Michael Ravkin

Person

Sunnyvalle, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for processing wafer-shaped articles
- Patent number 10,861,719
- Issue date Dec 8, 2020
- Lam Research AG
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing wafer-shaped articles
- Patent number 10,720,343
- Issue date Jul 21, 2020
- Lam Research AG
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing wafer-shaped articles
- Patent number 10,679,871
- Issue date Jun 9, 2020
- Lam Research AG
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing wafer-shaped articles
- Patent number 10,446,416
- Issue date Oct 15, 2019
- Lam Research AG
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prevention of particle adders when contacting a liquid meniscus ove...
- Patent number 8,997,684
- Issue date Apr 7, 2015
- Lam Research Corporation
- Enrico Magni
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Material for cleaning a substrate
- Patent number 8,716,210
- Issue date May 6, 2014
- Lam Research Corporation
- Erik M. Freer
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for removing material from semiconductor wafer and apparatus...
- Patent number 8,691,027
- Issue date Apr 8, 2014
- Lam Research Corporation
- Mikhail Korolik
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a substrate using non-newtonian f...
- Patent number 8,671,959
- Issue date Mar 18, 2014
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Reduction of entrance and exit marks left by a substrate-processing...
- Patent number 8,623,152
- Issue date Jan 7, 2014
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for removing contamination from a substrate and for making a...
- Patent number 8,608,859
- Issue date Dec 17, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning contaminants from substrate
- Patent number 8,590,550
- Issue date Nov 26, 2013
- Lam Research Corporation
- Mikhail Korolik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for cleaning a semiconductor substrate
- Patent number 8,591,662
- Issue date Nov 26, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for removing contamination from substrate
- Patent number 8,555,903
- Issue date Oct 15, 2013
- Lam Research Corporation
- Erik M. Freer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and apparatus for cleaning semiconductor wafers using compre...
- Patent number 8,535,451
- Issue date Sep 17, 2013
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Carrier for reducing entrance and/or exit marks left by a substrate...
- Patent number 8,534,303
- Issue date Sep 17, 2013
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a semiconductor substrate
- Patent number 8,522,801
- Issue date Sep 3, 2013
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and system for cleaning a substrate
- Patent number 8,522,799
- Issue date Sep 3, 2013
- Lam Research Corporation
- Erik M. Freer
- B08 - CLEANING
Information Patent Grant
Method and apparatus for particle removal
- Patent number 8,480,810
- Issue date Jul 9, 2013
- Lam Research Corporation
- Erik M. Freer
- B08 - CLEANING
Information Patent Grant
Substrate preparation using stabilized fluid solutions and methods...
- Patent number 8,475,599
- Issue date Jul 2, 2013
- Lam Research Corporation
- Erik M. Freer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate cleaning technique employing multi-phase solution
- Patent number 8,388,762
- Issue date Mar 5, 2013
- Lam Research Corporation
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing material from semiconductor wafer and apparatus...
- Patent number 8,323,420
- Issue date Dec 4, 2012
- Lam Research Corporation
- Mikhail Korolik
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reduction of entrance and exit marks left by a substrate-processing...
- Patent number 8,317,932
- Issue date Nov 27, 2012
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a semiconductor substrate
- Patent number 8,316,866
- Issue date Nov 27, 2012
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing a substrate using a single phase proximity he...
- Patent number 8,313,580
- Issue date Nov 20, 2012
- Lam Research Corporation
- Mike Ravkin
- B08 - CLEANING
Information Patent Grant
Two-phase substrate cleaning material
- Patent number 8,242,067
- Issue date Aug 14, 2012
- Lam Research Corporation
- Mikhail Korolik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Proximity substrate preparation sequence, and method, apparatus, an...
- Patent number 8,236,382
- Issue date Aug 7, 2012
- Lam Research Corporation
- Michael Ravkin
- B08 - CLEANING
Information Patent Grant
Cleaning compound and method and system for using the cleaning comp...
- Patent number 8,137,474
- Issue date Mar 20, 2012
- Lam Research Corporation
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carrier for reducing entrance and/or exit marks left by a substrate...
- Patent number 8,105,441
- Issue date Jan 31, 2012
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a substrate using non-Newtonian f...
- Patent number 8,043,441
- Issue date Oct 25, 2011
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Substrate proximity drying using in-situ local heating of substrate
- Patent number 8,011,116
- Issue date Sep 6, 2011
- Lam Research Corporation
- Katrina Mikhaylichenko
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
VAPOR CLEANING OF SUBSTRATE SURFACES
