CROSS-REFERENCE TO RELATED APPLICATION
This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0145526 filed in the Korean Intellectual Property Office on Oct. 27, 2023, the entire contents of which is incorporated herein by reference.
BACKGROUND
(a) Field
The present disclosure relates to semiconductor memory devices. More particularly, the present disclosure relate to semiconductor memory devices having a structure in which a memory cell array and a bit line sense amplifier (BLSA; also referred to as a sense amplifier, hereinafter) are positioned on different wafers and vertically overlap.
(b) Description of the Related Art
Semiconductor memory devices may be classified into volatile memory devices and non-volatile memory devices. Volatile memory devices lose stored data when the power supply is cut off, whereas non-volatile memory devices retain stored data even when the power supply is cut off. Volatile memory devices include DRAM, FRAM, or the like.
In order to improve the integration of semiconductor memory devices, various cell structures are being developed, and a structure in which the memory cell array and the sense amplifier that detects the data stored in the memory cells are formed on different chips and arranged to vertically overlap each other is being developed.
SUMMARY
Some example embodiments provide semiconductor memory devices with stacked chips structure in which wires are efficiently disposed.
Some example embodiment reduce coupling between a bit line and a complementary bit line in a semiconductor memory device with stacked chips structure.
According to an example embodiment, a semiconductor memory device includes a first chip including a first array matrix and a second array matrix adjacent to each other, the first array matrix and the second array matrix each including a plurality of memory cells, and a second chip below the first chip, the second chip including a plurality of sense amplifiers configured to drive the memory cells of the first array matrix and the second array matrix. A plurality of first cell bit lines are in the first array matrix, a plurality of second cell bit lines are in the second array matrix, and a plurality of first bit lines and a plurality of first complementary bit lines are below the first array matrix, and a plurality of second bit lines and a plurality of second complementary bit lines are below the second array matrix. Each of the first bit lines is connected to one of the first cell bit lines, each of the first complementary bit lines is connected to one if the second cell bit lines, each of the second bit lines is connected to one of the second cell bit lines, each of the second complementary bit lines is connected to one of the first cell bit lines, and the sense amplifiers include a plurality of first sense amplifiers of which at least a portion is below the first array matrix and a plurality of second sense amplifiers of which at least a portion is below the second array matrix. A pair of one of the first bit lines and a corresponding one of the first complementary bit lines are connected to a corresponding one of the first sense amplifiers, and a pair of one of the second bit lines and a corresponding one of the second complementary bit lines are connected to a corresponding one of the second sense amplifiers.
According to an example embodiment, a semiconductor memory device includes a first chip including an array matrix including a plurality of memory cells, and a second chip including a plurality of sense amplifiers, the sense amplifiers being below the first chip and configured to drive memory cells of the array matrix. A plurality of cell bit lines are in the array matrix, a plurality of bit lines and a plurality of complementary bit lines are below the array matrix, a pair of one of the bit lines and a corresponding one of the complementary bit lines are connected to a corresponding one of the sense amplifiers, and at least one of a shield line, a second one of the bit lines, or a second one of the complementary bit lines is between a pair of one of the bit lines and a corresponding one of the complementary bit lines commonly connected to a corresponding one of the sense amplifiers.
According to an example embodiment, a semiconductor memory device includes a first chip including an array matrix including a plurality of memory cells, and a second chip including a plurality of sense amplifiers, the sense amplifiers being below the first chip and configured to drive memory cells of the array matrix. A plurality of cell bit lines are in the array matrix, a plurality of bit lines and a plurality of complementary bit lines are below the array matrix, and a pair of one of the bit lines and a corresponding one of the complementary bit lines are connected to a corresponding one of the sense amplifiers. The second chip includes a plurality of lower bonding pads, a plurality of first connection layers, and a plurality of second connection layers that connect the bit lines and the complementary bit lines to the sense amplifiers. One of the first connection layers is connected to a first input terminal of a corresponding one of the sense amplifiers, and a corresponding one of the second connection layers is connected to a second input terminal of the corresponding one of the sense amplifiers, each of the first connection layers is connected to a corresponding one of the lower bonding pads, and each of the second connection layers is connected to a corresponding one of the lower bonding pads.
According to an example embodiment, by efficiently disposing a wire connecting the memory cell and the sense amplifier, the length of the wire may be reduced.
