Pai-Hung Pan

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for reoxidizing an oxide and for fabricating semiconductor...
- Patent number 8,790,982
- Issue date Jul 29, 2014
- Micron Technology, Inc.
- Li Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor devices structures including an isolation structure
- Patent number 8,637,956
- Issue date Jan 28, 2014
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures including an at least partially reoxidized oxide material
- Patent number 8,492,851
- Issue date Jul 23, 2013
- Micron Technology, Inc.
- Li Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for forming isolation structures for semiconductor devices
- Patent number 8,338,264
- Issue date Dec 25, 2012
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for forming shallow trench isolation structure without co...
- Patent number 7,892,941
- Issue date Feb 22, 2011
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-assisted oxidation methods and the resulting structures
- Patent number 7,371,697
- Issue date May 13, 2008
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions
- Patent number 7,170,139
- Issue date Jan 30, 2007
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatuses, and substrate assembly structures for fabrica...
- Patent number 7,132,035
- Issue date Nov 7, 2006
- Micron Technology, Inc.
- Karl M. Robinson
- B24 - GRINDING POLISHING
Information Patent Grant
Ion-assisted oxidation methods and the resulting structures
- Patent number 7,119,033
- Issue date Oct 10, 2006
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for elimination of pitting on silicon substrate during ga...
- Patent number 7,115,492
- Issue date Oct 3, 2006
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a gate stack
- Patent number 7,078,342
- Issue date Jul 18, 2006
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structures formed by ion-assisted oxidation
- Patent number 7,049,664
- Issue date May 23, 2006
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a gate stack that is void of silicon clusters wi...
- Patent number 7,041,548
- Issue date May 9, 2006
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intermediate structure having a silicon barrier layer encapsulating...
- Patent number 6,936,897
- Issue date Aug 30, 2005
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for trench isolation by selective deposition of low temperat...
- Patent number 6,888,212
- Issue date May 3, 2005
- Micron Technology, Inc.
- Ravi Iyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a conductive structure in a semiconductor device
- Patent number 6,849,544
- Issue date Feb 1, 2005
- Micron Technology, Inc.
- Ronald A. Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods of forming a conductive gate and line
- Patent number 6,844,252
- Issue date Jan 18, 2005
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-assisted oxidation methods and the resulting structures
- Patent number 6,770,538
- Issue date Aug 3, 2004
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods of forming contact openings, metho...
- Patent number 6,764,934
- Issue date Jul 20, 2004
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SEMICONDUCTOR PROCESSING METHODS OF FORMING CONTACT OPENINGS, METHO...
- Patent number 6,753,243
- Issue date Jun 22, 2004
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped silicon diffusion barrier region
- Patent number 6,744,108
- Issue date Jun 1, 2004
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a gate stack that is void of silicon clusters wi...
- Patent number 6,677,241
- Issue date Jan 13, 2004
- Micron Technology, Inc.
- Pai-Hung Pan
Information Patent Grant
Compositions for etching silicon with high selectivity to oxides an...
- Patent number 6,660,180
- Issue date Dec 9, 2003
- Micron Technology, Inc.
- Whonchee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatuses and substrate assembly structures for fabricat...
- Patent number 6,645,865
- Issue date Nov 11, 2003
- Micron Technology, Inc.
- Karl M. Robinson
- B24 - GRINDING POLISHING
Information Patent Grant
Technique for elimination of pitting on silicon substrate during ga...
- Patent number 6,613,673
- Issue date Sep 2, 2003
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatuses, and substrate assembly structures for fabrica...
- Patent number 6,613,675
- Issue date Sep 2, 2003
- Micron Technology, Inc.
- Karl M. Robinson
- B24 - GRINDING POLISHING
Information Patent Grant
Material removal method for forming a structure
- Patent number 6,599,840
- Issue date Jul 29, 2003
- Micron Technology, Inc.
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a conductive structure in a semiconductor device
- Patent number 6,596,595
- Issue date Jul 22, 2003
- Micron Technology, Inc.
- Ronald A. Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material removal method for forming a structure
- Patent number 6,596,642
- Issue date Jul 22, 2003
- Micron Technology, Inc.
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material removal method for forming a structure
- Patent number 6,596,648
- Issue date Jul 22, 2003
- Micron Technology, Inc.
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR REOXIDIZING AN OXIDE AND FOR FABRICATING SEMICONDUCTOR...
- Publication number 20130309855
- Publication date Nov 21, 2013
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES STRUCTURES INCLUDING AN ISOLATION STRUCTURE
- Publication number 20130001737
- Publication date Jan 3, 2013
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING ISOLATION STRUCTURES FOR SEMICONDUCTOR DEVICES
- Publication number 20110129985
- Publication date Jun 2, 2011
- Micron Technology, Inc.
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION-ASSISTED OXIDATION METHODS AND THE RESULTING STRUCTURES
- Publication number 20080203542
- Publication date Aug 28, 2008
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion-assisted oxidation methods and the resulting structures
- Publication number 20070059943
- Publication date Mar 15, 2007
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor constructions
- Publication number 20050111248
- Publication date May 26, 2005
- PAI HUNG PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion-assisted oxidation methods and the resulting structures
- Publication number 20040266213
- Publication date Dec 30, 2004
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for elimination of pitting on silicon substrate during ga...
- Publication number 20040023503
- Publication date Feb 5, 2004
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a conductive structure in a semiconductor device
- Publication number 20030207556
- Publication date Nov 6, 2003
- Ronald A. Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WELL-DRIVE ANNEAL TECHNIQUE USING PREPLACEMENT OF NITRIDE FILMS FOR...
- Publication number 20030134485
- Publication date Jul 17, 2003
- PAI-HUNG PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Processing methods of forming contact openings, metho...
- Publication number 20030054602
- Publication date Mar 20, 2003
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods, apparatuses and substrate assembly structures for fabricat...
- Publication number 20030054651
- Publication date Mar 20, 2003
- Karl M. Robinson
- B24 - GRINDING POLISHING
Information Patent Application
Method for trench isolation by selective deposition of low temperat...
- Publication number 20030027401
- Publication date Feb 6, 2003
- Ravi Iyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material removal method for forming a structure
- Publication number 20020187648
- Publication date Dec 12, 2002
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material removal method for forming a structure
- Publication number 20020182872
- Publication date Dec 5, 2002
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material removal method for forming a structure
- Publication number 20020182816
- Publication date Dec 5, 2002
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion-assisted oxidation methods and the resulting structures
- Publication number 20020175382
- Publication date Nov 28, 2002
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods of forming contact openings, metho...
- Publication number 20020151163
- Publication date Oct 17, 2002
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Buried bit line memory circuitry
- Publication number 20020090785
- Publication date Jul 11, 2002
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Passivation of sidewalls of a word line stack
- Publication number 20020063283
- Publication date May 30, 2002
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compositions for etching silicon with high selectivity to oxides an...
- Publication number 20020052121
- Publication date May 2, 2002
- Micron Technology, Inc.
- Whonchee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion-assisted oxidation methods and the resulting structures
- Publication number 20020048888
- Publication date Apr 25, 2002
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING METHODS OF FORMING A CONDUCTIVE GATE AND LINE
- Publication number 20020048920
- Publication date Apr 25, 2002
- PAI HUNG PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE HAVING A DOPED CONDUCTIVE LAYER
- Publication number 20020045342
- Publication date Apr 18, 2002
- YONGJUN HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods of forming contact openings, metho...
- Publication number 20020033490
- Publication date Mar 21, 2002
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for elimination of pitting on silicon substrate during ga...
- Publication number 20020004304
- Publication date Jan 10, 2002
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for forming shallow trench isolation structure without co...
- Publication number 20020003277
- Publication date Jan 10, 2002
- PAI HUNG PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material removal method for forming a structure
- Publication number 20020001960
- Publication date Jan 3, 2002
- Zhiqiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS FOR ETCHING SILICON WITH HIGH SELECTIVITY TO OXIDES AN...
- Publication number 20020001968
- Publication date Jan 3, 2002
- WHONCHEE LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods of forming contact openings, metho...
- Publication number 20010055860
- Publication date Dec 27, 2001
- Pai-Hung Pan
- H01 - BASIC ELECTRIC ELEMENTS

Pai-Hung Pan

Person

Patents Grantslast 30 patents

Methods for reoxidizing an oxide and for fabricating semiconductor...

Semiconductor devices structures including an isolation structure

Structures including an at least partially reoxidized oxide material

Methods for forming isolation structures for semiconductor devices

Technique for forming shallow trench isolation structure without co...

Ion-assisted oxidation methods and the resulting structures

Semiconductor constructions

Methods, apparatuses, and substrate assembly structures for fabrica...

Ion-assisted oxidation methods and the resulting structures

Technique for elimination of pitting on silicon substrate during ga...

Method of forming a gate stack

Semiconductor device structures formed by ion-assisted oxidation

Methods of forming a gate stack that is void of silicon clusters wi...

Intermediate structure having a silicon barrier layer encapsulating...

Method for trench isolation by selective deposition of low temperat...

Forming a conductive structure in a semiconductor device

Semiconductor processing methods of forming a conductive gate and line

Ion-assisted oxidation methods and the resulting structures

Semiconductor processing methods of forming contact openings, metho...

SEMICONDUCTOR PROCESSING METHODS OF FORMING CONTACT OPENINGS, METHO...

Doped silicon diffusion barrier region

Methods of forming a gate stack that is void of silicon clusters wi...

Compositions for etching silicon with high selectivity to oxides an...

Methods, apparatuses and substrate assembly structures for fabricat...

Technique for elimination of pitting on silicon substrate during ga...

Methods, apparatuses, and substrate assembly structures for fabrica...

Material removal method for forming a structure

Forming a conductive structure in a semiconductor device

Material removal method for forming a structure

Material removal method for forming a structure

Patents Applicationslast 30 patents

METHODS FOR REOXIDIZING AN OXIDE AND FOR FABRICATING SEMICONDUCTOR...

SEMICONDUCTOR DEVICES STRUCTURES INCLUDING AN ISOLATION STRUCTURE

METHODS FOR FORMING ISOLATION STRUCTURES FOR SEMICONDUCTOR DEVICES

ION-ASSISTED OXIDATION METHODS AND THE RESULTING STRUCTURES

Ion-assisted oxidation methods and the resulting structures

Semiconductor constructions

Ion-assisted oxidation methods and the resulting structures

Technique for elimination of pitting on silicon substrate during ga...

Forming a conductive structure in a semiconductor device

WELL-DRIVE ANNEAL TECHNIQUE USING PREPLACEMENT OF NITRIDE FILMS FOR...

Semiconductor Processing methods of forming contact openings, metho...

Methods, apparatuses and substrate assembly structures for fabricat...

Method for trench isolation by selective deposition of low temperat...

Material removal method for forming a structure

Material removal method for forming a structure

Material removal method for forming a structure

Ion-assisted oxidation methods and the resulting structures

Semiconductor processing methods of forming contact openings, metho...

Buried bit line memory circuitry

Passivation of sidewalls of a word line stack

Compositions for etching silicon with high selectivity to oxides an...

Ion-assisted oxidation methods and the resulting structures

SEMICONDUCTOR PROCESSING METHODS OF FORMING A CONDUCTIVE GATE AND LINE

SEMICONDUCTOR STRUCTURE HAVING A DOPED CONDUCTIVE LAYER

Semiconductor processing methods of forming contact openings, metho...

Technique for elimination of pitting on silicon substrate during ga...

Technique for forming shallow trench isolation structure without co...

Material removal method for forming a structure

COMPOSITIONS FOR ETCHING SILICON WITH HIGH SELECTIVITY TO OXIDES AN...

Semiconductor processing methods of forming contact openings, metho...