second conductive element 24 are respectively connected to different electric potentials. However, it is understood that the first conductive element 23 and the second conductive element 24 can be connected to the same electric potential.


The passive device 22 (for example, a capacitor with a 0402 or 0201 model, a resistor, or an inductor) has a first end electrode 221 and a second end electrode 222. The passive device 22 is disposed on the upper surface 211 of the substrate 21, and the first end electrode 221 and the second end electrode 222 are electrically connected to the first conductive element 23 and the second conductive element 24, respectively. In this embodiment, the first end electrode 221 directly contacts the first conductive element 23 and is electrically connected to the ground layer 25. The second end electrode 222 directly contacts the second conductive element 24 and is electrically connected to the power layer 26.


In other applications, if the size of the via 213 is smaller than that of the passive device 22, so the first end electrode 221 and the second end electrode 222 cannot directly contact the first conductive element 23 and the second conductive element 24, a first conductive trace and a second conductive trace can be added to the upper surface 211 of the substrate 21. The first conductive trace is used to connect the first end electrode 221 and the first conductive element 23, and the second conductive trace is used to connect the second end electrode 222 and the second conductive element 24.


In another embodiment, the via 213 penetrates the substrate 21, so that the first conductive element 23 and the second conductive element 24 are further exposed outside the lower surface of the substrate 21. Moreover, if another passive device is disposed on the lower surface of the substrate 21, the first conductive element 23 and the second conductive element 24 can be connected by the above-mentioned method.


The present invention has the following advantages. In the semiconductor device 2, the passive device 22 needs only one via (the via 213), so the amount of vias 213 will not be greatly increased when the number of the passive device 22 increases. Further, the via 213 is located right below the passive device 22 and does not take up additional space, and thus more passive devices 22 can be disposed on the substrate 21. In addition, the conductive path formed by the first conductive element 23, the passive device 22, and the second conductive element 24 is relatively short, so that the inductance is lowered and the electrical performance is raised.


While several embodiments of the present invention have been illustrated and described, various modifications and improvements can be made by those skilled in the art. The embodiments of the present invention are therefore described in an illustrative but not restrictive sense. It is intended that the present invention may not be limited to the particular forms as illustrated, and that all modifications which maintain the spirit and scope of the present invention are within the scope as defined in the appended claims.

Claims
  • 1. A semiconductor device having a passive device, comprising: a substrate, having at least one via, the via having at least two conductive elements therein, and the conductive elements being not electrically connected to each other; andat least one passive device, having at least two electrodes, the passive device being disposed on the substrate, and the electrodes being electrically connected to the conductive elements respectively.
  • 2. The semiconductor device as claimed in claim 1, wherein the conductive elements are formed by laser sawing.
  • 3. The semiconductor device as claimed in claim 1, wherein the substrate has an upper surface, the conductive elements are exposed outside the upper surface of the substrate, and the passive device is disposed on the upper surface of the substrate.
  • 4. The semiconductor device as claimed in claim 3, wherein the substrate further has a lower surface, and the via penetrates the substrate, so that the conductive elements are further exposed outside the lower surface of the substrate, and another passive device is disposed on the lower surface of the substrate.
  • 5. The semiconductor device as claimed in claim 1, wherein the conductive elements comprise a first conductive element and a second conductive element, the first conductive element is electrically connected to a ground layer, and the second conductive element is electrically connected to a power layer.
  • 6. The semiconductor device as claimed in claim 1, wherein the passive device is a capacitor, a resistor, or an inductor.
  • 7. The semiconductor device as claimed in claim 6, wherein the electrodes are end electrodes.
  • 8. The semiconductor device as claimed in claim 1, wherein the substrate further comprises a plurality of conductive traces, for connecting the electrodes and the conductive elements.
  • 9. The semiconductor device as claimed in claim 1, wherein the electrodes directly contact the conductive elements.
  • 10. The semiconductor device as claimed in claim 1, wherein the passive device is disposed above the conductive elements.
  • 11. The semiconductor device as claimed in claim 1, wherein the conductive elements are respectively connected to different electric potentials.
Priority Claims (1)
Number Date Country Kind
095139023 Oct 2006 TW national