Membership
Tour
Register
Log in
Mutsuo Nakashima
Follow
Person
Niigata-ken, JP
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Patterning process
Patent number
8,198,016
Issue date
Jun 12, 2012
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Silsesquioxane compound mixture, hydrolyzable silane compound, maki...
Patent number
8,153,836
Issue date
Apr 10, 2012
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Double patterning process
Patent number
8,129,100
Issue date
Mar 6, 2012
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Metal oxide-containing film-forming composition, metal oxide-contai...
Patent number
8,026,038
Issue date
Sep 27, 2011
Shin-Etsu Chemical Co., Ltd.
Tsutomu Ogihara
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist composition and patterning process using the same
Patent number
7,745,094
Issue date
Jun 29, 2010
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist material and pattern formation method using the same
Patent number
7,651,829
Issue date
Jan 26, 2010
Shin-Etsu Chemical Co., Ltd.
Yoshitaka Hamada
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Fluorinated cyclic structure-bearing silicon compounds and silicone...
Patent number
7,638,256
Issue date
Dec 29, 2009
Shin-Etsu Chemical Co., Ltd.
Takeshi Kinsho
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
7,550,247
Issue date
Jun 23, 2009
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Fluorine-containing silicon compounds, silicone resins, resist comp...
Patent number
7,485,408
Issue date
Feb 3, 2009
Shin-Etsu Chemical Co., Ltd.
Takeshi Kinsho
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Silsesquioxane compound mixture, method of making, resist compositi...
Patent number
7,265,234
Issue date
Sep 4, 2007
Shin-Etsu Chemical Co., Ltd.
Yoshitaka Hamada
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Acetal compound, polymer, resist composition and patterning process
Patent number
6,962,767
Issue date
Nov 8, 2005
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,835,525
Issue date
Dec 28, 2004
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ether, polymer, resist composition and patterning process
Patent number
6,784,268
Issue date
Aug 31, 2004
Shin-Etsu Chemical Co., Ltd.
Seiichiro Tachibana
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,780,563
Issue date
Aug 24, 2004
Shin-Etsu Chemical Co., Ltd.
Koji Hasegawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Cyclic acetal compound, polymer, resist composition and patterning...
Patent number
6,743,566
Issue date
Jun 1, 2004
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
High molecular weight silicone compounds, resist compositions, and...
Patent number
6,730,453
Issue date
May 4, 2004
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymers, resist materials, and pattern formation method
Patent number
6,677,101
Issue date
Jan 13, 2004
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,673,515
Issue date
Jan 6, 2004
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,670,094
Issue date
Dec 30, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Ester compounds, polymers, resist compositions and patterning process
Patent number
6,670,498
Issue date
Dec 30, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,660,448
Issue date
Dec 9, 2003
Shin-Etsu Chemical Co., Ltd.
Seiichiro Tachibana
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ether, polymer, resist composition and patterning process
Patent number
6,624,335
Issue date
Sep 23, 2003
Shin-Etsu Chemical Co., Ltd.
Seiichiro Tachibana
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,605,678
Issue date
Aug 12, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ester compounds, polymers, resist compositions and patterning process
Patent number
6,596,463
Issue date
Jul 22, 2003
Shin-Etsu Chemical, Co., Ltd.
Koji Hasegawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ester compounds, polymers, resist compositions and patterning process
Patent number
6,586,157
Issue date
Jul 1, 2003
Shin-Etsu Chemical Co., Ltd.
Koji Hasegawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymers, resist compositions and patterning process
Patent number
6,566,038
Issue date
May 20, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ester compounds, polymers, resist compositions and patterning process
Patent number
6,531,627
Issue date
Mar 11, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Cyclic acetal compound, polymer, resist composition and patterning...
Patent number
6,515,150
Issue date
Feb 4, 2003
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Acetal compound, polymer, resist composition and patterning response
Patent number
6,515,149
Issue date
Feb 4, 2003
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, resist composition and patterning process
Patent number
6,512,067
Issue date
Jan 28, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
Patterning process
Publication number
20090286188
Publication date
Nov 19, 2009
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DOUBLE PATTERNING PROCESS
Publication number
20090253084
Publication date
Oct 8, 2009
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAI...
