James Allan Bruce

Person

Williston, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Determining lithographic set point using optical proximity correcti...
- Patent number 8,619,236
- Issue date Dec 31, 2013
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diagnosing in-line critical dimension control adjustments using opt...
- Patent number 8,577,489
- Issue date Nov 5, 2013
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction verification accounting for mask devia...
- Patent number 8,499,260
- Issue date Jul 30, 2013
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for creating electrically testable patterns
- Patent number 8,219,964
- Issue date Jul 10, 2012
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design verification
- Patent number 8,166,423
- Issue date Apr 24, 2012
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
OPC verification using auto-windowed regions
- Patent number 7,562,337
- Issue date Jul 14, 2009
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect analysis system
- Patent number 7,492,940
- Issue date Feb 17, 2009
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect analysis system
- Patent number 7,492,941
- Issue date Feb 17, 2009
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design verification
- Patent number 7,269,808
- Issue date Sep 11, 2007
- International Business Machines Corporation
- James A. Bruce
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask defect analysis system
- Patent number 7,257,247
- Issue date Aug 14, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask/wafer control structure and algorithm for placement
- Patent number 6,766,507
- Issue date Jul 20, 2004
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure for lithographic focus control features
- Patent number 6,577,406
- Issue date Jun 10, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for edge bias correction of topography-induced linewidth var...
- Patent number 6,539,321
- Issue date Mar 25, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,498,096
- Issue date Dec 24, 2002
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etch bias proximity correction
- Patent number 6,395,438
- Issue date May 28, 2002
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming implants in semiconductor fabrication
- Patent number 6,395,624
- Issue date May 28, 2002
- International Business Machines Corporation
- James A. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SPM base focal plane positioning
- Patent number 6,369,397
- Issue date Apr 9, 2002
- International Business Machines Corporation
- Brent A. Anderson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask with linewidth compensation and method of making same
- Patent number 6,338,921
- Issue date Jan 15, 2002
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce plasma etch fluting
- Patent number 6,303,416
- Issue date Oct 16, 2001
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple precipitation doping process
- Patent number 6,300,228
- Issue date Oct 9, 2001
- International Business Machines Corporation
- James W. Adkisson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,215,190
- Issue date Apr 10, 2001
- International Business Machines Corporation
- James Allen Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of photolithographically defining three regions with one mas...
- Patent number 6,147,394
- Issue date Nov 14, 2000
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving visibility of alignment target in semiconducto...
- Patent number 6,015,750
- Issue date Jan 18, 2000
- International Business Machines Corporation
- James A. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of photolithographically defining three regions with one mas...
- Patent number 5,972,570
- Issue date Oct 26, 1999
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving visibility of alignment targets in semiconduct...
- Patent number 5,760,483
- Issue date Jun 2, 1998
- International, Business Machines Corporation
- James A. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Illumination tailoring system using photochromic filter
- Patent number 5,614,990
- Issue date Mar 25, 1997
- International Business Machines Corporation
- James A. Bruce
- G02 - OPTICS
Information Patent Grant
Electrical test structure and method for space and line measurement
- Patent number 5,552,718
- Issue date Sep 3, 1996
- International Business Machines Corp.
- James A. Bruce
- G01 - MEASURING TESTING
Information Patent Grant
Fluorine-containing base layer for multi-layer resist processes
- Patent number 4,978,594
- Issue date Dec 18, 1990
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion characterization test site
- Patent number 4,612,805
- Issue date Sep 23, 1986
- International Business Machines Corporation
- James A. Bruce
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION VERIFICATION ACCOUNTING FOR MASK DEVIA...
- Publication number 20120192124
- Publication date Jul 26, 2012
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIAGNOSING IN-LINE CRITICAL DIMENSION CONTROL ADJUSTMENTS USING OPT...
- Publication number 20120191234
- Publication date Jul 26, 2012
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTI...
- Publication number 20120127442
- Publication date May 24, 2012
- International Business Machines Corporation
- JAMES A. BRUCE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CREATING ELECTRICALLY TESTABLE PATTERNS
- Publication number 20110173586
- Publication date Jul 14, 2011
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN VERIFICATION
- Publication number 20110061030
- Publication date Mar 10, 2011
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPC VERIFICATION USING AUTO-WINDOWED REGIONS
- Publication number 20080141211
- Publication date Jun 12, 2008
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT ANALYSIS SYSTEM
- Publication number 20070248257
- Publication date Oct 25, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT ANALYSIS SYSTEM
- Publication number 20070237384
- Publication date Oct 11, 2007
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGN VERIFICATION
- Publication number 20060270268
- Publication date Nov 30, 2006
- International Business Machines Corporation
- James A. Bruce
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask/wafer control structure and algorithm for placement
- Publication number 20030196185
- Publication date Oct 16, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask defect analysis system
- Publication number 20030161525
- Publication date Aug 28, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EDGE BIAS CORRECTION OF TOPOGRAPHY-INDUCED LINEWIDTH VAR...
- Publication number 20030018443
- Publication date Jan 23, 2003
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structure for lithographic focus control features
- Publication number 20020122187
- Publication date Sep 5, 2002
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Borderless contact to diffusion with respect to gate conductor and...
- Publication number 20010019886
- Publication date Sep 6, 2001
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS

James Allan Bruce

Person

Patents Grantslast 30 patents

Determining lithographic set point using optical proximity correcti...

Diagnosing in-line critical dimension control adjustments using opt...

Optical proximity correction verification accounting for mask devia...

Method for creating electrically testable patterns

Photomask design verification

OPC verification using auto-windowed regions

Mask defect analysis system

Mask defect analysis system

Design verification

Mask defect analysis system

Mask/wafer control structure and algorithm for placement

Structure for lithographic focus control features

Method for edge bias correction of topography-induced linewidth var...

Borderless contact to diffusion with respect to gate conductor and...

Method of etch bias proximity correction

Method for forming implants in semiconductor fabrication

SPM base focal plane positioning

Mask with linewidth compensation and method of making same

Method to reduce plasma etch fluting

Multiple precipitation doping process

Borderless contact to diffusion with respect to gate conductor and...

Method of photolithographically defining three regions with one mas...

Method for improving visibility of alignment target in semiconducto...

Method of photolithographically defining three regions with one mas...

Method for improving visibility of alignment targets in semiconduct...

Illumination tailoring system using photochromic filter

Electrical test structure and method for space and line measurement

Fluorine-containing base layer for multi-layer resist processes

Adhesion characterization test site

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION VERIFICATION ACCOUNTING FOR MASK DEVIA...

DIAGNOSING IN-LINE CRITICAL DIMENSION CONTROL ADJUSTMENTS USING OPT...

DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTI...

METHOD FOR CREATING ELECTRICALLY TESTABLE PATTERNS

PHOTOMASK DESIGN VERIFICATION

OPC VERIFICATION USING AUTO-WINDOWED REGIONS

MASK DEFECT ANALYSIS SYSTEM

MASK DEFECT ANALYSIS SYSTEM

DESIGN VERIFICATION

Mask/wafer control structure and algorithm for placement

Mask defect analysis system

METHOD FOR EDGE BIAS CORRECTION OF TOPOGRAPHY-INDUCED LINEWIDTH VAR...

Structure for lithographic focus control features

Borderless contact to diffusion with respect to gate conductor and...