1. Field of the Invention
The present invention relates to a wiring board and its manufacturing method.
2. Discussion of the Background
In Taiwanese Patent Publication No. 200847363, a wiring board is described where a second wiring board is accommodated in a hole formed in a first wiring board, and wiring in the first wiring board and wiring in the second wiring board are electrically connected. The entire contents of Taiwanese Patent Publication No. 200847363 are incorporated in this application.
According to one aspect of the present invention, a wiring board has a first rigid wiring board having an accommodation portion and a conductor, a second rigid wiring board accommodated in the accommodation portion and having a conductor electrically connected to the conductor in the first rigid wiring board, and an insulation layer formed over the first rigid wiring board and the second rigid wiring board. The first rigid wiring board has a wall surface defining the accommodation portion and having a concavo-convex shaped portion, and the second rigid wiring board has a side surface facing against the wall surface of the first rigid wiring board and having a concavo-convex shaped portion such that the concavo-convex shaped portion of the side surface of the second rigid wiring board engages with the concavo-convex shaped portion of the wall surface of the first rigid wiring board.
According to another aspect of the present invention, a method for manufacturing a wiring board includes preparing a first rigid wiring board having an accommodation portion and a conductor, preparing a second rigid wiring board having a conductor, accommodating the second rigid wiring board in the accommodation portion of the first rigid wiring board, forming an insulation layer over the first rigid wiring board and the second rigid wiring board, and electrically connecting the conductor in the first rigid wiring board to the conductor in the second rigid wiring board. The preparing of the first rigid wiring board includes forming a wall surface which defines the accommodation portion and has a concavo-convex shaped portion, the preparing of the second rigid wiring board includes forming a side surface which faces against the wall surface of the first rigid wiring board and has a concavo-convex shaped portion such that the concavo-convex shaped portion of the side surface of the second rigid wiring board engages with the concavo-convex shaped portion of the wall surface of the first rigid wiring board, and the accommodating of the second rigid wiring board includes engaging the concavo-convex shaped portion of the side surface of the second rigid wiring board with the concavo-convex shaped portion of the wall surface of the first rigid wiring board.
A more complete appreciation of the invention and many of the attendant advantages thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
The embodiments will now be described with reference to the accompanying drawings, wherein like reference numerals designate corresponding or identical elements throughout the various drawings.
In the drawings, arrows (Z1, Z2) each indicate a lamination direction in a wiring board corresponding to a direction along a normal line (or a thickness direction of the wiring board) to the main surfaces (upper and lower surfaces) of the wiring board. On the other hand, arrows (X1, X2) and (Y1, Y2) each indicate a direction perpendicular to a lamination direction (or a direction to a side of each layer). The main surfaces of the wiring board are on the X-Y plane. Side surfaces of the wiring board are on the X-Z plane or the Y-Z plane. “Directly on” or “directly under” means direction Z (Z1 side or Z2 side).
In the present embodiment, a side closer to the core (substrates 100, 200) is referred to as a lower layer, and a side farther from the core as an upper layer in a lamination direction.
A conductive layer is formed with one or multiple conductive patterns. A conductive layer may include a conductive pattern that forms an electrical circuit such as wiring (including ground), a pad, a land or the like, for example, or it may include a planar conductive pattern that does not form an electrical circuit.
Opening portions include notches, cuts or the like in addition to holes and grooves. Holes are not limited to penetrating holes, and non-penetrating holes are also referred to as holes.
Among the conductors formed in opening portions, conductive film formed on inner surfaces of an opening portion (wall or bottom surface) is referred to as a conformal conductor, and conductor filled in an opening portion as a filled conductor. Also, conductor formed in a via hole (wall or bottom surface) is referred to as a via conductor, and conductor formed in a through hole (wall surface) as a through-hole conductor. A stacked-conductor structure means an assembly formed by stacking filled conductors in two or more layers.
Plating includes wet plating such as electrolytic plating as well as dry plating such as PVD (physical vapor deposition) and CVD (chemical vapor deposition).
“Accommodated in an accommodation section” includes situations in which the entire second rigid wiring board is positioned completely in an accommodation section, as well as situations in which only part of a second rigid wiring board is positioned in an accommodation section. In short, it is sufficient if at least part of a second rigid wiring board is positioned in an accommodation section.
