Patent Application
20110027052
This application claims priority to Japanese Patent Application No. 2009-177340 filed on Jul. 30, 2009, the entire contents of which are incorporated herein by reference.
The present invention relates to a position alignment mechanism for performing position alignment of a substrate accommodated in a vessel, a vacuum prechamber using the position alignment mechanism and a substrate processing system having the vacuum prechamber, wherein the position alignment is carried out in the course of performing vacuum processing on the substrate such as an FPD (Flat Panel Display), a solar cell or the like.
Japanese Patent Application Publication No. H10-98085 describes, e.g., a multi chamber type substrate processing system for the manufacture of a rectangular substrate such as an FPD, a solar cell or the like. The processing system includes a processing chamber for performing a predetermined vacuum processing such as etching, film formation or the like; a common vacuum transfer chamber to which the processing chamber and a preheating chamber for pre-heating the substrate to a processing temperature are connected, the transfer chamber having a transfer mechanism for transferring the substrate to the processing chamber and the preheating chamber; and a load-lock chamber serving as a vacuum prechamber through which the substrate is transferred between the transfer chamber and the atmosphere.
In the above-described substrate processing system, the substrate is transferred to the processing chamber or the like by the transfer mechanism of the transfer chamber after the substrate is position-aligned in the load-lock chamber. Accordingly, the substrate is transferred to a precise position in the processing chamber or the like. As for a technique for performing such position alignment, there are used positioners for linearly moving forward and backward along a diagonal direction to press diagonally opposite corners of the rectangular substrate (see, e.g., Japanese Patent Application Publication No. 2000-306980).
Recently, while a rectangular substrate tends to become increased in size, there is a demand to scale down a load-lock chamber serving as a vacuum prechamber repeatedly switched between the atmospheric atmosphere (about 1 atm) and a depressurized atmosphere. However, the positioners disclosed in Japanese Patent Application Publication No. 2000-306980 linearly move forward and backward along the diagonal direction to press diagonally opposite corners of the rectangular substrate so that a large space is required to perform such technique, and thus, the load-lock chamber cannot be sufficiently scaled down.
In view of the above, the present invention provides a substrate position alignment mechanism capable of minimizing a space required for position alignment of a substrate in a chamber, a vacuum prechamber using the substrate position alignment mechanism, and a substrate processing system having such vacuum prechamber.
In accordance with a first aspect of the present invention, there is provided a substrate position alignment mechanism for performing position alignment of a substrate supported by each of one or more substrate support units in a chamber where the substrate is accommodated. The substrate position alignment mechanism includes one or more position alignment members, each of which is rotated to make a contact with a side of the substrate in the chamber.
In accordance with a second aspect of the present invention, there is provided a vacuum prechamber where one or more substrates are accommodated and maintained in a depressurized atmosphere before the substrates are transferred to a processing chamber for processing the substrates in the depressurized atmosphere.
The vacuum prechamber includes: a vessel for accommodating the substrates; one or more substrate support units for supporting the substrates in the vessel; and the substrate position alignment mechanism described above, for performing position alignment of the substrates supported by the substrate support units.
In accordance with a third aspect of the present invention, there is provided a substrate processing system including: a plurality of processing chambers for performing predetermined processing on substrates in a depressurized atmosphere; the vacuum prechamber described above; and a substrate transfer device for transferring the substrates between the vacuum prechamber and the processing chambers.
The objects and features of the present invention will become apparent from the following description of embodiments, given in conjunction with the accompanying drawings, in which:
Embodiments of the present invention will be described with reference to the accompanying drawings which form a part hereof. Throughout the drawings, like reference numerals will be given to like parts.
As shown in
The common transfer chamber 10 is formed in a rectangular shape when seen from the top, and the preheating chamber 20, the processing chambers 30a and 30b and the load-lock chamber 40 are connected to side surfaces of the common transfer chamber 10 via gate valves 61, 62a, 62b and 63, respectively. Further, a gate valve 64 is provided at the side of the load-lock chamber 40 that faces the atmosphere. Although the common transfer chamber 10 of the present embodiment has the rectangular shape when seen from the top, the common transfer chamber 10 may have a polygonal (e.g., hexagonal or octagonal) shape when seen from the top, to which a preheating chamber, a processing chamber or a load-lock chamber can be additionally connected.