Publication number
20090136869
Publication date
May 28, 2009
Tsutomu OGIHARA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKI...
Publication number
20080311514
Publication date
Dec 18, 2008
Shin-Etsu Chemical Co., Ltd.
Mutsuo NAKASHIMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Silsesquioxane compound mixture, method of making, resist compositi...
Publication number
20080038664
Publication date
Feb 14, 2008
Shin-Etsu Chemical Co. Ltd.
Yoshitaka Hamada
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Fluorine-containing silicon compounds, silicone resins, resist comp...
Publication number
20070218402
Publication date
Sep 20, 2007
Shin-Etsu Chemical Co., Ltd.
Takeshi Kinsho
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Resist composition and patterning process using the same
Publication number
20070190458
Publication date
Aug 16, 2007
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition and patterning process using the same
Publication number
20070190457
Publication date
Aug 16, 2007
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorinated cyclic structure-bearing silicon compounds and silicone...
Publication number
20070009832
Publication date
Jan 11, 2007
Shin-Etsu Chemical Co., Ltd.
Takeshi Kinsho
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Silsesquioxane compound mixture, method of making, resist compositi...
Publication number
20060224009
Publication date
Oct 5, 2006
Shin-Etsu Chemical Co., Ltd.
Yoshitaka Hamada
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Resist composition and patterning process
Publication number
20060040206
Publication date
Feb 23, 2006
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Radiation-sensitive polymer composition and pattern forming method...
Publication number
20050079443
Publication date
Apr 14, 2005
Shin-Etsu Chemical Co., Ltd.
Kazumi Noda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist material and pattern formation method using the same
Publication number
20040241579
Publication date
Dec 2, 2004
Shin-Etsu Chemical Co., Ltd.
Yoshitaka Hamada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Ether, polymer, resist composition and patterning process
Publication number
20040013973
Publication date
Jan 22, 2004
Shin-Etsu Chemical Co,. Ltd.
Seiichiro Tachibana
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Acetal compound, polymer, resist composition and patterning response
Publication number
20030153706
Publication date
Aug 14, 2003
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20030120009
Publication date
Jun 26, 2003
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Novel ester compounds, polymers, resist compositions and patterning...
Publication number
20030088115
Publication date
May 8, 2003
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Cyclic acetal compound, polymer, resist composition and patterning...
Publication number
20030045731
Publication date
Mar 6, 2003
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Ether, polymer, resist composition and patterning process
Publication number
20020161150
Publication date
Oct 31, 2002
Shin-Etsu Chemical Co., Ltd.
Seiichiro Tachibana
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020150835
Publication date
Oct 17, 2002
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Cyclic acetal compound, polymer, resist composition and patterning...
Publication number
20020147290
Publication date
Oct 10, 2002
Shin-Etsu Chemical Co., Ltd.
Mutsuo Nakashima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Acetal compound, polymer, resist composition and patterning response
Publication number
20020132970
Publication date
Sep 19, 2002
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymers, resist materials, and pattern formation method
Publication number
20020132182
Publication date
Sep 19, 2002
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020115807
Publication date
Aug 22, 2002
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACID-DECOMPOSABLE ESTER COMPOUND SUITABLE FOR USE IN RESIST MATERIAL
Publication number
20020115874
Publication date
Aug 22, 2002
Takeshi Kinsho
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020102493
Publication date
Aug 1, 2002
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020091215
Publication date
Jul 11, 2002
Shin-Etsu Chemical Co., Ltd.
Seiichiro Tachibana
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020061463
Publication date
May 23, 2002
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymer, resist composition and patterning process
Publication number
20020061465
Publication date
May 23, 2002
Shin-Etsu Chemical Co., Ltd.
Koji Hasegawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
High molecular weight silicone compounds, resist compositions, and...
Publication number
20020058205
Publication date
May 16, 2002
Mutsuo Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...