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Makoto Hanabata
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Takatsuki, JP
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last 30 patents
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Patent Grant
Radiation-sensitive positive resist composition comprising a 1,2-qu...
Patent number
5,861,229
Issue date
Jan 19, 1999
Sumitomo Chemical Company, Limited
Haruyoshi Osaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive positive resist composition
Patent number
5,456,995
Issue date
Oct 10, 1995
Sumitomo Chemical Company, Limited
Haruyoshi Ozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive positive resist composition
Patent number
5,456,996
Issue date
Oct 10, 1995
Sumitomo Chemical Company, Limited
Haruyoshi Ozaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition comprising a quinone diazide sulfonic diester an...
Patent number
5,378,586
Issue date
Jan 3, 1995
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, novel phenol compound and quinone diazide sulfo...
Patent number
5,290,656
Issue date
Mar 1, 1994
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist composition containing alkali-soluble resin an...
Patent number
5,124,228
Issue date
Jun 23, 1992
Sumitomo Chemical Co., Ltd.
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition containing quinone diazide sulfonic aci...
Patent number
5,059,507
Issue date
Oct 22, 1991
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive type high gamma-value photoresist composition with novolak...
Patent number
4,863,829
Issue date
Sep 5, 1989
Sumitomo Chemical Company, Limited
Akihiro Furuta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Novolak resin for positive photoresist
Patent number
4,812,551
Issue date
Mar 14, 1989
Sumitomo Chemical Company, Limited
Fumio Oi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive photoresist composition with m-hydroxy-.alpha.-methylstyre...
Patent number
4,696,886
Issue date
Sep 29, 1987
Sumitomo Chemical Company, Limited
Makoto Hanabata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Plastic container improved in barrier properties against gases and...
Patent number
4,414,230
Issue date
Nov 8, 1983
Sumitomo Chemical Company, Limited
Makoto Hanabata
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Process for producing an aromatic polyester composition
Patent number
4,414,365
Issue date
Nov 8, 1983
Sumitomo Chemical Company, Limited
Hiroaki Sugimoto
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Process for producing aromatic polyester
Patent number
4,349,659
Issue date
Sep 14, 1982
Sumitomo Chemical Company, Limited
Yasuyuki Kato
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...