COMING CHEN

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HSINCHU, TW

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Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 7,018,906
- Issue date Mar 28, 2006
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming partial reverse active mask
- Patent number 7,001,713
- Issue date Feb 21, 2006
- United Microelectronics, Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor in an interconnect system and method of manufacturing the...
- Patent number 6,894,364
- Issue date May 17, 2005
- United Microelectronics Corp.
- Ming-Yin Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,838,357
- Issue date Jan 4, 2005
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of designing active region pattern with shift dummy pattern
- Patent number 6,810,511
- Issue date Oct 26, 2004
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,486,040
- Issue date Nov 26, 2002
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 6,475,865
- Issue date Nov 5, 2002
- United Microelectronics Corp.
- Gwo-Shii Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,448,159
- Issue date Sep 10, 2002
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing PMOS devices
- Patent number 6,365,471
- Issue date Apr 2, 2002
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an isolation structure including a shallow t...
- Patent number 6,323,105
- Issue date Nov 27, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a shallow trench isolation semiconductor device
- Patent number 6,316,330
- Issue date Nov 13, 2001
- United Microelectronics Corp.
- Gwo-Shii Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating shallow trench isolation structure
- Patent number 6,306,722
- Issue date Oct 23, 2001
- United Microelectronics Corp.
- Gwo-Shii Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of trench polishing
- Patent number 6,291,111
- Issue date Sep 18, 2001
- United Microelectronics Corp.
- Coming Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a metal-oxide-semiconductor transistor
- Patent number 6,277,699
- Issue date Aug 21, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for implementing metal oxide semiconductor field effect tran...
- Patent number 6,274,450
- Issue date Aug 14, 2001
- United Microelectronics Corp.
- Tony Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dummy active pattern
- Patent number 6,232,161
- Issue date May 15, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Equipment for forming a glue layer of an opening
- Patent number 6,228,209
- Issue date May 8, 2001
- United Microelectronics Corp.
- Coming Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing PMOS devices
- Patent number 6,200,840
- Issue date Mar 13, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device capable of preventing...
- Patent number 6,187,645
- Issue date Feb 13, 2001
- United Microelectronics Corp.
- Tony Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a metal-oxide semiconductor device
- Patent number 6,177,336
- Issue date Jan 23, 2001
- United Microelectronics Corp.
- Tony Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing shallow trench isolation
- Patent number 6,177,332
- Issue date Jan 23, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of designing active region pattern with shift dummy pattern
- Patent number 6,178,543
- Issue date Jan 23, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating metal oxide semiconductor
- Patent number 6,174,778
- Issue date Jan 16, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,169,012
- Issue date Jan 2, 2001
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a glue layer of contact/via
- Patent number 6,140,227
- Issue date Oct 31, 2000
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a shallow trench isolation structure
- Patent number 6,136,713
- Issue date Oct 24, 2000
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to fabricate embedded DRAM
- Patent number 6,133,083
- Issue date Oct 17, 2000
- United Microelectronics Corp.
- Tony Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing MOS device using anti reflective coating
- Patent number 6,117,743
- Issue date Sep 12, 2000
- United Microelectronics Corp.
- Wen-Kuan Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating local interconnect
- Patent number 6,083,827
- Issue date Jul 4, 2000
- United Microelectronics Corp.
- Tony Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming an isolation
- Patent number 6,063,689
- Issue date May 16, 2000
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING FOR FORMING A SHALLOW TRENCH ISOLATIO...
- Publication number 20060009005
- Publication date Jan 12, 2006
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR IN AN INTERCONNECT SYSTEM AND METHOD OF MANUFACTURING THE...
- Publication number 20040157392
- Publication date Aug 12, 2004
- MING-YIN HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing for forming a shallow trench isolatio...
- Publication number 20030148589
- Publication date Aug 7, 2003
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of designing active region pattern with shift dummy pattern
- Publication number 20030056191
- Publication date Mar 20, 2003
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming partial reverse active mask
- Publication number 20020094493
- Publication date Jul 18, 2002
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING MOS TRANSISTOR
- Publication number 20020045318
- Publication date Apr 18, 2002
- COMING CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing for forming a shallow trench isolatio...
- Publication number 20020037629
- Publication date Mar 28, 2002
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming partial reverse active mask
- Publication number 20020001919
- Publication date Jan 3, 2002
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS

COMING CHEN

Person

Patents Grantslast 30 patents

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of forming partial reverse active mask

Capacitor in an interconnect system and method of manufacturing the...

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of designing active region pattern with shift dummy pattern

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of fabricating semiconductor device

Chemical mechanical polishing for forming a shallow trench isolatio...

Method for producing PMOS devices

Method for fabricating an isolation structure including a shallow t...

Method of fabricating a shallow trench isolation semiconductor device

Method for fabricating shallow trench isolation structure

Method of trench polishing

Method for forming a metal-oxide-semiconductor transistor

Method for implementing metal oxide semiconductor field effect tran...

Method for forming a dummy active pattern

Equipment for forming a glue layer of an opening

Method for producing PMOS devices

Method for manufacturing semiconductor device capable of preventing...

Method for fabricating a metal-oxide semiconductor device

Method of manufacturing shallow trench isolation

Method of designing active region pattern with shift dummy pattern

Method of fabricating metal oxide semiconductor

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of fabricating a glue layer of contact/via

Method for forming a shallow trench isolation structure

Method to fabricate embedded DRAM

Method of manufacturing MOS device using anti reflective coating

Method for fabricating local interconnect

Method for forming an isolation

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING FOR FORMING A SHALLOW TRENCH ISOLATIO...

CAPACITOR IN AN INTERCONNECT SYSTEM AND METHOD OF MANUFACTURING THE...

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of designing active region pattern with shift dummy pattern

Method of forming partial reverse active mask

METHOD FOR MANUFACTURING MOS TRANSISTOR

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of forming partial reverse active mask