According to an example embodiment, by disposing wires connecting other bit lines or complementary bit lines to the sense amplifier between wires connecting the bit line and the complementary bit line to the sense amplifier, coupling between the bit line and the complementary bit line may be reduced.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a layout view of a semiconductor memory device according to an example embodiment.
FIG. 2 is a cross-sectional view showing a connection between the sense amplifier and BLB1 of FIG. 1.
FIG. 3 is a cross-sectional view showing a connection between the sense amplifier and BL1 of FIG. 1.
FIG. 4 is a cross-sectional view showing a connection between the sense amplifier and BL3 of FIG. 1.
FIG. 5 is a cross-sectional view showing a connection between the sense amplifier and BLB3 of FIG. 1.
FIG. 6 is an enlarged layout view of portion A1 of FIG. 1.
FIG. 7 is a cross-sectional view taken along line A-A′ of FIG. 6.
FIG. 8 is a layout view showing a connection of wires, centered on the bonding pad with different aspect ratios of portion A2 of FIG. 6.
FIG. 9 is a schematic view showing a connection between the sense amplifier and the bonding pad on a peripheral circuit chip in a semiconductor memory device according to an example embodiment.
FIG. 10 is a schematic view showing a connection between the sense amplifier and the bonding pad on a peripheral circuit chip in a semiconductor memory device according to another example embodiment.
DETAILED DESCRIPTION
The present disclosure will be described more fully hereinafter with reference to the accompanying drawings, in which some example embodiments of the disclosure are shown. As those skilled in the art would realize, the described example embodiments may be modified in various different ways without departing from the spirit or scope of the present disclosure.
The drawings and the descriptions described herein should be considered in a descriptive sense only and not for purposes of limitation. Throughout the specification, the same reference numbers indicate the same constituent elements.
In the drawings, the size and thickness of each constituent element may be arbitrarily shown for better understanding and ease of description, and the present disclosure is not necessarily limited to what is shown in the drawings. In the drawings, the thickness of layers, films, plates, panels, regions, areas, and the like may be exaggerated for clarity. In the drawings, the thickness of some layers, areas, and regions may be exaggerated for better understanding and ease of description.
As used herein, the singular forms (for example, a, an, and the) are intended to include the plural forms as well (and vice versa), unless the context clearly indicates otherwise.
In the specification and the claims, the term “and/or” is intended to include any combination of the terms “and” and “or” for the purpose of its meaning and interpretation. For example, “A and/or B” may be understood to mean “A, B, or A and B.”
In the specification and the claims, the phrase “at least one of” is intended to include the meaning of “at least one selected from the group of” for the purpose of its meaning and interpretation. For example, “at least one of A and B” and “at least one of A or B” may be understood to mean “A, B, or A and B.”
Terms such as first, second, and the like will be used only to describe various constituent elements, and are not to be interpreted as limiting these constituent elements. The terms are only used to differentiate one constituent element from other constituent elements. For example, a first constituent element could be termed a second constituent element, and similarly, a second constituent element could be termed as a first constituent element, without departing from the scope of the present disclosure.
When an element, such as a layer, a film, a region, an area, or a substrate is described to be “above” another element, it may be directly above another element or there may be an intermediate element. In contrast, when a first element is described to be “directly above” a second element, there is no intermediate element. Throughout the specification, the term “above” a target must be “understood as being disposed above or below the target element, and does not necessarily signify “above” with respect to an opposite direction of gravity.
For example, spatially relative terms “below” or “above” may be used to facilitate the description of the relationship of one element or a constituent element to other constituent elements as shown in the drawings. The spatially relative terms are intended to include other directions in use or operation in addition to the directions shown in the drawings. For example, when the device shown in the drawing is flipped, the device disposed below another device may be disposed “above” the other device. Therefore, the example term “below” may include lower and upper positions. The device may also be oriented in other directions, the spatially relative term may be analyzed differently depending on the directions.
When an element (or region, area, layer, portion, etc.) is described to be “connected” or “combined” to another element in the specification, it may be directly disposed, connected, or combined on the above-noted other element, or an element may be disposed therebetween.
The term “connected to” or “combined to” may include physical or electrical connections or combinations.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and/or the present specification, and should not be interpreted in an idealized or overly formal sense, unless expressly so defined herein.
FIG. 1 is a layout view of a semiconductor memory device according to an example embodiment. FIG. 2 is a cross-sectional view showing a connection between the sense amplifier and BLB1 of FIG. 1. FIG. 3 is a cross-sectional view showing a connection between the sense amplifier and BL1 of FIG. 1. FIG. 4 is a cross-sectional view showing a connection between the sense amplifier and BL3 of FIG. 1. FIG. 5 is a cross-sectional view showing a connection between the sense amplifier and BLB3 of FIG. 1.
