Claims
- 1. A method of binary mask fabricating steps into a face of a crystal so that the steps have selected depths at selected orthogonally determined locations with flat, perpendicular bottom and wall surfaces at each step, said method comprising,
- forming parallel front and back faces on the crystal having a specific crystalline orientation and a specific direction of the crystalline orientation, said forming including forming the parallel front and back surfaces which are skew aligned with the crystalline orientation of the crystal,
- using binary, photolithographic masking to mark certain rectangular shaped areas at the selected orthogonally determined locations on said front face for etching to the selected depths, and
- binary etching said certain rectangular-shaped areas perpendicularly to the front face and in the direction of the crystalline orientation to produce the flat bottom surfaces at the selected depths for the selected locations and also to produce the flat wall surfaces which are perpendicular to said flat bottom surfaces.
Parent Case Info
This is a divisional of application Ser. No. 08/064,947 filed on May 50, 1993, which is a CIP of Ser. No. 11,323, Jan. 29, 1993, now 5,420,720 which is a CIP of 982,514 filed Nov. 27, 1992, now Pat. No. 5,310,623.
US Referenced Citations (13)
Non-Patent Literature Citations (2)
Entry |
G. Artzner "Aspherical surfaces engraved on photoresist coatings: manufacture of a zonal corrector plate for an aberrating cassegrainian telescope", 1987, Optical Components and Systems, SPIE vol. 805. |
E. Hausmann & E. P. Slack, Physics, (3rd Edition, 1948) at 727-728. |
Divisions (1)
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Number |
Date |
Country |
Parent |
64947 |
May 1993 |
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Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
11323 |
Jan 1993 |
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Parent |
982514 |
Nov 1992 |
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