In the present embodiment, the common transfer chamber 10, the preheating chamber 20 and the processing chambers 30a and 30b are configured as vacuum chambers respectively having therein mounting tables 21, 31a and 31b, each for mounting thereon the substrate G and maintained in a predetermined depressurized state. Furthermore, the load-lock chamber 40 is provided to transfer the substrate G between a substrate accommodating carrier disposed in the atmosphere (not shown) and the common transfer chamber 10 maintained in a vacuum state, and serves as a vacuum prechamber that can be switched between the atmospheric atmosphere and the depressurized atmosphere.
The substrate processing system 1 is configured to simultaneously process a plurality of, e.g., three, substrates G horizontally mounted at different heights. The substrates G are loaded together from the external substrate accommodating carrier into the load-lock chamber 40 via the gate valve 64 by a transfer unit (not shown) disposed in the atmosphere. The loaded substrates G are transferred from the load-lock chamber 40 to the common transfer chamber 10 via the gate valve 63, from the common transfer chamber 10 to the preheating chamber 20 via the gate valve 61, and from the preheating chamber 20 to the processing chambers 30a or 30b via the gate valve 62a or 62b. The substrates G processed in the processing chamber 30a or 30b are transferred from the processing chamber 30a or 30b to the common transfer chamber 10 via the corresponding gate valve 62a or 62b, and from the common transfer chamber 10 to the load-lock chamber 40 via the gate valve 63. Then, the processed substrates G are unloaded from the load-lock chamber 40. Although the processing chambers 30a and 30b perform the same process in the present embodiment, different processes may be carried out in the processing chambers 30a and 30b. In other words, a first process may be carried out in the processing chamber 30a and a following second process may be performed successively in the processing chamber 30b.
The substrate transfer device 50 transfers a plurality of, e.g., three, substrates G at a time between the common transfer chamber 10, the preheating chamber 20, the processing chambers 30a and 30b and the load-lock chamber 40. As illustrated in
The respective components of the substrate processing system 1 are controlled by a control unit (computer) 70. The control unit 70 includes a process controller 71 having a micro processor. The process controller 71 is connected to a user interface 72 including a keyboard through which an operator inputs a command or the like to manage the substrate processing system 1, a display for visually displaying an operation status of the substrate processing system 1, and the like. Further, the process controller 71 is connected to a storage unit 73 which stores therein control programs to be used in realizing various processes performed in the substrate processing system 1 under the control of the process controller 71, and control programs or recipes to be used in performing predetermined processing in the substrate processing system 1 under processing conditions. The storage unit 73 has a storage medium which stores therein the recipes or the like.
The storage medium may be a hard disk, a semiconductor memory or a portable storage medium such as a CD-ROM, a DVD, a flash memory or the like. If necessary, a certain recipe is retrieved from the storage unit 73 in response to an instruction from the user interface 72 or the like and is executed by the process controller 71, thereby performing a desired process in the substrate processing system 1 under control of the process controller 71.
In the substrate processing system 1 configured as described above, first of all, the gate valve 64 is opened and a plurality of, e.g., three, unprocessed substrates G is loaded into the load-lock chamber 40 in the atmospheric atmosphere by a substrate transfer device (not shown) disposed in the atmosphere.
Next, the gate valve 64 is closed, and the inside of the load-lock chamber 40 is set to be changed to a depressurized atmosphere. Then, the gate valve 63 is opened, and the substrate support arms 51a to 51c of the substrate transfer device 50 simultaneously enter the load-lock chamber 40 and receive unprocessed substrates G loaded into the load-lock chamber 40. Thereafter, the substrate support arms 51a to 51c of the substrate transfer device 50 return to the common transfer chamber 10, and the gate valve 63 is closed.
