Jingchun Zhang

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,637,002
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,239,061
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for improved performance in semiconductor proce...
- Patent number 10,892,198
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- Chirantha P. Rodrigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etch of metal and metal-oxide films
- Patent number 10,062,578
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen plasma based cleaning process for etch hardware
- Patent number 10,026,597
- Issue date Jul 17, 2018
- Applied Materials, Inc.
- Chirantha Rodrigo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Differential silicon oxide etch
- Patent number 9,887,096
- Issue date Feb 6, 2018
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon selective removal
- Patent number 9,881,805
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etch of SiN films
- Patent number 9,842,744
- Issue date Dec 12, 2017
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch for silicon films
- Patent number 9,754,800
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch suppression with germanium
- Patent number 9,576,809
- Issue date Feb 21, 2017
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-selective removal
- Patent number 9,564,338
- Issue date Feb 7, 2017
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Procedure for etch rate consistency
- Patent number 9,472,412
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 9,449,845
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,437,451
- Issue date Sep 6, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of silicon by way of metastable hydrogen termination
- Patent number 9,418,858
- Issue date Aug 16, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-carbon-nitride selective etch
- Patent number 9,390,937
- Issue date Jul 12, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etch of sin films
- Patent number 9,343,327
- Issue date May 17, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Selective etch for silicon films
- Patent number 9,324,576
- Issue date Apr 26, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Procedure for etch rate consistency
- Patent number 9,245,762
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch for silicon-and-carbon-containing films
- Patent number 9,236,266
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal oxide dry etch
- Patent number 9,093,390
- Issue date Jul 28, 2015
- Applied Materials, Inc.
- Anchuan Wang
- B44 - DECORATIVE ARTS
Information Patent Grant
Methods for etch of metal and metal-oxide films
- Patent number 9,064,815
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential silicon oxide etch
- Patent number 9,034,770
- Issue date May 19, 2015
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,023,734
- Issue date May 5, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etch of sin films
- Patent number 8,999,856
- Issue date Apr 7, 2015
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 8,921,234
- Issue date Dec 30, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of silicon by way of metastable hydrogen termination
- Patent number 8,808,563
- Issue date Aug 19, 2014
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal oxide dry etch
- Patent number 8,801,952
- Issue date Aug 12, 2014
- Applied Materials, Inc.
- Anchuan Wang
- B44 - DECORATIVE ARTS
Information Patent Grant
Dry-etch for silicon-and-carbon-containing films
- Patent number 8,771,536
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remotely-excited fluorine and water vapor etch
- Patent number 8,771,539
- Issue date Jul 8, 2014
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED PERFORMANCE IN SEMICONDUCTOR PROCE...
- Publication number 20200091018
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Chirantha P. Rodrigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES
- Publication number 20190304756
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY
- Publication number 20170229291
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN PLASMA BASED CLEANING PROCESS FOR ETCH HARDWARE
- Publication number 20170200590
- Publication date Jul 13, 2017
- Applied Materials, Inc.
- Chirantha RODRIGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON SELECTIVE REMOVAL
- Publication number 20160260616
- Publication date Sep 8, 2016
- Applied Materials, Inc.
- Zihui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCH OF SIN FILMS
- Publication number 20160260619
- Publication date Sep 8, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELECTIVE ETCH FOR SILICON FILMS
- Publication number 20160240389
- Publication date Aug 18, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY
- Publication number 20160148821
- Publication date May 26, 2016
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCEDURE FOR ETCH RATE CONSISTENCY
- Publication number 20160086808
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCH OF METAL AND METAL-OXIDE FILMS
- Publication number 20150318186
- Publication date Nov 5, 2015
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL SILICON OXIDE ETCH
- Publication number 20150249018
- Publication date Sep 3, 2015
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20150235863
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCH OF SIN FILMS
- Publication number 20150214067
- Publication date Jul 30, 2015
- Applied Materials, Inc.
- Jingchun Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCEDURE FOR ETCH RATE CONSISTENCY
- Publication number 20150155177
- Publication date Jun 4, 2015
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SUPPRESSION WITH GERMANIUM
- Publication number 20150126039
- Publication date May 7, 2015
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20150118857
- Publication date Apr 30, 2015
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL OXIDE DRY ETCH
- Publication number 20140308818
- Publication date Oct 16, 2014
- Anchuan Wang
- B44 - DECORATIVE ARTS
Information Patent Application
SELECTIVE ETCH OF SILICON BY WAY OF METASTABLE HYDROGEN TERMINATION
- Publication number 20140308816
- Publication date Oct 16, 2014
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SILICON-AND-CARBON-CONTAINING FILMS
- Publication number 20140273491
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TITANIUM NITRIDE ETCHING
- Publication number 20140179111
- Publication date Jun 26, 2014
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCH PROCESS
- Publication number 20140134842
- Publication date May 15, 2014
- Applied Materials, Inc.
- Jingchun Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-COMPONENT OXIDE ETCH
- Publication number 20140080308
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CARBON-NITRIDE SELECTIVE ETCH
- Publication number 20140080310
- Publication date Mar 20, 2014
- Applied Materials Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL SILICON OXIDE ETCH
- Publication number 20140080309
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Seung H. Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SILICON-AND-NITROGEN-CONTAINING FILMS
- Publication number 20130130507
- Publication date May 23, 2013
- Applied Materials, Inc.
- Yunyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...
- Publication number 20130130506
- Publication date May 23, 2013
- Applied Materials, Inc.
- Yunyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH OF SILICON BY WAY OF METASTABLE HYDROGEN TERMINATION
- Publication number 20130089988
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...
- Publication number 20130059440
- Publication date Mar 7, 2013
- Applied Materials, Inc.
- Yunyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...
- Publication number 20130052827
- Publication date Feb 28, 2013
- Applied Materials, Inc.
- Yunyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCH FOR SILICON-AND-NITROGEN-CONTAINING FILMS
- Publication number 20130045605
- Publication date Feb 21, 2013
- Applied Materials, Inc.
- Yunyu Wang
- H01 - BASIC ELECTRIC ELEMENTS