Referring to FIG. 1, a semiconductor memory device may include a plurality of array matrices AM1, AM2, and AM3 each including a plurality of memory cells. Each of the plurality of array matrices AM1, AM2, and AM3 may include a plurality of cell bit lines GBL and a plurality of wordlines, and memory cells may be disposed in regions where the plurality of cell bit lines GBL and the plurality of wordlines intersect. Here, the plurality of memory cells may be volatile memory cells such as DRAM, resistive memory cells such as phase-change RAM (PRAM) and resistive RAM (RRAM), or may be nano-floating gate memory (NFGM), polymer RAM (PoRAM), magnetic RAM (MRAM), ferroelectric RAM (FeRAM) or flash memory cells. Each memory cell may include a cell capacitor and a transistor, which connects or blocks the cell capacitor to a cell bit line GBL, and the transistor includes a channel that is turned on and off according to a wordline (WL) signal. Here, the channel may be formed perpendicular to the array matrices AM1, AM2, and AM3, and may connect the cell bit line GBL below the channel to a cell capacitor above the channel.
The cell bit line GBL included in two neighboring ones of the array matrices AM1, AM2, and AM3 are separated, and the cell bit line GBL, the wordline, and the memory cell may not be disposed in a boundary region between the array matrices AM1, AM2, and AM3.
Each of the cell bit line GBL may be connected to bit lines BL0, BL1, BL2, and . . . or complementary bit lines BLB0, BLB1, BLB2, and. . . . A bit of data may be read based on the difference between a signal on a specific bit line and a signal on a complementary bit line corresponding to the specific bit line, instead of being based on a signal from either a bit line or a complementary bit line by itself. Referring to FIG. 1, an uppermost cell bit line GBL of a second array matrix AM2 may be connected to a complementary bit line BLB0, and the cell bit lines GBL thereunder may be sequentially connected a bit line BL1, a bit line BL2, a complementary bit line BLB3, a complementary bit line BLB4, a bit line BL5, a bit line BL6, a complementary bit line BLB7, complementary bit lines BLB8, and. . . . The connection of the cell bit line GBL and the bit lines BL0, BL1, BL2, and . . . or the complementary bit lines BLB0, BLB1, BLB2, and . . . may be made in a boundary region between the array matrices AM1, AM2, and AM3.
Referring to FIG. 1, FIG. 2, FIG. 3, FIG. 4 and FIG. 5, the bit lines BL0, BL1, BL2, and . . . and the complementary bit lines BLB0, BLB1, BLB2, and . . . may be positioned in a different layer from the memory cells, specifically, below the memory cells. The bit lines BL0, BL1, BL2, and . . . and the complementary bit lines BLB0, BLB1, BLB2, and . . . may be a portion of a wire connecting the cell bit line GBL and a sense amplifier BLSA.
Referring to FIG. 2, FIG. 3, FIG. 4 and FIG. 5, a semiconductor memory device according to an example embodiment may include a memory cell array chip 1 in which the plurality of memory cells are positioned and a peripheral circuit chip 2 in which the sense amplifier BLSA are positioned.
The memory cell array chip 1 may include a cell capacitor 11, a vertical channel transistor 12, the cell bit line GBL, a bit line shield layer 14, upper wires LM0, LM1, LM2, and LM3 and an upper via V1 forming at least a portion of the bit lines BL1 and BL3 and complementary bit lines BLB1 and BLB3, an upper bonding pad P1, or the like. The upper bonding pad P1 may include copper (Cu). The cell capacitor 11 may be connected to the cell bit line GBL through the vertical channel transistor 12, and the cell bit line GBL may be connected to the bit lines BL1 and BL3 or the complementary bit lines BLB1 and BLB3 that include at least a portion of the upper via V1 and the upper wires LM0, LM1, LM2, and LM3 in a boundary region between the array matrices AM1, AM2, and AM3. Between the cell capacitor 11, the vertical channel transistor 12, the cell bit line GBL, the bit line shield layer 14, the upper wires LM0, LM1, LM2, and LM3, the upper via V1, the upper bonding pad P1, or the like, a single or a plurality of insulation layers may be positioned so as to insulate them from each other. The bit line shield layer 14 may be a layer to block or prevent the cell bit line GBL from being affected by an electric signal flowing through a circuit wire thereunder. That is, the bit line shield layer 14 may act as a shield for the cell bit line GBL against electromagnetic effects caused by the electric signal flowing through a circuit wire thereunder. The peripheral circuit chip 2 may include various peripheral circuits for driving memory cells such as a sub-wordline driver, a row decoder, a column decoder as well as the sense amplifier BLSA. In addition, the peripheral circuit chip 2 may include a lower bonding pad P2, lower wires M1, M2, M3, M4, and M5 connecting the sense amplifier BLSA and the lower bonding pad P2, a connection layer BP, a lower via V2, and the like. The lower bonding pad P2 may include copper. The sense amplifier BLSA may be positioned below the array matrices AM1, AM2, and AM3, and may vertically overlap the cell bit line GBL and the bit lines BL1 and BL3, and the complementary bit lines BLB1 and BLB3. The connection layer BP may include polysilicon. The memory cell array chip 1 and the peripheral circuit chip 2 may be bonded such that the upper bonding pad P1 and the lower bonding pad P2 are aligned to contact each other. Through such bonding, the cell bit line GBL may be connected to the sense amplifier BLSA.