As shown in
Wiring board 10 has accommodation section (R1), and wiring board 20 is accommodated in accommodation section (R1) formed in wiring board 10. Conductor in wiring board 10 and conductor in wiring board 20 are electrically connected to each other. In addition, insulation layers (301, 302) are each formed on wiring board 10 and on wiring board 20. Accommodation section (R1) of the present embodiment is a penetrating hole. Wiring board 1000, wiring board 10 and wiring board 20 are each a rigid printed wiring board.
In the present embodiment, multiple wiring boards 1000 form frame unit (1000a) as shown in
In the present embodiment, connection portions (bridges 12) between wiring board sections (11a˜11d) (wiring boards 10) and frame sections (13a, 13b) are made narrow so that they are easier to cut. Since wiring board 1000 is connected to frame sections (13a, 13b), handling of wiring board 1000 is easier. The present embodiment shows an example in which multiple wiring boards 1000 are connected to a frame. However, one wiring board 1000 may be connected to a frame.
As shown in
Conductive layer (110a) is formed on fifth surface (F5) of substrate 100, and conductive layer (110b) is formed on sixth surface (F6) of substrate 100. Holes that penetrate through substrate 100 (accommodation section (R1) and through hole 120) are formed in substrate 100. Accommodation section (R1) has a shape that corresponds to wiring board 20 (a rectangular shape, for example). Accordingly, the periphery of accommodation section (R1) substantially corresponds to the outline of wiring board 20. In addition, by forming copper-plated film, for example, on the wall surface of through hole 120, through-hole conductor 130 is formed. Conductive layer (110a) and conductive layer (110b) are electrically connected to each other by through-hole conductor 130. The shape of through hole 120 is columnar, for example.
As shown in
Conductive layer (210a) is formed on seventh surface (F7) of substrate 200, and conductive layer (210b) is formed on eighth surface (F8) of substrate 200. Insulation layers (201, 203) and conductive layers (211, 213) are alternately laminated on seventh surface (F7) of substrate 200, and insulation layers (202, 204) and conductive layers (212, 214) are alternately laminated on eighth surface (F8) of substrate 200.
Through hole 220 which penetrates through substrate 200 is formed in substrate 200, and becomes through-hole conductor 230 by forming copper-plated film, for example, on the wall surface of through hole 220. Then, insulator 240 made of the resin from insulation layers (201, 202), for example, is filled inside through-hole conductor 230 in through hole 220. Via holes (221, 223) are respectively formed in insulation layers (201, 203), and via conductors (231, 233) (each a filled via) are formed by filling via holes (221, 223) with copper plating, for example. Also, via holes (222, 224) are respectively formed in insulation layers (202, 204), and via conductors (232, 234) (each a filled via) are formed by filling via holes (222, 224) with copper plating, for example.
As shown in
Via holes (321a, 321b) are formed in insulation layer 301, and via conductors (331a, 331b) (each a filled via) are formed by filling via holes (321a, 321b) with copper plating, for example. Also, via holes (322a, 322b) are formed in insulation layer 302, and via conductors (332a, 332b) (each a filled via) are formed by filling via holes (322a, 322b) with copper plating, for example. Via conductors (331a, 332a) are formed in their respective regions directly on wiring board 10, and via conductors (331b, 332b) are formed in their respective regions directly on wiring board 20.
Wiring board 1000 of the present embodiment has stacked-conductor structures (S1, S2) on and under the core substrate (substrate 200) of wiring board 20, for example.
Wiring board 1000 has solder resist 401 on the outermost layer (insulation layer 301 and conductive layer 311) on one side, and solder resist 402 on the outermost layer (insulation layer 302 and conductive layer 312) on the other side. Opening portions (411a, 411b) are formed in solder resist 401 and portions of the outermost conductive layer (conductive layer 311) are exposed through opening portions (411a, 411b) and become pads. Then, external connection terminals (421a, 421b) made of solder, for example, are formed respectively on the pads exposed through opening portions (411a, 411b). Also, opening portions (412a, 412b) are formed in solder resist 402 and portions of the outermost conductive layer (conductive layer 312) are exposed through opening portions (412a, 412b) and become pads. Then, external connection terminals (422a, 422b) made of solder, for example, are formed respectively on the pads exposed through opening portions (412a, 412b). External connection terminals (421a, 422a) are formed in their respective regions directly on wiring board 10, and external connection terminals (421b, 422b) are formed in their respective regions directly on wiring board 20.