Next, the base member 52 of the substrate transfer device 50 is rotated so that the substrate support arms 51a to 51c are positioned to face the preheating chamber 20. Then, the gate valve 61 is opened, and the substrate support arms 51a to 51c enter the preheating chamber 20 to transfer unprocessed substrates G to the preheating chamber 20. Thereafter, the substrate support arms 51a to 51c return to the common transfer chamber 10, and the gate valve 61 is closed so that pre-heating of the substrates G can be started in the preheating chamber 20.
Upon completion of the pre-heating, the gate valve 61 is opened, and the substrate support arms 51a to 51c enter the preheating chamber 20 to thereby receive the pre-heated substrates G. Next, the substrate support arms 51a to 51c return to the common transfer chamber 10, and the gate valve 61 is closed. Then, the base member 52 is rotated so that the substrate support arms 51a to 51c are positioned to face the processing chamber 30a (or 30b). Thereafter, the gate valve 62a (or 62b) is opened, and the substrate support arms 51a to 51c enter the processing chamber 30a (or 30b) to transfer the pre-heated substrates G to the processing chamber 30a (or 30b). Next, the substrate support arms 51a to 51c return to the common transfer chamber 10, and the gate valve 62a (or 62b) is closed so that processing in the processing chamber 30a (or 30b) is started.
Upon completion of the processing, the gate valve 62a (or 62b) is opened, and the substrate support arms 51a to 51c enter the processing chamber 30a (or 30b) to receive the processed substrates G. Then, the substrate support arms 51a to 51c return to the common transfer chamber 10, and the gate valve 62a (or 62b) is closed. Thereafter, the base member 52 is rotated so that the substrate support arms 51a to 51c are positioned to face the load-lock chamber 40. Next, the gate valve 63 is opened, and the substrate support arms 51a to 51c enter the load-lock chamber 40 to transfer the processed substrates G to the load-lock chamber 40. Thereafter, the substrate support arms 51a to 51c return to the common transfer chamber 10, and the gate valve 63 is closed, and the inside of the load-lock chamber 40 is set to be changed to the atmospheric atmosphere. Then, the gate valve 64 is opened, and the processed substrates G are unloaded from the load-lock chamber 40 by a transfer unit (not shown) disposed in the atmosphere.
Hereinafter, the load-lock chamber 40 will be described in detail.
The load-lock chamber 40 has a vessel 81. An opening 82 that makes the vessel 81 capable of communicating with the common transfer chamber 10 maintained in a vacuum state is formed on one sidewall of the vessel 81, and an opening 83 that makes the vessel 81 capable of communicating with the atmosphere is formed on the opposite sidewall. Further, the opening 82 can be opened and closed by the gate valve 63, and the opening 83 can be opened and closed by the gate valve 64.
A position alignment rack 84 for performing position alignment of three substrates G is fixed to a bottom portion of the vessel 81, and a loading rack 85 for holding the substrates G to be loaded into the common transfer chamber 10 is provided inside the position alignment rack 84 so as to be movable vertically. Moreover, an unloading rack for holding the substrates to be unloaded from the common transfer chamber 10 is disposed inside the loading rack 85. Since, however, its configuration is substantially the same as that of the loading rack 85, the illustration thereof is omitted in
Further, the vessel 81 has therein a position alignment mechanism 86 for performing position alignment of the substrates G mounted on the position alignment rack 84. The position alignment mechanism 86 includes two position alignment units 87 and 88 to be in contact with one longer side of each substrate G; a position alignment unit 89 to be in contact with one shorter side of each substrate G; two pressing units 90 and 91 oppositely arranged to the position alignment units 87 and 88 to press the other longer side of each substrate G; and a pressing unit 92 oppositely arranged to the position alignment unit 89 to press the other shorter side of each substrate G. The substrates G are position-aligned by determining positions and angles in the shorter side direction of the substrates G by the position alignment units 87 and 88 and positions in the longer side direction of the substrates G by the position alignment unit 89 and then pressing the substrates G by the pressing units 90, 91 and 92.