Jingchun Zhang

Person

Patents Grantslast 30 patents

Methods and systems to enhance process uniformity

Methods and systems to enhance process uniformity

Systems and methods for improved performance in semiconductor proce...

Methods for etch of metal and metal-oxide films

Hydrogen plasma based cleaning process for etch hardware

Differential silicon oxide etch

Silicon selective removal

Methods for etch of SiN films

Selective etch for silicon films

Etch suppression with germanium

Silicon-selective removal

Procedure for etch rate consistency

Selective titanium nitride etching

Radical-component oxide etch

Selective etch of silicon by way of metastable hydrogen termination

Silicon-carbon-nitride selective etch

Methods for etch of sin films

Selective etch for silicon films

Procedure for etch rate consistency

Dry-etch for silicon-and-carbon-containing films

Conformal oxide dry etch

Methods for etch of metal and metal-oxide films

Differential silicon oxide etch

Radical-component oxide etch

Methods for etch of sin films

Selective titanium nitride etching

Selective etch of silicon by way of metastable hydrogen termination

Conformal oxide dry etch

Dry-etch for silicon-and-carbon-containing films

Remotely-excited fluorine and water vapor etch

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR IMPROVED PERFORMANCE IN SEMICONDUCTOR PROCE...

SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES

METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY

HYDROGEN PLASMA BASED CLEANING PROCESS FOR ETCH HARDWARE

SILICON SELECTIVE REMOVAL

METHODS FOR ETCH OF SIN FILMS

SELECTIVE ETCH FOR SILICON FILMS

METHODS AND SYSTEMS TO ENHANCE PROCESS UNIFORMITY

PROCEDURE FOR ETCH RATE CONSISTENCY

METHODS FOR ETCH OF METAL AND METAL-OXIDE FILMS

DIFFERENTIAL SILICON OXIDE ETCH

RADICAL-COMPONENT OXIDE ETCH

METHODS FOR ETCH OF SIN FILMS

PROCEDURE FOR ETCH RATE CONSISTENCY

ETCH SUPPRESSION WITH GERMANIUM

SELECTIVE TITANIUM NITRIDE ETCHING

CONFORMAL OXIDE DRY ETCH

SELECTIVE ETCH OF SILICON BY WAY OF METASTABLE HYDROGEN TERMINATION

DRY-ETCH FOR SILICON-AND-CARBON-CONTAINING FILMS

SELECTIVE TITANIUM NITRIDE ETCHING

DRY ETCH PROCESS

RADICAL-COMPONENT OXIDE ETCH

SILICON-CARBON-NITRIDE SELECTIVE ETCH

DIFFERENTIAL SILICON OXIDE ETCH

DRY-ETCH FOR SILICON-AND-NITROGEN-CONTAINING FILMS

SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...

SELECTIVE ETCH OF SILICON BY WAY OF METASTABLE HYDROGEN TERMINATION

SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...

SELECTIVE SUPPRESSION OF DRY-ETCH RATE OF MATERIALS CONTAINING BOTH...

DRY-ETCH FOR SILICON-AND-NITROGEN-CONTAINING FILMS