Since wiring boards (10, 20) in wiring board 1000 of the present embodiment are both rigid wiring boards, it is easier to secure wiring board 20 by friction when wiring board 20 is accommodated in accommodation section (R1).
In the present embodiment, wiring board 20 (second rigid wiring board) has smaller external dimensions than wiring board 10 (first rigid wiring board) and is accommodated in accommodation section (R1) of wiring board 10. The number of conductive layers (two layers) in wiring board 10 (first rigid wiring board) is less than the number of conductive layers (six layers) in wiring board 20 (second rigid wiring board). Namely, the number of conductive layers included per unit thickness is greater in wiring board 20 than in wiring board 10. As a result, the density of existing conductors in wiring board 20 is higher than the density of existing conductors in wiring board 10. According to such a structure, the conductor density of wiring board 1000 is increased partially (to make high-density wiring). The number of layers in the first and second rigid wiring boards is not limited specifically. The first rigid wiring board may have buildup layers, and the second rigid wiring board may have eight or more conductive layers, for example.
In the present embodiment, wiring board 10 (first rigid wiring board) and wiring board 20 (second rigid wiring board) are electrically connected to each other by via conductors (331a, 331b) and conductive layer 311, or by via conductors (332a, 332b) and conductive layer 312.
Wiring board 1000 of the present embodiment has external connection terminals (421a, 422a) and (421b, 422b) respectively in regions directly on wiring board 10 (first rigid wiring board) and in regions directly on wiring board 20 (second rigid wiring board). External connection terminals (421a, 422a, 421b, 422b) are used for electrical connection with another wiring board, an electronic component or the like, for example. Wiring board 1000 may be used as a circuit board for mobile equipment (such as a cell phone) or the like by being mounted on another wiring board on one of its surfaces or both of its surfaces, for example.
Substrates (100, 200) are each made by impregnating, for example, glass cloth (core material) with epoxy resin (hereinafter referred to as glass epoxy). The core material has a lower thermal expansion coefficient than primary material (epoxy resin in the present embodiment). Inorganic material such as glass fiber (glass cloth or glass non-woven fabric, for example), aramid fiber (aramid non-woven fabric, for example), or silica filler is considered preferable as core material. However, the material of substrates (100, 200) is basically determined freely. For example, polyester resin, bismaleimide triazine resin (BT resin), imide resin (polyimide), phenol resin, allyl polyphenylene ether resin (A-PPE resin) or the like may also be used instead of epoxy resin. Each substrate may be formed with multiple layers made of different materials.
Each insulation layer in wiring board 1000 is made of glass epoxy, for example. However, that is not the only option, and the material of insulation layers is basically determined freely. For example, polyester resin, bismaleimide triazine resin (BT resin), imide resin (polyimide), phenol resin, allyl polyphenylene ether resin (A-PPE resin) or the like may also be used instead of epoxy resin. Each insulation layer may be formed with multiple layers made of different materials.
Through-hole conductors and via conductors in wiring board 1000 are each made of copper plating, for example. The shape of through-hole conductors is a column or a cylinder, for example. The shape of via conductors is a tapered column (truncated cone), for example. Via conductors formed in a buildup section taper with a diameter that increases from the core substrate toward the upper layer, for example. However, those are not the only options, and the shape of via conductors may be determined freely.
Each conductive layer in wiring board 1000 is formed with copper foil (lower layer) and copper plating (upper layer). Such a conductive layer includes, for example, wiring (inner-layer wiring) that forms electronic circuits, a land, a planar conductive pattern to enhance the strength or flatness of the wiring board, or the like. A tear-drop treatment is preferred to be conducted at the connected portion of a land and wiring.
The material of each conductive layer and each via conductor is not limited specifically as long as it is conductive. It may be metallic or non-metallic. Each conductive layer and each via conductor may be formed with multiple layers made of different materials.
Solder resists in wiring board 1000 are each made of resin such as photosensitive resin using acrylic epoxy resin, thermosetting resin mainly containing epoxy resin, or UV curable resin.
