Mark E. Jost

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of forming semiconductor structures
- Patent number 7,955,976
- Issue date Jun 7, 2011
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structures with interlayer dielectric
- Patent number 7,659,630
- Issue date Feb 9, 2010
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching process to form a conductive layer within an opening wi...
- Patent number 7,326,647
- Issue date Feb 5, 2008
- Micron Technology, Inc.
- Alex J. Schrinksy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming interconnect structure with interlayer dielectric
- Patent number 7,279,414
- Issue date Oct 9, 2007
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching a contact opening over a node location on a semi...
- Patent number 6,982,228
- Issue date Jan 3, 2006
- Micron Technology, Inc.
- Mark E. Jost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching a contact opening
- Patent number 6,828,252
- Issue date Dec 7, 2004
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making an electrical device including an interconnect str...
- Patent number 6,790,762
- Issue date Sep 14, 2004
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilization of disappearing silicon hard mask for fabrication of se...
- Patent number 6,787,472
- Issue date Sep 7, 2004
- Micron Technology, Inc.
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for utilization of disappearing silicon hard mask for fabri...
- Patent number 6,689,693
- Issue date Feb 10, 2004
- Micron Technology, Inc.
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming protective segments of material, and etch stops
- Patent number 6,653,241
- Issue date Nov 25, 2003
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming protective segments of material, and etch stops
- Patent number 6,620,734
- Issue date Sep 16, 2003
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer, wafer alignment patterns and method of forming...
- Patent number 6,605,516
- Issue date Aug 12, 2003
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition methods
- Patent number 6,596,641
- Issue date Jul 22, 2003
- Micron Technology, Inc.
- Mark E. Jost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Utilization of disappearing silicon hard mask for fabrication of se...
- Patent number 6,534,408
- Issue date Mar 18, 2003
- Micron Technology, Inc.
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilization of disappearing silicon hard mask for fabrication of se...
- Patent number 6,461,963
- Issue date Oct 8, 2002
- Micron Technology, Inc.
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced capacitor shape
- Patent number 6,418,008
- Issue date Jul 9, 2002
- Micron Technology, Inc.
- Mark Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced capacitor shape
- Patent number 6,391,709
- Issue date May 21, 2002
- Micron Technology, Inc.
- Mark Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced capacitor shape
- Patent number 6,369,432
- Issue date Apr 9, 2002
- Micron Technology, Inc.
- Mark Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing surface defects or other recesses during the for...
- Patent number 6,355,566
- Issue date Mar 12, 2002
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing surface defects or other recesses during the for...
- Patent number 6,228,772
- Issue date May 8, 2001
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer,wafer alignment patterns and method of forming...
- Patent number 6,207,529
- Issue date Mar 27, 2001
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing method of making electrical contact to a n...
- Patent number 6,153,527
- Issue date Nov 28, 2000
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment of an interconnect surface during formation of an...
- Patent number 6,150,257
- Issue date Nov 21, 2000
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer, wafer alignment patterns and method of forming...
- Patent number 6,137,186
- Issue date Oct 24, 2000
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods, and methods of forming capacitors
- Patent number 6,127,239
- Issue date Oct 3, 2000
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a bit line over capacitor array of memory cells a...
- Patent number 6,110,774
- Issue date Aug 29, 2000
- Micron Technology, Inc.
- Mark Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming wafer alignment patterns
- Patent number 6,046,094
- Issue date Apr 4, 2000
- Micron Technology, Inc.
- Mark E. Jost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing method of making electrical contact to a n...
- Patent number 6,037,261
- Issue date Mar 14, 2000
- Micron Technology, Inc.
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing surface defects or other recesses during the for...
- Patent number 6,025,271
- Issue date Feb 15, 2000
- Micron Technology, Inc.
- Bradley J. Howard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a capacitor
- Patent number 6,010,941
- Issue date Jan 4, 2000
- Micron Technology, Inc.
- Mark Fischer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES
- Publication number 20100087060
- Publication date Apr 8, 2010
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT STRUCTURES
- Publication number 20070278695
- Publication date Dec 6, 2007
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching process to form a conductive layer within an opening wi...
- Publication number 20070049038
- Publication date Mar 1, 2007
- Micron Technology, Inc.
- Alex J. Schrinksy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching a contact opening over a node location on a semi...
- Publication number 20060024973
- Publication date Feb 2, 2006
- Mark E. Jost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching a contact opening
- Publication number 20040198061
- Publication date Oct 7, 2004
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING PROTECTIVE SEQMENTS OF MATERIAL, AND ETCH STOPS
- Publication number 20030176070
- Publication date Sep 18, 2003
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING PROTECTIVE SEGMENTS OF MATERIAL, AND ETCH STOPS
- Publication number 20030176076
- Publication date Sep 18, 2003
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Utilization of disappearing silicon hard mask for fabrication of se...
- Publication number 20030143856
- Publication date Jul 31, 2003
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching a contact opening over a node location on a semi...
- Publication number 20030045111
- Publication date Mar 6, 2003
- Mark E. Jost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Utilization of disappearing silicon hard mask for fabrication of se...
- Publication number 20030036271
- Publication date Feb 20, 2003
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical vapor deposition methods and methods of etching a contact...
- Publication number 20020123221
- Publication date Sep 5, 2002
- Mark E. Jost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Utilization of disappearing silicon hard mask for fabrication of se...
- Publication number 20020102854
- Publication date Aug 1, 2002
- John H. Givens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced capacitor shape
- Publication number 20020048141
- Publication date Apr 25, 2002
- Mark Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer, wafer alignment patterns and method of forming...
- Publication number 20010007786
- Publication date Jul 12, 2001
- Mark E. Jost
- H01 - BASIC ELECTRIC ELEMENTS

