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David S. Becker
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Boise, ID, US
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Patents Grants
last 30 patents
Information
Patent Grant
Method of forming high aspect ratio apertures
Patent number
7,608,196
Issue date
Oct 27, 2009
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching methods
Patent number
7,183,220
Issue date
Feb 27, 2007
Micron Technology, Inc.
Guy T. Blalock
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming high aspect ratio apertures
Patent number
7,163,641
Issue date
Jan 16, 2007
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etchant and method of use
Patent number
7,074,724
Issue date
Jul 11, 2006
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for enhancing silicon dioxide to silicon nitride selectivity
Patent number
7,049,244
Issue date
May 23, 2006
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching methods
Patent number
6,958,297
Issue date
Oct 25, 2005
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etchant and method of use
Patent number
6,890,863
Issue date
May 10, 2005
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching methods
Patent number
6,812,154
Issue date
Nov 2, 2004
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas pulsing for etch profile control
Patent number
6,784,108
Issue date
Aug 31, 2004
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of reducing overetch during the formation of a semiconductor...
Patent number
6,759,320
Issue date
Jul 6, 2004
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming high aspect ratio apertures
Patent number
6,610,212
Issue date
Aug 26, 2003
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching methods
Patent number
6,492,279
Issue date
Dec 10, 2002
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of reducing overetch during the formation of a semiconductor...
Patent number
6,451,678
Issue date
Sep 17, 2002
Micron Technology, lnc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor structure useful in a self-aligned contact etch and m...
Patent number
6,436,844
Issue date
Aug 20, 2002
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming high aspect ratio apertures
Patent number
6,342,165
Issue date
Jan 29, 2002
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor structure useful in a self-aligned contact etch and m...
Patent number
6,331,495
Issue date
Dec 18, 2001
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of etching a substrate
Patent number
6,287,978
Issue date
Sep 11, 2001
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching methods
Patent number
6,277,759
Issue date
Aug 21, 2001
Micron Technology, Inc.
Guy T. Blalock
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Fuse structures
Patent number
6,239,455
Issue date
May 29, 2001
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Self-aligned contact formation for semiconductor devices
Patent number
6,207,571
Issue date
Mar 27, 2001
Micron Technology, Inc.
Werner Juengling
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of reducing overetch during the formation of a semiconductor...
Patent number
6,153,501
Issue date
Nov 28, 2000
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming high aspect ratio apertures
Patent number
6,123,862
Issue date
Sep 26, 2000
Micron Technology, Inc.
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods for etching fuse openings in a semiconductor device
Patent number
6,107,178
Issue date
Aug 22, 2000
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Self-aligned contact formation for semiconductor devices
Patent number
6,080,672
Issue date
Jun 27, 2000
Micron Technology, Inc.
Werner Juengling
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of reducing overetch during the formation of a semiconductor...
Patent number
6,051,501
Issue date
Apr 18, 2000
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor structure useful in a self-aligned contact having mul...
Patent number
6,018,184
Issue date
Jan 25, 2000
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for enhancing oxide to nitride selectivity through the use o...
Patent number
6,015,760
Issue date
Jan 18, 2000
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor processing methods of forming a contact opening to a...
Patent number
5,994,237
Issue date
Nov 30, 1999
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
In situ etch process for insulating and conductive materials
Patent number
5,899,749
Issue date
May 4, 1999
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods for etching fuse openings in a semiconductor device
Patent number
5,895,262
Issue date
Apr 20, 1999
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Method of forming high aspect ratio apertures
Publication number
20070084826
Publication date
Apr 19, 2007
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Etchant and method of use
Publication number
20060186087
Publication date
Aug 24, 2006
Kevin G. Donohoe
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
Etchant and method of use
Publication number
20040248413
Publication date
Dec 9, 2004
Micron Technology, Inc.
Kevin G. Donohoe
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
Plasma etching methods
Publication number
20030207581
Publication date
Nov 6, 2003
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming high aspect ratio apertures
Publication number
20030192858
Publication date
Oct 16, 2003
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PREVENTING ALUMINUM SPUTTERING DURING OXIDE VIA ETCHING
Publication number
20030153175
Publication date
Aug 14, 2003
GUY BLALOCK
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching methods
Publication number
20030036283
Publication date
Feb 20, 2003
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of reducing overetch during the formation of a semiconductor...
Publication number
20030003764
Publication date
Jan 2, 2003
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming high aspect ratio apertures
Publication number
20020084256
Publication date
Jul 4, 2002
Kevin G. Donohoe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Semiconductor structure useful in a self-aligned contact etch and m...
Publication number
20020001970
Publication date
Jan 3, 2002
Micron Technology, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for enhancing oxide to nitride selectivity through the use o...
Publication number
20020000423
Publication date
Jan 3, 2002
Micron Technologies, Inc.
David S. Becker
H01 - BASIC ELECTRIC ELEMENTS