In the present embodiment, wall surface (F11) of accommodation section (R1) (side surface of wiring board 10) and side surface (F12) of wiring board 20 intersect with main surfaces of wiring board 1000 (X-Y plane, for example) at substantially a right angle. However, that is not the only option, and wall surface (F11) of accommodation section (R1) (side surface of wiring board 10) and side surface (F12) of wiring board 20 may taper (see later-described
In the present embodiment, insulator 140 made of resin, for example, is filled in a gap between wiring board 10 and wiring board 20 as shown in
As shown in
A concavo-convex shape is formed respectively on wall surface (F11) of accommodation section (R1) (side surface of wiring board 10) and on side surface (F12) of wiring board 20 (second rigid wiring board). By doing so, resistance of wiring board 1000 is enhanced against external force caused by being dropped or the like. That is because when side surface (F12) of wiring board 20 and wall surface (F11) of accommodation section (R1) are formed in a zigzag pattern, contact areas increase between wiring board 10 and wiring board 20, and thus cracking is thought to be suppressed.
Also, a concavo-convex shape is formed entirely along each periphery of side surface (F12) of wiring board 20 and wall surface (F11) of accommodation section (R1) (side surface of wiring board 10) in the present embodiment. Accordingly, it is thought that the effects of suppressing cracks are greater than when a concavo-convex shape is formed only partially.
Wall surface (F11) of accommodation section (R1) facing side surface (F12) of wiring board 20 has a convex-concave shape that corresponds to the concavo-convex shape of side surface (F12) of wiring board 20. A convex portion faces a concave portion, and a concave portion faces a convex portion. In the present embodiment two convex portions (P21) formed on side surface (F12) of wiring board 20 are inserted in one concave portion (P11) formed on wall surface (F11) of accommodation section (R1). Then, space (R2) resulting from concave portion (P22) is formed between two convex portions (P21) inserted in one concave portion (P11). According to such a structure, the number of concavo-convex portions is reduced while suppressing a decrease in strength as much as possible. Thus, it is easier to achieve required strength (especially, the bonding strength between wiring board 10 and wiring board 20) by using fewer concavo-convex portions. Also, since the number of finer concavo-convex portions decreases, voids tend not to occur when insulator 140 is filled in a gap between wiring board 10 and wiring board 20.
The concavo-convex line of the present embodiment is such a line that rectangles are formed in series (square wave). The concavo-convex shape is preferred to have substantially a constant cycle along the entire periphery. In addition, it is preferred that concave portion (P11), convex portion (P12), convex portion (P21) and concave portion (P22) each have substantially constant dimensions along the entire periphery. If their dimensions are substantially constant, forming concavo-convex shapes is easier and concentration of stress in parts tends not to occur.
Following are preferred examples: regarding the concavo-convex shape of wall surface (F11) of accommodation section (R1), cycle (d11) is set at 2 mm and amplitude (d12) at 0.5 mm; regarding the concavo-convex shape of side surface (F12) of wiring board 20, cycle (d21) is set at 0.7 mm and amplitude (d22) at 0.5 mm; width (d3) of space (R2) (the measurement in a direction parallel to side surface (F12) of wiring board 20) is set at 0.2 mm; length (d4) of space (R2) (the measurement in a direction perpendicular to side surface (F12) of wiring board 20) is set at 0.46 mm; and distance (d0) between wall surface (F11) of accommodation section (R1) and side surface (F12) of wiring board 20 is set at 0.04 mm.
It is preferred that the cycle of the concavo-convex shape of wall surface (F11) of accommodation section (R1) or side surface (F12) of wiring board 20 be in the range of approximately 1 mm to approximately 3 mm, and the amplitude of the concavo-convex shape be in the range of approximately 0.2 mm to approximately 1 mm. If a concavo-convex shape is set too fine, it may break easily or have difficulty forming such a shape. In addition, if a concavo-convex shape is too large, such a shape may compress regions for forming wiring.
In the present embodiment, length (d4) of space (R2) formed between convex portions (P21) inserted in concave portion (P11) is substantially the same as the length (amplitude (d22)) of convex portion (P21) as shown in
Width (d1) of concave portion (P11) is preferred to be in the range of 0.5 to 0.8 times the cycle (d11). Length (d2) of convex portion (P21) is preferred to be in the range of 0.5 to 0.8 times the cycle (d21).
Width (d3) of space (R2) is preferred to be in the range of 0.2 to 0.5 times the width (d2) of convex portion (P21). Width (d4) of space (R2) is preferred to be in the range of 0.85 to 0.95 times the amplitude (d22).
