Claims
- 1. A water-developable photosenstive composition for use in the preparation of relief printing plates, consisting essentially of:
- (A) about 30 to about 90% by weight of a copolymer comprising units of (i) an aliphatic conjugated diene monomer, (ii) an .alpha.,.beta.-ethylenically unsaturated carboxylic acid, and (iii) a polyfunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha.,.beta.-ethylenically unsaturated carboxylic acid (ii), and the polyfunctional vinyl monomer (iii) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, and from 0.1 to 10 mol % based on the combination of said monomeric components;
- (B) about 0.20 to 2.0 mol, based on 1 mol of the carboxyl groups in said copolymer (A), of a basic nitrogen atom-containing compound having a tertiary basic nitrogen atom;
- (C) about 5 to 70% by weight of an ethylenically unsaturated monomer; and
- (D) about 0.1 to 10% by weight of a photopolymerization initiator, the amounts of said copolymer (A), said ethylenically unsaturated monomer (C), and said photopolymerization initiator (D) being based on the total weight of said composition; said composition, upon application to a support and exposure to light, being developable in the unexposed areas solely with water to form a relief printing plate that is resistant to swelling with water-based inks.
- 2. The photosensitive resin composition according to claim 1, wherein the content of the aliphatic conjugated diene monomer (i), the .alpha.,.beta.-ethylenically unsaturated carboxylic acid (ii) and the polyfunctional vinyl monomer (iii) in the copolymer (A) are respectively from about 40 to 85 mol %, from about 2.5 to 10 mol %, from about 0.5 to 3 mol %.
- 3. The photosenstive resin composition of claim 1 or 2 wherein said copolymer (A) further includes units of a monofunctional vinyl monomer in an amount of up to 70 mol %, based on the combination of the total amount of said monomeric components.
- 4. The water-developable photosensitive resin composition according to claim 1 or 3 wherein the basic nitrogen atom-containing compound (B) is represented by the structural formula: ##STR2##
- 5. The water-developable photosenstive resin composition according to claim 4, wherein the basic nitrogen atom-containing compound (B) is a photopolymerizable amine compound expressed in formula (I) or (II) except compounds corresponding to formula (II) in which Y is hydrogen.
- 6. The water-developable photosensitive resin composition according to any of claims 1 or 3, which is supported on a supporting material.
- 7. The photosensitive resin composition of claims 1, 2, 4 or 3 in which said ethylenically unsaturated monomer (C) includes a polyfunctional monomer.
RELATED APPLICATION
This is a continuation of co-pending application Ser. No. 07/367,773, filed on Jul. 12, 1990 now abandoned which is a continuation-in-part of copending application, Ser. No. 910,134, filed Sep. 22, 1986, now abandoned entitled "Water-Developable Photosensitive Plate and Its Production".
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
102e Date |
371c Date |
PCT/US87/02372 |
9/22/1987 |
|
|
7/12/1990 |
7/12/1990 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO88/02135 |
3/24/1988 |
|
|
US Referenced Citations (7)
Continuations (1)
|
Number |
Date |
Country |
Parent |
367773 |
Jul 1990 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
910134 |
Sep 1986 |
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