Referring to FIG. 1, FIG. 2, FIG. 3, FIG. 4 and FIG. 5, the bit line BL1 and the complementary bit line BLB1 may extend below the array matrix AM2, which is on the left side of a boundary region between the array matrix AM2 and the array matrix AM3 (hereinafter, referred to as a “boundary region left side”), and a bit line BL3 and the complementary bit line BLB3 may extend below an array matrix AM3 on the right side of the boundary region between the array matrix AM2 and the array matrix AM3 (hereinafter, referred to as a “boundary region right side”). Subsequently, the bit line BL5 and a complementary bit line BLB5 may extend below the array matrix AM2 on the boundary region left side, and a bit line BL7 and the complementary bit line BLB7 may extend below the array matrix AM3 on the boundary region right side. As such, in the boundary region between the array matrix AM2 and the array matrix AM3, odd numbered bit lines BL1, BL3, BL5, and . . . and odd numbered complementary bit lines BLB1, BLB3, BLB5, and . . . may be connected to the cell bit line GBL, and the bit lines BL1, BL3, BL5, and . . . and the complementary bit lines BLB1, BLB3, BLB5, and . . . corresponding thereto may extend in the same direction. In addition, the bit lines BL1, BL3, BL5, and . . . and the complementary bit lines BLB1, BLB3, BLB5, and . . . corresponding thereto may alternately extend to the left and to the right sequentially from the top.
As such, when the bit lines BL1, BL3, BL5, and . . . and the complementary bit lines BLB1, BLB3, BLB5, and . . . corresponding thereto extend in the same direction and alternately extend left and right, wires may be efficiently disposed, such that their lengths may be reduced.
FIG. 6 is an enlarged layout view of portion A1 of FIG. 1. FIG. 7 is a cross-sectional view taken along line A-A′ of FIG. 6. FIG. 8 is a layout view showing a connection of wires, centered on the bonding pad with different aspect ratios of portion A2 of FIG. 6.
Referring to FIG. 6, between bit lines BL0, BL8, and . . . and complementary bit lines BLB4, BLB12, and . . . , between two sense amplifier BLSA neighboring each other, a shield line BLS may be positioned, respectively. The shield line BLS may reduce signal interference between bit line and complementary bit line neighboring each other.