Wiring board 1000 of the present embodiment has through-hole conductor 530 (joint conductor). As shown in
In addition, heat dissipation in wiring board 1000 improves by through-hole conductor 530.
Through-hole conductor 530 (joint conductor) may be used only for heat dissipation. However, through-hole conductor 530 is also used electrically in the present embodiment. Namely, conductive layer 311 and conductive layer 312 are electrically connected to each other by through-hole conductor 530. Since through-hole conductor 530 is a filled conductor and is easier to set wide, it is preferred to be connected to power source or ground. However, through-hole conductor 530 (joint conductor) is not limited to being a filled conductor, and may be a conformal conductor, for example.
Through hole 520 penetrates through insulation layers (301, 302) as well as wiring board 10 and wiring board 20. Both ends of through-hole conductor 530 are connected respectively to the outermost conductive layers (conductive layers (311, 312)) of wiring board 1000. Through-hole conductor 530 is made by filling through hole 520 with copper plating, for example. By using the same material for through-hole conductor 530 as that for via conductors (331a, 331b, 332a, 332b), it is easier to form them simultaneously. As a result, manufacturing efficiency improves.
In the present embodiment, planar conductive film (in particular, lands (311a, 312a)) is formed on a boundary portion (boundary line (L1)) between wiring board 10 and wiring board 20 as shown in
In the present embodiment, lands (311a, 312a) are made of planar conductive film (specifically, in a disc shape). However, that is not the only option, and through-hole conductor 530 set to be a conformal conductor may be connected to ring-shaped lands.
Also, in the present embodiment, planar conductive films (311c, 312c) are formed directly on the boundary portion (boundary line (L1)) between wiring board 10 and wiring board 20 as shown in
Land (311a), wiring (311b) connected to that land, and conductive film (311c) are each included in conductive layer 311. Land (312a), wiring (312b) connected to that land, and conductive film (312c) are each included in conductive layer 312.
In the present embodiment, through-hole conductor 530 (joint conductor), conductors in wiring board 10 (through-hole conductors and conductive layers), conductors in wiring board 20 (through-hole conductors, via conductors, conductive layers) are all made of the same material (such as copper). In doing so, it is easier to form each conductor.
In the following, a method for manufacturing wiring board 1000 according to the present embodiment is described.
When manufacturing wiring board 1000 of the present embodiment, first, wiring board 10 and wiring board 20 are respectively manufactured.
To manufacture wiring board 10, first, substrate 100 having copper foil 1001 on fifth surface (F5) and copper foil 1002 on sixth surface (F6) is prepared as shown in
Copper panel plating (such as electroless plating and electrolytic plating), for example, is performed. Accordingly, plated film 1003 is formed on copper foils (1001, 1002) and in through hole 120 as shown in
Using photo-etching techniques (acid cleansing, resist lamination, exposure and development, etching, film removal, and the like), for example, conductive layers formed on fifth surface (F5) and sixth surface (F6) of substrate 100 are each patterned. In doing so, conductive layers (110a, 110b) are formed as shown in
In the present embodiment, multiple frame units (1000b) (frame units (1000a) prior to accommodating wiring boards 20) are formed collectively in one panel 4001 as shown in
On the other hand, when wiring board 20 is manufactured, substrate 200 having copper foil 2001 on seventh surface (F7) and copper foil 2002 on eighth surface (F8) is first prepared as shown in
Copper panel plating (such as electroless plating and electrolytic plating), for example, is conducted. In doing so, plating 2003 is formed on copper foils (2001, 2002) and in through hole 220 as shown in
Using photo-etching techniques (acid cleansing, resist lamination, exposure and development, etching, film removal, and the like), for example, conductive layers formed on seventh surface (F7) and eighth surface (F8) of substrate 200 are each patterned. In doing so, conductive layers (210a, 210b) are formed as shown in
As shown in
Using hydraulic pressing equipment, for example, outer copper foils (2005, 2006) are pressurized. Specifically, pressing and thermal treatments are conducted simultaneously. Through thermal pressing, insulation layers (201, 202) are pressed in directions Z, prepreg (insulation layers (201, 202)) is cured, and insulation layers (201, 202) and substrate 200 are adhered. As a result, the laminate becomes integrated. In addition, during pressing, resin flows out from insulation layers (201, 202) and is filled in through hole 220. The resin filled in through hole 220 becomes insulator 240 (see
As shown in
Copper panel plating (such as electroless plating and electrolytic plating), for example, is performed. Accordingly, platings (2007, 2008) are formed respectively on copper foils (2005, 2006) and in via holes (221, 222) as shown in
Using photo-etching techniques (acid cleansing, resist lamination, exposure and development, etching, film removal, and the like), for example, conductive layers formed on insulation layers (201, 202) are each patterned. Accordingly, conductive layers (211, 212) are formed as shown in
As shown in
Using hydraulic pressing equipment, for example, outer copper foils (2009, 2010) are pressurized the same as in the first layers (insulation layers (201, 202)), for example. Accordingly, insulation layers (203, 204) are pressed, and insulation layers (203, 204) and substrate 200 are adhered to be integrated.
