Fumio Oi

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Ashiya, JP

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Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive positive resist composition comprising a 1,2-qu...
- Patent number 5,861,229
- Issue date Jan 19, 1999
- Sumitomo Chemical Company, Limited
- Haruyoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,456,995
- Issue date Oct 10, 1995
- Sumitomo Chemical Company, Limited
- Haruyoshi Ozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,456,996
- Issue date Oct 10, 1995
- Sumitomo Chemical Company, Limited
- Haruyoshi Ozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising a quinone diazide sulfonic diester an...
- Patent number 5,378,586
- Issue date Jan 3, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, novel phenol compound and quinone diazide sulfo...
- Patent number 5,290,656
- Issue date Mar 1, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition containing alkali-soluble resin an...
- Patent number 5,124,228
- Issue date Jun 23, 1992
- Sumitomo Chemical Co., Ltd.
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing a positive resist composition by mixing the c...
- Patent number 5,080,997
- Issue date Jan 14, 1992
- Sumitomo Chemical Company, Limited
- Takeshi Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing quinone diazide sulfonic aci...
- Patent number 5,059,507
- Issue date Oct 22, 1991
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin for positive photoresist
- Patent number 4,812,551
- Issue date Mar 14, 1989
- Sumitomo Chemical Company, Limited
- Fumio Oi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Radiation-sensitive positive resist composition comprising a 1,2-qu...

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Resist composition comprising a quinone diazide sulfonic diester an...

Resist composition, novel phenol compound and quinone diazide sulfo...

Positive photoresist composition containing alkali-soluble resin an...

Process for preparing a positive resist composition by mixing the c...

Positive resist composition containing quinone diazide sulfonic aci...

Novolak resin for positive photoresist