Information
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Patent Application
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20070218402
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Publication Number
20070218402
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Date Filed
March 05, 200717 years ago
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Date Published
September 20, 200716 years ago
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Inventors
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Original Assignees
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CPC
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US Classifications
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International Classifications
Abstract
Fluorine-containing silicon compounds having the general formula (1):
Claims
- 1. A fluorine-containing silicon compound having the general formula (1):
- 2. The fluorine-containing silicon compound of claim 1, wherein Y in formula (1) is a divalent alicyclic organic group.
- 3. A fluorine-containing silicon compound having the general formula (2):
- 4. A fluorinated silicone resin comprising recurring units having the general formula (1a) or (2a):
- 5. A resist composition comprising
(A) the silicone resin of claim 4,(B) a photoacid generator, and(C) an organic solvent.
- 6. A patterning process comprising the steps of:
applying the resist composition of claim 5 onto a substrate to form a resist layer,heat treating the resist layer and exposing it to high energy radiation having a wavelength of up to 300 nm or electron beam through a photomask, andoptionally heat treating the exposed resist layer, and developing it with a developer.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2006-069010 |
Mar 2006 |
JP |
national |