- Publication number 20220356585
- Publication date Nov 10, 2022
- LAM RESEARCH CORPORATION
- David MUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES
- Publication number 20200227284
- Publication date Jul 16, 2020
- LAM RESEARCH AG
- David MUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES
- Publication number 20180047593
- Publication date Feb 15, 2018
- LAM RESEARCH AG
- David MUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES
- Publication number 20170345681
- Publication date Nov 30, 2017
- LAM RESEARCH AG
- David MUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Systems for Cleaning A Substrate
- Publication number 20150040947
- Publication date Feb 12, 2015
- LAM RESEARCH CORPORATION
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Cleaning A Semiconductor Substrate
- Publication number 20150040941
- Publication date Feb 12, 2015
- LAM RESEARCH CORPORATION
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controls of Ambient Environment During Wafer Drying Using Proximity...
- Publication number 20140332037
- Publication date Nov 13, 2014
- LAM RESEARCH CORPORATION
- Mikhail Korolik
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20140158167
- Publication date Jun 12, 2014
- LAM RESEARCH CORPORATION
- John M. de Larios
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Apparatus for Cleaning a Semiconductor Substrate
- Publication number 20140059789
- Publication date Mar 6, 2014
- LAM RESEARCH CORPORATION
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Cleaning System Using Stabilized Fluid Solutions
- Publication number 20130284217
- Publication date Oct 31, 2013
- Erik M. Freer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE CLEANING TECHNIQUE EMPLOYING MULTI-PHASE SOLUTION
- Publication number 20130206182
- Publication date Aug 15, 2013
- Erik M. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTION OF PARTICLE ADDERS WHEN CONTACTING A LIQUID MENISCUS OVE...
- Publication number 20130084392
- Publication date Apr 4, 2013
- Lam Research Corp.
- Enrico Magni
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR REMOVING MATERIAL FROM SEMICONDUCTOR WAFER AND APPARATUS...
- Publication number 20130061887
- Publication date Mar 14, 2013
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...
- Publication number 20130061879
- Publication date Mar 14, 2013
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Cleaning a Semiconductor Substrate
- Publication number 20130048021
- Publication date Feb 28, 2013
- Erik M. Freer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Reducing Substrate Pattern Collapse During...
- Publication number 20120260517
- Publication date Oct 18, 2012
- LAM RESEARCH CORPORATION
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning Compound and Method and System for Using the Cleaning Comp...
- Publication number 20120145202
- Publication date Jun 14, 2012
- LAM RESEARCH CORPORATION
- Erik M. Freer
- B08 - CLEANING
Information Patent Application
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...
- Publication number 20120079698
- Publication date Apr 5, 2012
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20120017950
- Publication date Jan 26, 2012
- LAM RESEARCH CORPORATION
- John M. de Larios
- B08 - CLEANING
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE USING A SINGLE PHASE PROXIMITY HE...
- Publication number 20110265823
- Publication date Nov 3, 2011
- Mike Ravkin
- B08 - CLEANING
Information Patent Application
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...
- Publication number 20110197928
- Publication date Aug 18, 2011
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DEPOSITING AND PLANARIZING THIN FILMS OF S...
- Publication number 20110155563
- Publication date Jun 30, 2011
- Lam Research Corp.
- Mike Ravkin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MATERIAL FOR CLEANING A SUBSTRATE
- Publication number 20110065621
- Publication date Mar 17, 2011
- Erik M. Freer
- B08 - CLEANING
Information Patent Application
Apparatus for Contained Chemical Surface Treatment
- Publication number 20110061687
- Publication date Mar 17, 2011
- LAM RESEARCH CORPORATION
- Katrina Mikhaylichenko
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Two-Phase Substrate Cleaning Material
- Publication number 20100317556
- Publication date Dec 16, 2010
- LAM RESEARCH CORPORATION
- Mikhail Korolik
- B08 - CLEANING
Information Patent Application
Apparatus for Cleaning Contaminants from Substrate
- Publication number 20100313918
- Publication date Dec 16, 2010
- LAM RESEARCH CORPORATION
- Mikhail Korolik
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROXIMITY DRYING USING IN-SITU LOCAL HEATING OF SUBSTRATE
- Publication number 20100313443
- Publication date Dec 16, 2010
- Katrina Mikhaylichenko
- B08 - CLEANING
Information Patent Application
Method for Removing Contamination from a Substrate and for Making a...
- Publication number 20100206340
- Publication date Aug 19, 2010
- Erik M. Freer
- B08 - CLEANING
Information Patent Application
Reduction of Entrance and Exit Marks Left by a Substrate-Processing...
- Publication number 20100170539
- Publication date Jul 8, 2010
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning Compound and Method and System for Using the Cleaning Comp...
- Publication number 20100139694
- Publication date Jun 10, 2010
- Erik M. Freer
- B08 - CLEANING