Mark E. Jost

Person

Patents Grantslast 30 patents

Methods of forming semiconductor structures

Interconnect structures with interlayer dielectric

Dry etching process to form a conductive layer within an opening wi...

Method of forming interconnect structure with interlayer dielectric

Methods of etching a contact opening over a node location on a semi...

Method of etching a contact opening

Method of making an electrical device including an interconnect str...

Utilization of disappearing silicon hard mask for fabrication of se...

Methods for utilization of disappearing silicon hard mask for fabri...

Methods of forming protective segments of material, and etch stops

Methods of forming protective segments of material, and etch stops

Semiconductor wafer, wafer alignment patterns and method of forming...

Chemical vapor deposition methods

Utilization of disappearing silicon hard mask for fabrication of se...

Utilization of disappearing silicon hard mask for fabrication of se...

Enhanced capacitor shape

Enhanced capacitor shape

Enhanced capacitor shape

Method of removing surface defects or other recesses during the for...

Method of removing surface defects or other recesses during the for...

Semiconductor wafer,wafer alignment patterns and method of forming...

Semiconductor processing method of making electrical contact to a n...

Plasma treatment of an interconnect surface during formation of an...

Semiconductor wafer, wafer alignment patterns and method of forming...

Semiconductor processing methods, and methods of forming capacitors

Method of forming a bit line over capacitor array of memory cells a...

Method of forming wafer alignment patterns

Semiconductor processing method of making electrical contact to a n...

Method of removing surface defects or other recesses during the for...

Method of forming a capacitor

Patents Applicationslast 30 patents

METHODS OF FORMING SEMICONDUCTOR STRUCTURES

INTERCONNECT STRUCTURES

Dry etching process to form a conductive layer within an opening wi...

Methods of etching a contact opening over a node location on a semi...

Method of etching a contact opening

METHODS OF FORMING PROTECTIVE SEQMENTS OF MATERIAL, AND ETCH STOPS

METHODS OF FORMING PROTECTIVE SEGMENTS OF MATERIAL, AND ETCH STOPS

Utilization of disappearing silicon hard mask for fabrication of se...

Methods of etching a contact opening over a node location on a semi...

Utilization of disappearing silicon hard mask for fabrication of se...

Chemical vapor deposition methods and methods of etching a contact...

Utilization of disappearing silicon hard mask for fabrication of se...

Enhanced capacitor shape

Semiconductor wafer, wafer alignment patterns and method of forming...