A laser, for example, is used to form via hole 223 in insulation layer 203 and via hole 224 in insulation layer 204, as shown in
Copper panel plating (such as electroless plating and electrolytic plating), for example, is performed. Accordingly, platings (2011, 2012) are formed respectively on copper foils (2009, 2010) and in via holes (223, 224) as shown in
Using photo-etching techniques (acid cleansing, resist lamination, exposure and development, etching, film removal, and the like), for example, conductive layers formed on insulation layer 203 and insulation layer 204 are each patterned. In doing so, conductive layers (213, 214) are formed as shown in
In the present embodiment, multiple wiring boards 20 are formed collectively in one panel 4002 as shown in
Accommodation section (R1) is formed in each wiring board 10. During that time, wall surface (F11) of accommodation section (R1) is formed in a zigzag pattern as shown in
Specifically, accommodation section (R1) is formed in wiring board 10 using die 5001 shaped in a rectangular column as shown in
Alternatively, as shown in
However, the method for forming accommodation section (R1) is not limited to those above, and a router, for example, may be used to cut wiring board 10 so that accommodation section (R1) is formed as shown in
When forming accommodation section (R1), it is preferred that alignment marks (such as conductive patterns) readable by X rays be formed in four corners of wiring board 10, and accommodation section (R1) be formed at a predetermined position based on the alignment marks. Also, deburring may be conducted on cut surfaces if required.
Side surface (F12) of wiring board 20 is also formed in a zigzag pattern as shown in
In the present embodiment, the concavo-convex shape of wall surface (F11) of accommodation section (R1) is formed to correspond to the concavo-convex shape of side surface (F12) of wiring board 20. In particular, a concavo-convex shape is formed respectively on side surface (F12) of wiring board 20 and wall surface (F11) of accommodation section (R1) in such a way that multiple (two, for example) convex portions (P21) on side surface (F12) of wiring board 20 are inserted in concave portion (P11) on wall surface (F11) of accommodation section (R1) (see
Through the above procedures, accommodation section (R1) is formed in each wiring board 10 in frame unit (1000b) as shown in
Wiring board 20 is positioned in accommodation section (R1) formed in wiring board 10 (see
As shown in
Using hydraulic pressing equipment, for example, outer copper foils (3001, 3002) are pressurized. Specifically, pressing and thermal treatments are conducted simultaneously. Through the thermal pressing, insulation layers (301, 302) are pressed in directions Z, prepreg (insulation layers (301, 302)) is cured, and insulation layers (301, 302) and wiring boards (10, 20) are adhered. As a result, the laminate becomes integrated. Also, resin of each insulation layer flows out from insulation layers (301, 302) by pressing and is filled in through hole 120. The resin filled in through hole 120 becomes insulator 140 (see
As shown in
Copper panel plating (such as electroless plating and electrolytic plating), for example, is performed. Accordingly, plating 3003 is formed on copper foils (3001, 3002), in via holes (321a, 321b) and in through hole 520 as shown in
Using photo-etching techniques (acid cleansing, resist lamination, exposure and development, etching, film removal, and the like), for example, conductive layers formed on insulation layers (301, 302) are each patterned. In doing so, conductive layers (311, 312) are formed as shown in
By screen printing, spray coating, roll coating or the like, for example, solder resist 401 having opening portions (411a, 411b) is formed on insulation layer 301 and on conductive layer 311, and solder resist 402 having opening portions (412a, 412b) is formed on insulation layer 302 and on conductive layer 312 (see
External connection terminals (421a, 421b, 422a, 422b) are formed respectively in opening portions (411a, 411b, 412a, 412b) (see
Through the above procedures, wiring board 1000 (
In the manufacturing method according to the present embodiment, wiring board 20, having high-density wiring whose manufacturing procedures are complex, is manufactured separately from wiring board 10. Therefore, wiring board 20 is inspected before being accommodated in accommodation section (R1) of wiring board 10 so that only non-defective wiring board 20 is accommodated in accommodation section (R1) of wiring board 10. As a result, the production yield of wiring boards 1000 improves.