Referring to FIG. 6 and FIG. 7, the shield line BLS, some bit lines BL4, BL12, BL20, BL28, and . . . and some complementary bit lines BLB0, BLB8, BLB16, BLB24, and . . . may extend in a straight line, and remainders (e.g., the bit lines BL0, BL8, BL16, BL24, and . . . and the complementary bit lines BLB4, BLB12, BLB20, a BLB 28, and . . . ) may be refracted lines having plural bent points. Depending on example embodiments, the bit lines BL0, BL8, BL16, BL24, and . . . and the complementary bit lines BLB4, BLB12, BLB20, the BLB 28, and . . . may straight lines, and the bit lines BL4, BL12, BL20, BL28, and . . . and the complementary bit lines BLB0, BLB8, BLB16, BLB24, and . . . may be refracted lines. The straight lines and the refracted lines may be selected in various ways. The shield line BLS, some the bit lines (e.g., BL4, BL12, BL20, BL28, and . . . ) and some the complementary bit lines (e.g., BLB0, BLB8, BLB16, BLB24, and . . . ) that extend in straight lines may include a third upper wire LM2, and some of the bit lines (e.g., BL0, BL8, BL16, BL24, and . . . ) and some of the complementary bit lines (e.g., BLB4, BLB12, BLB20, the BLB 28, and . . . ) that are refracted lines may include the third upper wire LM2, a fourth upper wire LM3, and the upper via V1 connecting the third upper wire LM2, a fourth upper wire LM3 to each other. The bit lines BL0, BL8, BL16, BL24, and . . . and the complementary bit lines BLB4, BLB12, BLB20, the BLB28, and . . . that are refracted lines may include two portions positioned at both sides interposing the shield line BLS and/or the bit lines BL0, BL8, BL16, BL24, and . . . , respectively, and these two portions may be connected to each other by crossing the shield line BLS and/or the bit lines BL0, BL8, BL16, BL24, and . . . disposed therebetween, in an insulated state. At this time, two portions positioned at both sides of the shield line BLS and/or the bit lines BL0, BL8, BL16, BL24, and . . . may be the third upper wire LM2, and a portion connecting these two portions may be the fourth upper wire LM3 and the upper via V1. For example, referring to FIG. 7, two portions BLB12 (LM2) of a complementary bit line BLB12 may be positioned at both sides of a shield line BLS (LM2) and a bit line BL8 (LM2), a connection portion BLB12 (LM3) connecting these two portions BLB12 (LM2) may be positioned thereunder in a different layer, and the connection portion BLB12 (LM3) may be connected to the two portions BLB12 (LM2) of the complementary bit line BLB12 through the upper via V1.
Through the example arrangements, it is possible to block or prevent the bit line and the corresponding complementary bit line from neighboring each other. That is, through the example embodiments above, a first bit line and a second bit line that is complementary to the first bit line may be arranged in a way that they are not directly adjacent to each other. For example, at least one of another bit line, another complementary bit line, or a shield line may be located between the bit line and the corresponding complementary bit line. For example, referring to FIG. 6, a portion of the complementary bit line BLB4 and a bit line BL4 may be positioned between the complementary bit line BLB0 and a bit line BL0. The bit line BL0 and the shield line BLS may be positioned between the bit line BL4 and the complementary bit line BLB4. Through these example arrangements, signal interference between the bit line and the complementary bit line corresponding thereto may be mitigated.
Referring to FIG. 6 and FIG. 8, bit lines BL0, BL4, BL8, BL12, BL16, BL20, BL24, BL28, and . . . and complementary bit lines BLB0, BLB4, BLB8, BLB12, BLB16, BLB20, BLB24, BLB28, and . . . may be connected to one of the fourth upper wire LM3 that vertically extend. Referring to FIG. 8, the complementary bit line BLB0 may be connected to a fourth upper wire LM31 through the upper via V1, and the bit line BL0 may be connected to a fourth upper wire LM35 through the upper via V1. Subsequently, a complementary bit line BLB8 may be connected to a fourth upper wire LM32 through the upper via V1, and the bit line BL8 may be connected to a fourth upper wire LM36 through the upper via V1. A complementary bit line BLB16 may be connected to a fourth upper wire LM33 through the upper via V1, and a bit line BL16 may be connected to a fourth upper wire LM37 through the upper via V1. A complementary bit line BLB24 may be connected to a fourth upper wire LM34 through the upper via V1, and a bit line BL24 may be connected to a fourth upper wire LM38 through the upper via V1.
Referring to FIG. 2 and FIG. 8, a fourth upper wires LM3 (LM31, LM32, LM33, LM34, LM35, LM36, LM37, LM38) that vertically extend may be connected to the upper bonding pad P1 through a contact hole C1. The upper bonding pad P1 may be bonded to the lower bonding pad P2 and thereby may be connected to a sense amplifier BLSA (BLSA0, BLSA8, BLSA16, BLSA24), respectively, through the lower wires M1, M2, M3, M4, and M5, the connection layer BP, the lower via V2, and the like.
FIG. 8 illustrates the upper bonding pad P1 in an elliptical shape, but depending on example embodiments, it may be a circle, a polygon, or the like. FIG. 8 illustrates that the upper bonding pad P1 are positioned in line above the two central sense amplifiers BLSA8 and BLSA16, but depending on example embodiments, they may be positioned above other sense amplifiers BLSA1 and BLSA24, or their positions may be vertically altered.