The position alignment rack 84 has four support columns 95 extending upward from the bottom portion of the vessel 81; a second position alignment support unit 97 formed at portions of support columns 95 corresponding to the height of the second (intermediate) substrate G; and a third position alignment support unit 98 formed at portions corresponding to the height of the third (uppermost) substrate. The second position alignment support unit 97 is provided to support the second substrate G and the third position alignment support unit 98 is provided to support the third substrate. Moreover, a first position alignment support unit 96 for supporting the first (lowermost) substrate G is formed at the bottom of the vessel 81.
Each of the second and the third position alignment support unit 97 and 98 includes three shorter side frames 101a, 101b and 101c formed along the substrate shorter sides and two longer side frames 102a and 102b formed along the substrate longer sides. The first position alignment support unit 96 includes three shorter side frames 101a, 101b and 101c formed at the bottom of the vessel 81 along the substrate shorter sides.
Each of the first to the third position alignment support unit 96 to 98 includes four support pins 103 and five movable supports 104 to support the substrate, wherein the support pins and the movable supports are arranged alternately on the shorter side frames 101a to 101c. To be specific, the second shorter side frame 101b provided at a position corresponding to the center of the substrate G has the one of movable supports 104 at its center and two of the support pins 103 at opposite sides thereof, and each of the shorter side frames 101a and 101c has one of the support pins 103 at its center and two of the movable supports 104 at opposite sides thereof.
As shown in
The loading rack 85 has a first loading support 115 for supporting the first (lowermost) substrate G, a second loading support 116 for supporting the second (intermediate) substrate G, and a third loading support 117 for supporting the third (uppermost) substrate G. Each of the first to the third loading support 115 to 117 has four support members extending horizontally from corresponding positions of the four vertical frames 111 and substrate support pins 118 formed at the support members.
As described above, the unloading rack has the similar structure as that of the loading rack 85, and its configuration and arrangement relationship with respect to the loading rack 85 are shown in
The unloading rack 120 has a first unloading support 125 for supporting the first (lowermost) substrate G, a second unloading support 126 for supporting the second (intermediate) substrate G, and a third unloading support 127 for supporting the third (uppermost) substrate G. Each of the first to the third unloading support 125 to 127 has four support members extending horizontally from corresponding positions of the four vertical frames 121 and substrate support pins 128 formed at the support members.
When exchanging the substrates G, the substrate support arms 51a to 51c of the substrate transfer device 50 transfer the processed substrates G onto the substrate support pins 128 of the first to the third unloading support 125 to 127 and then receive unprocessed substrates G supported by the substrate support pins 118 of the first to the third loading support 115 to 117.
Referring back to
As shown in
Further, as shown in
Referring back to
The following is a description of the position alignment operation in the load-lock chamber 40 serving as a vacuum prechamber configured as described above.
First, in a state where the inside of the vessel 81 is set in the atmospheric atmosphere, the gate valve 64 is opened and the substrates G are loaded through the opening 83. The substrates G are supported on the support pins 103 and the movable supports 104 of the first to the third position alignment support unit 96 to 98, respectively. Next, the substrates G are position-aligned by the position alignment mechanism 86 by the following sequence.
The sequence will be described with reference to schematic views of
When the substrates G are loaded, the position alignment units 87 to 89 and the pressing units 90 to 92 are in waiting or standby positions, as illustrated in
In a state where the substrates G are supported by the first to the third position alignment support unit 96 to 98, reference positions of the substrates G are set first by rotating the position alignment members 132 of the position alignment units 87 to 89 to reference positions, as can be seen from
Next, as depicted in
Then, as shown in
In such manner, the substrates G can be aligned to preset positions. Such position alignment is performed to allow the substrates G to be transferred to predetermined positions in the processing chambers 30a and 30b by the substrate transfer device 50. This is because the positions of the substrates G are important in view of the uniformity of processing such as etching, film formation or the like which is performed in the processing chambers 30a and 30b.
