Mario Garza

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process window compliant corrections of design layout
- Patent number 7,313,508
- Issue date Dec 25, 2007
- LSI Corporation
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
OPC based illumination optimization with mask error constraints
- Patent number 7,264,906
- Issue date Sep 4, 2007
- LSI Corporation
- Ebo H. Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect analysis for both horizontal and vertical processing ef...
- Patent number 7,149,340
- Issue date Dec 12, 2006
- LSI Logic Corporation
- Paul Filseth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method using weighted priorities
- Patent number 7,069,535
- Issue date Jun 27, 2006
- LSI Logic Corporation
- Olga A. Kobozeva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automatic calibration of a masking process simulator
- Patent number 6,868,355
- Issue date Mar 15, 2005
- LSI Logic Corporation
- Lav Ivanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer process critical dimension, alignment, and registration analy...
- Patent number 6,782,525
- Issue date Aug 24, 2004
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic calibration of a masking process simulator
- Patent number 6,768,958
- Issue date Jul 27, 2004
- LSI Logic Corporation
- Lav Ivanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical and etch proximity correction
- Patent number 6,701,511
- Issue date Mar 2, 2004
- LSI Logic Corporation
- Paul G. Filseth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask correction optimization
- Patent number 6,611,953
- Issue date Aug 26, 2003
- LSI Logic Corporation
- Paul G. Filseth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for application of proximity correction with r...
- Patent number 6,532,585
- Issue date Mar 11, 2003
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for application of proximity correction with u...
- Patent number 6,499,003
- Issue date Dec 24, 2002
- LSI Logic Corporation
- Edwin Jones
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis pupil aperture and method for making the same
- Patent number 6,426,131
- Issue date Jul 30, 2002
- LSI Logic Corporation
- Philip Eric Jackson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 6,282,696
- Issue date Aug 28, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method and apparatus
- Patent number 6,269,472
- Issue date Jul 31, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for general systematic application of proximit...
- Patent number 6,175,953
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Ranko Scepanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of proximity correction with relative segmentation
- Patent number 6,174,630
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Comparing aerial image to actual photoresist pattern for masking pr...
- Patent number 6,081,659
- Issue date Jun 27, 2000
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Comparing aerial image to SEM of photoresist or substrate pattern f...
- Patent number 6,078,738
- Issue date Jun 20, 2000
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle and method of design to correct pattern for depth of focus...
- Patent number 5,972,541
- Issue date Oct 26, 1999
- LSI Logic Corporation
- Emery O. Sugasawara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,900,338
- Issue date May 4, 1999
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask inspection method and inspection tape therefor
- Patent number 5,804,340
- Issue date Sep 8, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guard rings to compensate for side lobe ringing in attenuated phase...
- Patent number 5,795,682
- Issue date Aug 18, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method and apparatus
- Patent number 5,723,233
- Issue date Mar 3, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,705,301
- Issue date Jan 6, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selecting and applying a top antireflective coating of a...
- Patent number 5,595,861
- Issue date Jan 21, 1997
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming photoresist film exhibiting uniform reflectivity...
- Patent number 5,587,267
- Issue date Dec 24, 1996
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for uniformizing photoresist thickness and critical dime...
- Patent number 5,554,486
- Issue date Sep 10, 1996
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of curing hydrogen silsesquioxane coating to form silicon o...
- Patent number 5,549,934
- Issue date Aug 27, 1996
- LSI Logic Corporation
- Mario Garza
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist solution capable of being applied as an aerosol contain...
- Patent number 5,543,265
- Issue date Aug 6, 1996
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of curing hydrogen silsesquioxane coating to form silicon o...
- Patent number 5,456,952
- Issue date Oct 10, 1995
- LSI Logic Corporation
- Mario Garza
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
OPC based illumination optimization with mask error constraints
- Publication number 20050196681
- Publication date Sep 8, 2005
- Ebo H. Croffle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction method using weighted priorities
- Publication number 20040250232
- Publication date Dec 9, 2004
- Olga A. Kobozeva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Automatic calibration of a masking process simulator
- Publication number 20040199349
- Publication date Oct 7, 2004
- Lav Ivanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process window compliant corrections of design layout
- Publication number 20040128118
- Publication date Jul 1, 2004
- Ebo Croffie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask defect analysis for both horizontal and vertical processing ef...
- Publication number 20040057610
- Publication date Mar 25, 2004
- Paul Filseth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Wafer process critical dimension, alignment, and registration analy...
- Publication number 20040049760
- Publication date Mar 11, 2004
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...
- Publication number 20020004714
- Publication date Jan 10, 2002
- EDWIN JONES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mario Garza

Person

Patents Grantslast 30 patents

Process window compliant corrections of design layout

OPC based illumination optimization with mask error constraints

Mask defect analysis for both horizontal and vertical processing ef...

Optical proximity correction method using weighted priorities

Automatic calibration of a masking process simulator

Wafer process critical dimension, alignment, and registration analy...

Automatic calibration of a masking process simulator

Optical and etch proximity correction

Mask correction optimization

Method and apparatus for application of proximity correction with r...

Method and apparatus for application of proximity correction with u...

Off-axis pupil aperture and method for making the same

Performing optical proximity correction with the aid of design rule...

Optical proximity correction method and apparatus

Method and apparatus for general systematic application of proximit...

Method of proximity correction with relative segmentation

Comparing aerial image to actual photoresist pattern for masking pr...

Comparing aerial image to SEM of photoresist or substrate pattern f...

Reticle and method of design to correct pattern for depth of focus...

Performing optical proximity correction with the aid of design rule...

Photomask inspection method and inspection tape therefor

Guard rings to compensate for side lobe ringing in attenuated phase...

Optical proximity correction method and apparatus

Performing optical proximity correction with the aid of design rule...

Method of selecting and applying a top antireflective coating of a...

Method of forming photoresist film exhibiting uniform reflectivity...

Techniques for uniformizing photoresist thickness and critical dime...

Process of curing hydrogen silsesquioxane coating to form silicon o...

Photoresist solution capable of being applied as an aerosol contain...

Process of curing hydrogen silsesquioxane coating to form silicon o...

Patents Applicationslast 30 patents

OPC based illumination optimization with mask error constraints

Optical proximity correction method using weighted priorities

Automatic calibration of a masking process simulator

Process window compliant corrections of design layout

Mask defect analysis for both horizontal and vertical processing ef...

Wafer process critical dimension, alignment, and registration analy...

METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...