Olin Microelectronic Chemicals, Inc.

Organization

East Providence, RI, US

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Patents Grantslast 30 patents

Information Patent Grant
Radiation sensitive compositions of terpolymers containing organosi...
- Patent number 6,042,989
- Issue date Mar 28, 2000
- Olin Microelectronic Chemicals, Inc.
- Ulrich Schaedeli
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive diazonaphthoquinone esters based on selected cyclic...
- Patent number 6,040,107
- Issue date Mar 21, 2000
- Olin Microelectronic Chemicals, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for removing residues from a semiconductor substrate
- Patent number 6,033,993
- Issue date Mar 7, 2000
- Olin Microelectronic Chemicals, Inc.
- M. Lee Love
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning composition and method for removing residues
- Patent number 6,030,932
- Issue date Feb 29, 2000
- Olin Microelectronic Chemicals
- Vincent G. Leon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Terpolymers containing organosilicon side chains
- Patent number 6,028,154
- Issue date Feb 22, 2000
- Olin Microelectronic Chemicals, Inc.
- Ulrich Schaedeli
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for preparing a radiation-sensitive composition
- Patent number 6,027,853
- Issue date Feb 22, 2000
- Olin Microelectronic Chemicals, Inc.
- Sanjay Malik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-corrosive cleaning composition for removing plasma etching resi...
- Patent number 6,020,292
- Issue date Feb 1, 2000
- Olin Microelectronic Chemicals, Inc.
- Kenji Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negatively acting photoresist composition based on polyimide precur...
- Patent number 6,010,825
- Issue date Jan 4, 2000
- Olin Microelectronics Chemicals, Inc.
- Sigurd Hagen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected high thermal novolaks and positive-working radiation-sensi...
- Patent number 5,985,507
- Issue date Nov 16, 1999
- Olin Microelectronic Chemicals, Inc.
- Andrew J. Blakeney
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous rinsing composition
- Patent number 5,977,041
- Issue date Nov 2, 1999
- Olin Microelectronic Chemicals
- Kenji Honda
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist compositions
- Patent number 5,928,818
- Issue date Jul 27, 1999
- Olin Microelectronic Chemicals, Inc.
- Carl-Lorenz Mertesdorf
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Terpolymers containing organosilicon side chains
- Patent number 5,886,119
- Issue date Mar 23, 1999
- Olin Microelectronic Chemicals, Inc.
- Ulrich Schaedeli
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers containing protected styrene and unprotected hydroxbenzyl...
- Patent number 5,863,701
- Issue date Jan 26, 1999
- Olin Microelectronic Chemicals, Inc.
- Carl-Lorenz Mertesdorf
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative working photoresist composition based on polyimide primers
- Patent number 5,856,065
- Issue date Jan 5, 1999
- Olin Microelectronic Chemicals, Inc.
- Sigurd Guenter Hagen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic solvent soluble photoresists which are developable in aqueo...
- Patent number 5,849,808
- Issue date Dec 15, 1998
- Olin Microelectronic Chemicals, Inc.
- Hans-Thomas Schacht
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Crosslinked polymers
- Patent number 5,834,531
- Issue date Nov 10, 1998
- Olin Microelectronic Chemicals, Inc.
- Hans-Thomas Schacht
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for making polyimide-polyamic ester copolymers
- Patent number 5,834,581
- Issue date Nov 10, 1998
- Olin Microelectronic Chemicals, Inc.
- Ahmad Naiini
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Non-corrosive cleaning composition for removing plasma etching resi...
- Patent number 5,817,610
- Issue date Oct 6, 1998
- Olin Microelectronic Chemicals, Inc.
- Kenji Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-corrosive stripping and cleaning composition
- Patent number 5,798,323
- Issue date Aug 25, 1998
- Olin Microelectronic Chemicals, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical imidization reagent for polyimide synthesis
- Patent number 5,789,524
- Issue date Aug 4, 1998
- Olin Microelectronic Chemicals, Inc.
- Steve L. C. Hsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for making polyimides from diamines and tetracarboxylic dia...
- Patent number 5,789,525
- Issue date Aug 4, 1998
- Olin Microelectronic Chemicals, Inc.
- Ahmad Naiini
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers containing protected styrene and unprotected hydroxybenzyl...
- Patent number 5,780,566
- Issue date Jul 14, 1998
- Olin Microelectronic Chemicals, Inc.
- Carl-Lorenz Mertesdorf
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist stripping and cleaning compositions
- Patent number 5,759,973
- Issue date Jun 2, 1998
- Olin Microelectronic Chemicals, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Crosslinked polymers
- Patent number 5,714,559
- Issue date Feb 3, 1998
- Olin Microelectronic Chemicals, Inc.
- Hans-Thomas Schacht
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working photoresist compositions comprising an alkali-solu...
- Patent number 5,674,657
- Issue date Oct 7, 1997
- Olin Microelectronic Chemicals, Inc.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping composition
- Patent number 5,665,688
- Issue date Sep 9, 1997
- Olin Microelectronics Chemicals, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Redox reagent-containing post-etch residue cleaning composition
- Patent number 5,612,304
- Issue date Mar 18, 1997
- Olin Microelectronic Chemicals, Inc.
- Kenji Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Olin Microelectronic Chemicals, Inc.

Organization

Patents Grantslast 30 patents

Radiation sensitive compositions of terpolymers containing organosi...

Photosensitive diazonaphthoquinone esters based on selected cyclic...

Process for removing residues from a semiconductor substrate

Cleaning composition and method for removing residues

Terpolymers containing organosilicon side chains

Process for preparing a radiation-sensitive composition

Non-corrosive cleaning composition for removing plasma etching resi...

Negatively acting photoresist composition based on polyimide precur...

Selected high thermal novolaks and positive-working radiation-sensi...

Aqueous rinsing composition

Photoresist compositions

Terpolymers containing organosilicon side chains

Polymers containing protected styrene and unprotected hydroxbenzyl...

Negative working photoresist composition based on polyimide primers

Organic solvent soluble photoresists which are developable in aqueo...

Crosslinked polymers

Process for making polyimide-polyamic ester copolymers

Non-corrosive cleaning composition for removing plasma etching resi...

Non-corrosive stripping and cleaning composition

Chemical imidization reagent for polyimide synthesis

Process for making polyimides from diamines and tetracarboxylic dia...

Polymers containing protected styrene and unprotected hydroxybenzyl...

Photoresist stripping and cleaning compositions

Crosslinked polymers

Positive-working photoresist compositions comprising an alkali-solu...

Photoresist stripping composition

Redox reagent-containing post-etch residue cleaning composition