FIG. 9 is a schematic view showing a connection between the sense amplifier and the bonding pad on a peripheral circuit chip in a semiconductor memory device according to an example embodiment.
Referring to FIG. 9, the sense amplifier BLSA may include a plurality of NMOS sense amplifier drivers (NSA), a plurality of PMOS sense amplifier drivers (PSA), a bit line lead-in line BL input or connected to one of the NSAs, and a complementary bit line lead-in line BLB input or connected to one of the PSAs. Above the sense amplifier BLSA, a first connection layer BP1 and a second connection layer BP2 may be positioned, the first connection layer BP1 may be connected to the bit line lead-in line BL, and the second connection layer BP2 may be connected to the complementary bit line lead-in line BLB. The first connection layer BP1 may be positioned to correspond to lower bonding pads P21, P22, P23, and P24 on the left side half among a plurality of lower bonding pads P21, P22, P23, P24, P25, P26, P27, and P28, and the second connection layer BP2 may be positioned to correspond to lower bonding pads P25, P26, P27, and P28 on the right side half among the plurality of lower bonding pads P21, P22, P23, P24, P25, P26, P27, and P28. The first connection layer BP1 and the second connection layer BP2 may include polysilicon. The first connection layer BP1 may be connected to one (e.g., P21) of the lower bonding pads P21, P22, P23, and P24 on the left side, and the second connection layer BP2 may be connected to one (e.g., P25) of the lower bonding pads P25, P26, P27, and P28 on the right side. When the first connection layer BP1 and the second connection layer BP2 are disposed as such, the wire for connecting the lower bonding pads P21, P22, P23, P24, P25, P26, P27, and P28 and the sense amplifier BLSA may be efficiently disposed, and accordingly, the length of wire may be reduced.
FIG. 10 is a schematic view showing a connection between the sense amplifier and the bonding pad on a peripheral circuit chip in a semiconductor memory device according to another example embodiment.
Referring to FIG. 10, the sense amplifier BLSA may include a plurality of NMOS sense amplifier drivers (NSA), a plurality of PMOS sense amplifier drivers (PSA), and a bit line lead-in line (or a bit line) BL input or connected to one of the NSAs and a complementary bit line lead-in line (or a complementary bit line) BLB input or connected to one of the PSAs. Above the sense amplifier BLSA, the first connection layer BP3 and the second connection layer BP4 may be positioned, and the first connection layer BP3 may be connected to the bit line lead-in line BL, and the second connection layer BP4 may be connected to the complementary bit line lead-in line BLB. All of the first connection layer BP1 and the second connection layer BP2 may be positioned to correspond to all of the plurality of lower bonding pads P21, P22, P23, P24, P25, P26, P27, and P28. The first connection layer BP1 and the second connection layer BP2 may include polysilicon. The first connection layer BP1 and the second connection layer BP2 may be positioned in a different layer, or may be positioned on the same layer but at different position on the same plane. The first connection layer BP1 may be connected to one (e.g., P21) of the lower bonding pads P21, P22, P23, and P24 on the left side, and the second connection layer BP2 may be connected to one (e.g., P25) of the lower bonding pads P25, P26, P27, and P28 on the right side. When the first connection layer BP1 and the second connection layer BP2 are disposed as such, the wire for connecting the lower bonding pads P21, P22, P23, P24, P25, P26, P27, and P28 and the sense amplifier BLSA may be efficiently disposed, and accordingly, the length of wire may be reduced.
Referring again to FIG. 10, a group of the plurality of lower bonding pads (e.g., P21, P22, P23, P24, P25, P26, P27, and P28) correspond to or vertically overlap both the first connection layers BP3 and the second connection layer BP4 corresponding to the first connection layers BP3. Further, half of the group of the lower bonding pads (e.g., P21, P22, P23, and P24) are connected to the bit line BL, the remaining half (e.g., P25, P26, P27, and P28 are connected to the complementary bit line BLP. The first connection layer BP3 is connected to one input terminal of a corresponding sense amplifier BLSA, and the second connection layer BP4 corresponding to the first connection layer BP3 is connected to another input terminal of the corresponding sense amplifier BLSA.
While some example embodiments of the disclosure are described with reference to the attached drawings, those with ordinary skill in the technical field of the present disclosure pertains will be understood that the present disclosure may be carried out in other specific forms without changing the technical idea or essential features. Therefore, it is to be understood that the above-described example embodiments are for illustrative purposes only, and the scope of the present disclosure is not limited thereto.
Patent Application
20250140751