Conventionally, a rectangular substrate has been position-aligned in a load-lock chamber by positioners for linearly moving forward and backward along a diagonal direction to press diagonally opposite corners of the substrate. Thus, a large space is required to make the positioners move, and thus, the load-lock chamber is scaled up.
On the other hand, in the position alignment mechanism 86 of the present embodiment, the position alignment members 132 of the position alignment units 87 to 89 are made to rotate to set reference positions of the substrates G. Further, in the pressing units of the present embodiment that are used to align positions of the substrates G by pressing the substrates G, the pressing unit 92 presses the substrates G by rotating the pressing members 152, and the pressing units 90 and 91 press the substrates G by allowing the pistons 143 to move forward by driving the cylinder mechanism 144 provided outside the vessel 81. Accordingly, a large space required in a conventional system is not needed, and the load-lock chamber 40 can be scaled down. Besides, in consideration of the importance of the position alignment of the substrates G, a similar position alignment mechanism can be provided to the processing chamber 30a or 30b so as to align the positions of the substrates G in the processing chamber 30a or 30b.
Moreover, each of the position alignment support units 96 to 98 is formed by alternately arranging the four support pins 103 and the five movable supports 104, so that the position alignment of the substrates G can be reliably carried out. In other words, in order to precisely align the positions of the rectangular substrates G, it may be preferable to support the substrates G at nine points. However, if the substrates G are supported by using only the supporting pins 103 at nine points, it is difficult to move the substrates G due to friction and this makes it difficult to perform position alignment of the substrates G. Further, if the substrates G are supported by using only the movable supports 104 at nine points, the substrates G can move easily, and thus, the positions of the substrates G may be easily aligned. However, it may be sometimes difficult to stop the movement of the substrates G. On the other hand, by alternately arranging the support pins 103 and the movable supports 104, the substrates G can move properly and thus can be properly position-aligned. However, when it is important to easily move the substrates G, only the movable supports 104 may be provided at nine points.
Furthermore, as for each of the position alignment support units 96 to 98, there may be used one having an inner mounting table and an outer mounting table capable of moving independently in a vertical direction to be used separately for purposes. For example, as shown in
Besides, without being limited to the example shown in
The reference positions of the substrates G in the load-lock chamber 40 are determined as follows. The substrates G disposed at predetermined mounting positions in the processing chambers 30a and 30b are returned back to the load-lock chamber 40 by the substrate transfer arms 51a to 51c of the substrate transfer device 50. Next, the position alignment members 132 of the position alignment units 87 to 89 come into contact with the substrates G. The reference positions of the substrates G in the load-lock chamber 40 are determined when the positions of the position alignment members 132 of the position alignment units 87 to 89 are determined, and such positions of the position alignment members 132 are obtained from rotation positions detected by an encoder provided in the rotation driving mechanism 133. The positions thus obtained are stored in the storage unit as data indicating the reference positions of the position alignment units 87 to 89.
Moreover, the reference positions of the position alignment units 87 to 89 may be different between transfer of the substrates G to the processing chamber 30a and to the processing chamber 30b. This is because, e.g., a slight error or the like may occur when the processing chambers 30a and 30b are attached to the common transfer chamber 10. In that case, it is preferable to store in the storage unit 73 both of the reference positions with respect to the processing chamber 30a and the processing chamber 30b so that reference positions can be selectively retrieved to carry out corresponding position alignment. The determination of the reference positions may be performed either in an automatic mode or manually by an operator.
Upon completion of or concurrently with the position alignment of the substrates G, the opening/closing valve 173 is closed and the opening/closing valve 163 is opened. In that state, the vacuum pump 165 is driven to reduce a pressure in the vessel 81 to a predetermined level. After the position alignment of the substrates G is completed, the loading rack 85 is raised, and the substrates G are received by the support pins 118 of the first to the third loading support 115 to 117. Then, the gate valve 63 is opened, and the substrate transfer arms 51a to 51c of the substrate transfer device 50 move into predetermined positions in the vessel 81 of the load-lock chamber 40. Thereafter, the substrates G are transferred to the transfer arms 51a to 51c by lowering the loading rack 85. Next, the substrate transfer arms 51a to 51c having the substrates G thereon return to the common transfer chamber 10, and the gate valve 63 is closed.
