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Leonid Dorf
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Feedback loop for controlling a pulsed voltage waveform
Patent number
12,057,292
Issue date
Aug 6, 2024
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
Patent number
11,948,780
Issue date
Apr 2, 2024
Applied Materials, Inc.
Linying Cui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Symmetric VHF source for a plasma reactor
Patent number
11,935,724
Issue date
Mar 19, 2024
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
Patent number
11,848,176
Issue date
Dec 19, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
Patent number
11,791,138
Issue date
Oct 17, 2023
Applied Materials, Inc.
Linying Cui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
Patent number
11,776,789
Issue date
Oct 3, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Creating ion energy distribution functions (IEDF)
Patent number
11,728,124
Issue date
Aug 15, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Feedback loop for controlling a pulsed voltage waveform
Patent number
11,699,572
Issue date
Jul 11, 2023
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus and method for controlling edge ring variation
Patent number
11,668,553
Issue date
Jun 6, 2023
Applied Materials Inc.
Sathyendra Ghantasala
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Symmetric VHF source for a plasma reactor
Patent number
11,587,766
Issue date
Feb 21, 2023
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High voltage filter assembly
Patent number
11,508,554
Issue date
Nov 22, 2022
Applied Materials, Inc.
Anurag Kumar Mishra
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for processing a substrate
Patent number
11,482,402
Issue date
Oct 25, 2022
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Automatic ESC bias compensation when using pulsed DC bias
Patent number
11,476,145
Issue date
Oct 18, 2022
Applied Materials, Inc.
James Rogers
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
Patent number
11,462,388
Issue date
Oct 4, 2022
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pulsed-voltage hardware assembly for use in a plasma processing system
Patent number
11,462,389
Issue date
Oct 4, 2022
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of controlling ion energy distribution using a pulse generator
Patent number
11,284,500
Issue date
Mar 22, 2022
APPLIED MATERIALS, INC.
Leonid Dorf
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ion-ion plasma atomic layer etch process
Patent number
11,101,113
Issue date
Aug 24, 2021
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Creating ion energy distribution functions (IEDF)
Patent number
11,069,504
Issue date
Jul 20, 2021
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Symmetric VHF source for a plasma reactor
Patent number
11,043,361
Issue date
Jun 22, 2021
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Adjustable extended electrode for edge uniformity control
Patent number
10,991,556
Issue date
Apr 27, 2021
Applied Materials, Inc.
Olivier Luere
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System for tunable workpiece biasing in a plasma reactor
Patent number
10,923,320
Issue date
Feb 16, 2021
Applied Materials, Inc.
Travis Koh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus and method of generating a pulsed waveform
Patent number
10,923,321
Issue date
Feb 16, 2021
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus and method of forming plasma using a pulsed waveform
Patent number
10,916,408
Issue date
Feb 9, 2021
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of controlling ion energy distribution using a pulse generat...
Patent number
10,791,617
Issue date
Sep 29, 2020
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Creating ion energy distribution functions (IEDF)
Patent number
10,685,807
Issue date
Jun 16, 2020
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Adjustable extended electrode for edge uniformity control
Patent number
10,553,404
Issue date
Feb 4, 2020
Applied Materials, Inc.
Olivier Luere
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of controlling ion energy distribution using a pulse generat...
Patent number
10,555,412
Issue date
Feb 4, 2020
Applied Materials, Inc.
Leonid Dorf
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Adjustable extended electrode for edge uniformity control
Patent number
10,504,702
Issue date
Dec 10, 2019
Applied Materials, Inc.
Olivier Luere
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ion-ion plasma atomic layer etch process and reactor
Patent number
10,475,626
Issue date
Nov 12, 2019
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of controlling ion energy distribution using a pulse generat...
Patent number
10,448,495
Issue date
Oct 15, 2019
Applied Materials, Inc.
Leonid Dorf
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Patents Applications
last 30 patents
Information
Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
Publication number
20240395502
Publication date
Nov 28, 2024
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
Publication number
20240194446
Publication date
Jun 13, 2024
Applied Materials, Inc.
Linying CUI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
Publication number
20240030002
Publication date
Jan 25, 2024
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Creating Ion Energy Distribution Functions (IEDF)
Publication number
20230352264
Publication date
Nov 2, 2023
Applied Materials, Inc.
LEONID DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
Publication number
20230326717
Publication date
Oct 12, 2023
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION
Publication number
20230280150
Publication date
Sep 7, 2023
Applied Materials, Inc.
Sathyendra GHANTASALA
G01 - MEASURING TESTING
Information
Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
Publication number
20230197406
Publication date
Jun 22, 2023
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
Publication number
20230030927
Publication date
Feb 2, 2023
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
AUTOMATIC ELECTROSTATIC CHUCK BIAS COMPENSATION DURING PLASMA PROCE...
Publication number
20220367157
Publication date
Nov 17, 2022
Applied Materials, Inc.
Linying CUI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
AUTOMATIC ELECTROSTATIC CHUCK BIAS COMPENSATION DURING PLASMA PROCE...
Publication number
20220367158
Publication date
Nov 17, 2022
Applied Materials, Inc.
Linying CUI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM
Publication number
20220037120
Publication date
Feb 3, 2022
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
Publication number
20220037119
Publication date
Feb 3, 2022
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER
Publication number
20220037121
Publication date
Feb 3, 2022
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
Publication number
20210343496
Publication date
Nov 4, 2021
Applied Materials, Inc.
LEONID DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
Publication number
20210313147
Publication date
Oct 7, 2021
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION
Publication number
20210254957
Publication date
Aug 19, 2021
Applied Materials, Inc.
Sathyendra GHANTASALA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
Publication number
20210193438
Publication date
Jun 24, 2021
Applied Materials, Inc.
Leonid DORF
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
Publication number
20210134561
Publication date
May 6, 2021
Applied Materials, Inc.
TRAVIS KOH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR
Publication number
20200352017
Publication date
Nov 5, 2020
Applied Materials, Inc.
Leonid DORF
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
Publication number
20200266022
Publication date
Aug 20, 2020
Applied Materials, Inc.
LEONID DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH VOLTAGE FILTER ASSEMBLY
Publication number
20200243303
Publication date
Jul 30, 2020
Applied Materials, Inc.
Anurag Kumar MISHRA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD OF GENERATING A PULSED WAVEFORM
Publication number
20200234922
Publication date
Jul 23, 2020
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD OF FORMING PLASMA USING A PULSED WAVEFORM
Publication number
20200234923
Publication date
Jul 23, 2020
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Feedback loop for controlling a pulsed voltage waveform
Publication number
20200234921
Publication date
Jul 23, 2020
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
AUTOMATIC ESC BIAS COMPENSATION WHEN USING PULSED DC BIAS
Publication number
20200161155
Publication date
May 21, 2020
Applied Materials, Inc.
James ROGERS
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
Publication number
20200154556
Publication date
May 14, 2020
Applied Materials, Inc.
Leonid DORF
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
Publication number
20200118798
Publication date
Apr 16, 2020
Applied Materials, Inc.
Olivier LUERE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS
Publication number
20200035454
Publication date
Jan 30, 2020
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
Publication number
20190348258
Publication date
Nov 14, 2019
Applied Materials, Inc.
TRAVIS KOH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
Publication number
20190350072
Publication date
Nov 14, 2019
Applied Materials, Inc.
Leonid DORF
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...