The present invention is not limited to the embodiment above. For example, the present invention may be modified as follows.
As shown in
As shown in
As shown in
As shown in
As shown in
The concavo-convex shape is not always required to be a constant shape. For example, as shown in
As shown in
As shown in
The number of convex portions (P21) to be inserted in one concave portion (P11) is not limited to two. For example, three or more (four, for example) convex portions (P21) may be inserted in one concave portion (P11) as shown in
As shown in
As shown in
The cycle or the size of a concavo-convex shape may be variable or constant. In addition, a concavo-convex shape may be determined freely. The numbers of concave portions and convex portions are not limited specifically, and the cycle of a concavo-convex shape may be a constant cycle or a variable cycle.
As shown in
In the example in
In the example in
In the example in
In
In
To suppress cracking or the like, side surface (F12) of wiring board 20 and wall surface (F11) of accommodation section (R1) (side surface of wiring board 10) are each preferred to have a concavo-convex shape for the entire periphery. However, that is not the only option. For example, even if surfaces are formed partially in a straight line as shown in
As shown in
As shown in
It is preferred that regions making up 50% or greater of the entire periphery of wiring board 20 be formed in a zigzag pattern.
In the embodiment above, multiple convex portions (P21) formed on side surface (F12) of wiring board 20 are inserted into concave portion (P11) formed on wall surface (F11) of accommodation section (R1). However, that is not the only option. For example, multiple convex portions (P12) formed on wall surface (F11) of accommodation section (R1) may be inserted into concave portion (P22) formed on side surface (F12) of wiring board 20, as shown in
The planar shapes (X-Y plane) of wiring board 10 (first rigid wiring board), wiring board 20 (second rigid wiring board) and accommodation section (R1) are not limited specifically. The planar shape of wiring board 20 is not always required to correspond to the planar shape of accommodation section (R1). For example, as shown in
As shown in
As shown in
As shown in
Accommodation section (R1) is not limited to a hole that penetrates through wiring board 10 (first rigid wiring board). For example, as shown in
Wall surface (F11) of accommodation section (R1) is not limited to being substantially perpendicular to main surfaces (
Regarding other factors, structures of wiring boards (10, 20) and insulation layers formed as their upper layers, as well as type, performance, measurements, quality, shapes, number of layers, positioning and so forth of the elements of such structures, may be modified freely within a scope that does not deviate from the gist of the present invention.
Wiring boards (10, 20) may each be a wiring board with a built-in electronic component.
To improve strength or enhance heat dissipation, a metal sheet may be built into the core substrate of wiring board 10 or 20.
The method for connecting wiring board 10 and wiring board 20 is not limited specifically. For example, wire bonding, flip-chip connection or the like may be employed.
The number of buildup layers may be different on the upper and lower surfaces of a wiring board. However, to mitigate stress, it is considered preferable to form the same number of buildup layers on the upper and lower surfaces of a wiring board so that symmetry on the upper and lower surfaces is enhanced.
Wiring boards (10, 20) may each be a single-sided wiring board having conductor (conductive layer) only on either the upper or the lower surface of the core substrate.
The structure of each conductive layer is not limited to being a triple-layered structure of metal foil, electroless plated film and electrolytic plated film. For example, it may be a double-layered structure of metal foil and electroless plated film or electrolytic plated film. Also, the structure of each filled conductor is not limited to being a double-layered structure of electroless plated film and electrolytic plated film. For example, it may be a single-layered structure only of electroless plated film or electrolytic plated film. If electroless plated film is omitted, a decrease in the adhesiveness between an insulation layer and a conductive layer may become a concern. Thus, surface treatment is preferred to be conducted on the insulation layer to enhance adhesiveness if required.