Michael Ravkin

Person

Patents Grantslast 30 patents

Method and apparatus for processing wafer-shaped articles

Method and apparatus for processing wafer-shaped articles

Method and apparatus for processing wafer-shaped articles

Method and apparatus for processing wafer-shaped articles

Prevention of particle adders when contacting a liquid meniscus ove...

Material for cleaning a substrate

Method for removing material from semiconductor wafer and apparatus...

Method and apparatus for cleaning a substrate using non-newtonian f...

Reduction of entrance and exit marks left by a substrate-processing...

Method for removing contamination from a substrate and for making a...

Apparatus for cleaning contaminants from substrate

Methods for cleaning a semiconductor substrate

Method and apparatus for removing contamination from substrate

Method and apparatus for cleaning semiconductor wafers using compre...

Carrier for reducing entrance and/or exit marks left by a substrate...

Method and apparatus for cleaning a semiconductor substrate

Apparatus and system for cleaning a substrate

Method and apparatus for particle removal

Substrate preparation using stabilized fluid solutions and methods...

Substrate cleaning technique employing multi-phase solution

Method for removing material from semiconductor wafer and apparatus...

Reduction of entrance and exit marks left by a substrate-processing...

Method and apparatus for cleaning a semiconductor substrate

Method for processing a substrate using a single phase proximity he...

Two-phase substrate cleaning material

Proximity substrate preparation sequence, and method, apparatus, an...

Cleaning compound and method and system for using the cleaning comp...

Carrier for reducing entrance and/or exit marks left by a substrate...

Method and apparatus for cleaning a substrate using non-Newtonian f...

Substrate proximity drying using in-situ local heating of substrate

Patents Applicationslast 30 patents

VAPOR CLEANING OF SUBSTRATE SURFACES

METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES

METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES

METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES

Method and Systems for Cleaning A Substrate

Method and Apparatus for Cleaning A Semiconductor Substrate

Controls of Ambient Environment During Wafer Drying Using Proximity...

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...

Apparatus for Cleaning a Semiconductor Substrate

Substrate Cleaning System Using Stabilized Fluid Solutions

SUBSTRATE CLEANING TECHNIQUE EMPLOYING MULTI-PHASE SOLUTION

PREVENTION OF PARTICLE ADDERS WHEN CONTACTING A LIQUID MENISCUS OVE...

METHOD FOR REMOVING MATERIAL FROM SEMICONDUCTOR WAFER AND APPARATUS...

REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...

Apparatus for Cleaning a Semiconductor Substrate

Apparatus and Method for Reducing Substrate Pattern Collapse During...

Cleaning Compound and Method and System for Using the Cleaning Comp...

Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...

METHOD FOR PROCESSING A SUBSTRATE USING A SINGLE PHASE PROXIMITY HE...

Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...

APPARATUS AND METHOD FOR DEPOSITING AND PLANARIZING THIN FILMS OF S...

MATERIAL FOR CLEANING A SUBSTRATE

Apparatus for Contained Chemical Surface Treatment

Two-Phase Substrate Cleaning Material

Apparatus for Cleaning Contaminants from Substrate

SUBSTRATE PROXIMITY DRYING USING IN-SITU LOCAL HEATING OF SUBSTRATE

Method for Removing Contamination from a Substrate and for Making a...

Reduction of Entrance and Exit Marks Left by a Substrate-Processing...

Cleaning Compound and Method and System for Using the Cleaning Comp...