Jang Gyoo Yang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 11,408,075
- Issue date Aug 9, 2022
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 10,354,843
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 10,283,321
- Issue date May 7, 2019
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 10,113,236
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal with multi-zone temperature control and multiple purge cap...
- Patent number 10,062,587
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Xinglong Chen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 10,056,233
- Issue date Aug 21, 2018
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 10,032,606
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,978,564
- Issue date May 22, 2018
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 9,741,545
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 9,502,218
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry-etch selectivity
- Patent number 9,384,997
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 9,373,517
- Issue date Jun 21, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal with multi-zone temperature control and multiple purge cap...
- Patent number 9,267,739
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Xinglong Chen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 9,144,147
- Issue date Sep 22, 2015
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,132,436
- Issue date Sep 15, 2015
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Dry-etch selectivity
- Patent number 8,969,212
- Issue date Mar 3, 2015
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow control features of CVD chambers
- Patent number 8,894,767
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source design
- Patent number 8,771,538
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source design
- Patent number 8,742,665
- Issue date Jun 3, 2014
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable dielectric equipment and processes
- Patent number 8,357,435
- Issue date Jan 22, 2013
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric film formation using inert gas excitation
- Patent number 8,329,262
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Matthew L. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 8,237,517
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 7,994,872
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Remote plasma source seasoning
- Patent number 7,989,365
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma gapfill deposition-etch-deposition process etchant
- Patent number 7,972,968
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Young S. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitively coupled plasma reactor with magnetic plasma control
- Patent number 7,955,986
- Issue date Jun 7, 2011
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of feedback control of ESC voltage using wafer voltage measu...
- Patent number 7,375,947
- Issue date May 20, 2008
- Applied Materials, Inc.
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20220341042
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20190048470
- Publication date Feb 14, 2019
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20170301517
- Publication date Oct 19, 2017
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20170236691
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20170125220
- Publication date May 4, 2017
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...
- Publication number 20160300694
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...
- Publication number 20160126118
- Publication date May 5, 2016
- Applied Materials, Inc.
- Xinglong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20160005572
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20150329970
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20150221479
- Publication date Aug 6, 2015
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY-ETCH SELECTIVITY
- Publication number 20150132968
- Publication date May 14, 2015
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20150013793
- Publication date Jan 15, 2015
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY-ETCH SELECTIVITY
- Publication number 20140141621
- Publication date May 22, 2014
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20140097270
- Publication date Apr 10, 2014
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...
- Publication number 20140057447
- Publication date Feb 27, 2014
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...
- Publication number 20140021673
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Xinglong Chen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PRECURSOR DISTRIBUTION FEATURES FOR IMPROVED DEPOSITION UNIFORMITY
- Publication number 20130306758
- Publication date Nov 21, 2013
- Applied Materials, Inc.
- Soonam Park
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20130153148
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20130082197
- Publication date Apr 4, 2013
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...
- Publication number 20120180954
- Publication date Jul 19, 2012
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20110291771
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL
- Publication number 20110201134
- Publication date Aug 18, 2011
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC FILM FORMATION USING INERT GAS EXCITATION
- Publication number 20110165347
- Publication date Jul 7, 2011
- Applied Materials, Inc.
- Matthew L. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE DESIGN
- Publication number 20110115378
- Publication date May 19, 2011
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE DESIGN
- Publication number 20110114601
- Publication date May 19, 2011
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE SEASONING
- Publication number 20110045676
- Publication date Feb 24, 2011
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20110011338
- Publication date Jan 20, 2011
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS
- Publication number 20100098882
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jang Gyoo Yang

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Batch curing chamber with gas distribution and individual pumping

Chemical control features in wafer process equipment

Flow control features of CVD chambers

Chemical control features in wafer process equipment

Semiconductor processing system and methods using capacitively coup...

Batch curing chamber with gas distribution and individual pumping

Pedestal with multi-zone temperature control and multiple purge cap...

RPS assisted RF plasma source for semiconductor processing

Semiconductor processing with DC assisted RF power for improved con...

Chemical control features in wafer process equipment

RPS assisted RF plasma source for semiconductor processing

RPS assisted RF plasma source for semiconductor processing

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved con...

Pedestal with multi-zone temperature control and multiple purge cap...

Semiconductor processing system and methods using capacitively coup...

Chemical control features in wafer process equipment

Dry-etch selectivity

Flow control features of CVD chambers

Plasma source design

Plasma source design

Flowable dielectric equipment and processes

Dielectric film formation using inert gas excitation

Apparatus for multiple frequency power application

Apparatus for multiple frequency power application

Remote plasma source seasoning

High density plasma gapfill deposition-etch-deposition process etchant

Capacitively coupled plasma reactor with magnetic plasma control

Method of feedback control of ESC voltage using wafer voltage measu...

Patents Applicationslast 30 patents

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

FLOW CONTROL FEATURES OF CVD CHAMBERS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...

PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

DRY-ETCH SELECTIVITY

FLOW CONTROL FEATURES OF CVD CHAMBERS

DRY-ETCH SELECTIVITY

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...

PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...

PRECURSOR DISTRIBUTION FEATURES FOR IMPROVED DEPOSITION UNIFORMITY

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUP...

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL

DIELECTRIC FILM FORMATION USING INERT GAS EXCITATION

PLASMA SOURCE DESIGN

PLASMA SOURCE DESIGN

REMOTE PLASMA SOURCE SEASONING

FLOW CONTROL FEATURES OF CVD CHAMBERS

PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS