Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process

Abstract

Fluorine-containing silicon compounds having the general formula (1):

Description

Claims

1. A fluorine-containing silicon compound having the general formula (1):

2. The fluorine-containing silicon compound of claim 1, wherein Y in formula (1) is a divalent alicyclic organic group.

3. A fluorine-containing silicon compound having the general formula (2):

4. A fluorinated silicone resin comprising recurring units having the general formula (1a) or (2a):

5. A resist composition comprising (A) the silicone resin of claim 4,(B) a photoacid generator, and(C) an organic solvent.

6. A patterning process comprising the steps of: applying the resist composition of claim 5 onto a substrate to form a resist layer,heat treating the resist layer and exposing it to high energy radiation having a wavelength of up to 300 nm or electron beam through a photomask, andoptionally heat treating the exposed resist layer, and developing it with a developer.