Each via conductor is not limited to being a filled conductor, and may be a conformal conductor.
The contents and the order of the procedure in the above embodiment may be modified freely within a scope that does not deviate from the gist of the present invention. Also, some step may be omitted depending on usage requirements or the like.
For example, the method for forming each conductive layer may be determined freely. Conductive layers may be formed by any one of the following methods or a combination of two or more of them: panel plating, pattern plating, full-additive, semi-additive (SAP), subtractive, transfer and tenting methods.
For example, conductive layers are formed by a subtractive method (a method for patterning through etching) in the above embodiment. However, a semi-additive (SAP) method may be used instead of a subtractive method. In a semi-additive method, after the entire surface of an insulative substrate is made conductive using electroless plated film (panel plating), resist is formed and electrolytic plating is formed where the resist is not present. Then, after the resist is removed, electroless plated film is patterned by etching.
Also, forming each insulation layer (interlayer insulation layer) is not limited to any specific method. For example, liquid or film-type thermosetting resins or their composite, or RCF (resin-coated copper foil) or the like may also be used instead of prepreg.
For example, wet or dry etching process may be employed instead of using a laser. When an etching process is employed, it is preferred to protect in advance with resist or the like portions that are not required to be removed.
The embodiment and modified examples above may be combined freely. For example, any structure shown in
A wiring board according to an embodiment of the present invention has a first rigid wiring board having an accommodation section, a second rigid wiring board accommodated in the accommodation section, and an insulation layer formed on the first rigid wiring board and on the second rigid wiring board. In such a wiring board, a conductor in the first rigid wiring board and a conductor in the second rigid wiring board are electrically connected to each other, a concavo-convex shape is formed on a side surface of the second rigid wiring board and on a wall surface of the accommodation section, and multiple convex portions formed on either the side surface of the second rigid wiring board or the wall surface of the accommodation section are inserted in a concave portion formed on the other.
A wiring board according to another embodiment of the present invention has a first rigid wiring board having an accommodation section, a second rigid wiring board accommodated in the accommodation section, and an insulation layer formed on the first rigid wiring board and on the second rigid wiring board. In such a wiring board, a conductor in the first rigid wiring board and a conductor in the second rigid wiring board are electrically connected to each other, a first concavo-convex shape is formed on a side surface of the second rigid wiring board and on a wall surface of the accommodation section, a convex portion of the first concavo-convex shape formed on either the side surface of the second rigid wiring board or the wall surface of the accommodation section is inserted into a concave portion of the first concavo-convex shape formed on the other, and a second concavo-convex shape finer than the first concavo-convex shape is formed at least either in the concave portion or in the convex portion.
A method for manufacturing a wiring board according to yet another embodiment of the present invention includes the following: preparing a first rigid wiring board having an accommodation section; accommodating a second rigid wiring board in the accommodation section; forming an insulation layer on the first rigid wiring board and on the second rigid wiring board; electrically connecting a conductor in the first rigid wiring board and a conductor in the second rigid wiring board to each other; and forming a concavo-convex shape on a side surface of the second rigid wiring board and on a wall surface of the accommodation section in such a way that multiple convex portions on one side are inserted into a concave portion on the other side.
A method for manufacturing a wiring board according to still another embodiment of the present invention includes the following: preparing a first rigid wiring board having an accommodation section; accommodating a second rigid wiring board in the accommodation section; forming an insulation layer on the first rigid wiring board and on the second rigid wiring board; electrically connecting a conductor in the first rigid wiring board and a conductor in the second rigid wiring board to each other; forming a first concavo-convex shape on a side surface of the second rigid wiring board and on a wall surface of the accommodation section in such a way that a convex portion on one side is inserted into a concave portion on the other side; and forming a second concavo-convex shape finer than the first concavo-convex shape in at least either the concave portion or the convex portion.
Obviously, numerous modifications and variations of the present invention are possible in light of the above teachings. It is therefore to be understood that within the scope of the appended claims, the invention may be practiced otherwise than as specifically described herein.
The present application is based on and claims the benefit of priority to U.S. Application No. 61/511,342, filed Jul. 25, 2011, the entire contents of which are incorporated herein by reference.
Number | Date | Country | |
---|---|---|---|
61511342 | Jul 2011 | US |