When the processed substrates G are exchanged with the unprocessed substrates G in the load-lock chamber 40, the unprocessed substrates G are position-aligned in the load-lock chamber 40 in the same manner. Then, the inside of the vessel 81 is set in a depressurized atmosphere, and the unprocessed substrates G are received by the support pins 118 of the first to the third loading support 115 to 117. Next, the gate valve 63 is opened, and the substrate transfer arms 51a to 51c which hold the processed substrates G move into the vessel of the load-lock chamber 40. Thereafter, the unloading rack 120 is raised so that the processed substrates G are received by the substrate support pins 128 of the first to the third unloading support 125 to 127. Next, the substrate transfer arms 51a to 51c are retreated, and the loading rack 85 is raised. Then, the substrate transfer arms 51a to 51c are positioned below the unprocessed substrates G supported by the first to the third loading supports 115 to 117, and the unprocessed substrates G are transferred onto the substrate transfer arms 51a to 51c by lowering the loading rack 85. Thereafter, the substrate transfer arms 51a to 51c having the unprocessed substrates G thereon return to the common transfer chamber 10, and the gate valve 63 is closed.
In a state where the processed substrates G are supported by the first to the third unloading support 125 to 127 of the unloading rack 120 in the load-lock chamber 40, the opening/closing valve 163 is closed and the opening/closing valve 173 is opened. Accordingly, a purge gas such as N2 gas or the like is introduced from the purge gas supply source 175 into the vessel 81 while a flow rate is controlled by the flow rate control valve 174. Then, the inside of the vessel 81 is set in an atmospheric atmosphere, and the gate valve 64 is opened to thereby unload the processed substrates G supported by the first to the third unloading support 125 to 127 of the unloading rack 120.
In accordance with the present embodiment, in the position alignment mechanism 86 for performing position alignment of the substrates G in the load-lock chamber 40, reference positions for position alignment are set by rotating the position alignment members 132 of the position alignment units 87 to 89, and the pressing unit 92 presses the substrates G by rotating the pressing members 152. Moreover, the pressing units 90 and 91 press the substrates G by allowing the pistons 143 to move forward by driving the cylinder mechanism 144 provided outside the vessel 81. Hence, a large space required in a conventional system is not needed and the load-lock chamber 40 can be scaled down.
By alternately providing the support pins 103 and the movable supports 104 at each of the position alignment support units 96 to 98 for supporting the substrates G, the substrates G can move properly during position alignment and this ensures proper position alignment of the substrates G.
Moreover, the position alignment support units 96 to 98 can be divided into parts conferring different mobility to the substrates G and can be separately used depending on required mobility of the substrates G.
Besides, a plurality of, e.g., three, substrates G can be position-aligned, transferred and processed simultaneously, so that the processing efficiency can be increased.
Further, the present invention can be variously modified without being limited to the above-described embodiment. For example, although the substrates G are position-aligned in the load-lock chamber in the above-described embodiment, it is not limited thereto and the substrates G may be position-aligned in the processing chamber as described above. Moreover, in the above-described embodiment, three substrates are transferred and processed simultaneously by the substrate processing system. However, it is not limited thereto, and a single substrate or a plurality of (other than three) substrates may be transferred and processed by the substrate processing system. The type of the substrate processing system is not limited to one shown in
In addition, although three position alignment units and three pressing units are provided in the above-described embodiment, the pressing units are not necessarily required and the number of the position alignment units is not limited to three. In addition, although the support pins and the movable supports are alternately provided at each of the position alignment support units, they may be differently arranged as long as desired mobility of the substrates can be obtained.
While the invention has been shown and described with respect to the embodiments, it will be understood by those skilled in the art that various changes and modification may be made without departing from the scope of the invention as defined in the following claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2009-177340 | Jul 2009 | JP | national |
