Edward D. Babich

Person

Chappaqua, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Energy sensitive electrically conductive admixtures, uses thereof,...
- Patent number 6,685,853
- Issue date Feb 3, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,617,086
- Issue date Sep 9, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,251,569
- Issue date Jun 26, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy sensitive electrically conductive admixtures
- Patent number 6,132,644
- Issue date Oct 17, 2000
- International Business Machines Corporation
- Marie Angelopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter deposition of hydrogenated amorphous carbon film and applic...
- Patent number 5,830,332
- Issue date Nov 3, 1998
- International Business Machines Corporation
- Edward D. Babich
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,770,345
- Issue date Jun 23, 1998
- International Business Machines Corporation
- Edward Darko Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,753,412
- Issue date May 19, 1998
- International Business Machines Corporation
- Edward Darko Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,593,812
- Issue date Jan 14, 1997
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dielectric structures having embedded gap filling RIE etch stop pol...
- Patent number 5,565,529
- Issue date Oct 15, 1996
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry developable photoresist and use thereof
- Patent number 5,457,005
- Issue date Oct 10, 1995
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base developable negative photoresist composition and use thereof
- Patent number 5,286,599
- Issue date Feb 15, 1994
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkaline developable photoresist composition containing radiation s...
- Patent number 5,238,773
- Issue date Aug 24, 1993
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry developable photoresist containing an epoxide, organosilicon an...
- Patent number 5,229,251
- Issue date Jul 20, 1993
- International Business Machines Corp.
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dielectric structures having embedded gap filling RIE etch stop pol...
- Patent number 5,141,817
- Issue date Aug 25, 1992
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Epoxy functional organosilicon polymer
- Patent number 5,115,095
- Issue date May 19, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern
- Patent number 5,110,711
- Issue date May 5, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern of a photoresist
- Patent number 5,098,816
- Issue date Mar 24, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet light sensitive photoinitiator compositions, use thereo...
- Patent number 5,059,512
- Issue date Oct 22, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,981,909
- Issue date Jan 1, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,782,008
- Issue date Nov 1, 1988
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic etching process using organosilicon polymer compo...
- Patent number 4,693,960
- Issue date Sep 15, 1987
- International Business Machines Corporation
- Edward D. Babich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organosilicon compound and use thereof in photolithography
- Patent number 4,603,195
- Issue date Jul 29, 1986
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Forming a pattern of a negative photoresist
- Publication number 20020123010
- Publication date Sep 5, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Edward D. Babich

Person

Patents Grantslast 30 patents

Energy sensitive electrically conductive admixtures, uses thereof,...

Forming a pattern of a negative photoresist

Plasma resistant composition and use thereof

Forming a pattern of a negative photoresist

Energy sensitive electrically conductive admixtures

Sputter deposition of hydrogenated amorphous carbon film and applic...

Photoresist having increased sensitivity and use thereof

Photoresist having increased sensitivity and use thereof

Photoresist having increased sensitivity and use thereof

Dielectric structures having embedded gap filling RIE etch stop pol...

Dry developable photoresist and use thereof

Base developable negative photoresist composition and use thereof

Alkaline developable photoresist composition containing radiation s...

Dry developable photoresist containing an epoxide, organosilicon an...

Dielectric structures having embedded gap filling RIE etch stop pol...

Epoxy functional organosilicon polymer

Method for forming a pattern

Method for forming a pattern of a photoresist

Ultraviolet light sensitive photoinitiator compositions, use thereo...

Plasma-resistant polymeric material, preparation thereof, and use t...

Plasma-resistant polymeric material, preparation thereof, and use t...

Photolithographic etching process using organosilicon polymer compo...

Organosilicon compound and use thereof in photolithography

Patents Applicationslast 30 patents

Forming a pattern of a negative photoresist