Paul A. Rabidoux

Person

Winooski, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Vertical dual gate field effect transistor
- Patent number 7,176,089
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective trimming of gate structures and apparatus form...
- Patent number 6,815,737
- Issue date Nov 9, 2004
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical dual gate field effect transistor
- Patent number 6,798,017
- Issue date Sep 28, 2004
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective trimming of gate structures and apparatus form...
- Patent number 6,759,315
- Issue date Jul 6, 2004
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assist features for contact hole mask patterns
- Patent number 6,627,361
- Issue date Sep 30, 2003
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Borderless gate structures
- Patent number 6,531,724
- Issue date Mar 11, 2003
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure for folded architecture pillar memory cell
- Patent number 6,440,801
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low “K” factor hybrid photoresist
- Patent number 6,440,635
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of a high density long channel DRAM gate with or withou...
- Patent number 6,426,175
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of T-gate fabrication using a hybrid resist
- Patent number 6,387,783
- Issue date May 14, 2002
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing an integrated circuit chip using frequency doub...
- Patent number 6,372,412
- Issue date Apr 16, 2002
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid resist based on photo acid/photo base blending
- Patent number 6,338,934
- Issue date Jan 15, 2002
- International Business Machines Corporation
- Kuang-Jung R. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid sensitive ARC and method of use
- Patent number 6,319,651
- Issue date Nov 20, 2001
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuit chip produced by using frequency doubling hybrid...
- Patent number 6,313,492
- Issue date Nov 6, 2001
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for self-alignment of sub-critical contacts to wiring
- Patent number 6,303,272
- Issue date Oct 16, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing an integrated circuit chip using low “k...
- Patent number 6,284,439
- Issue date Sep 4, 2001
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming features using frequency doubling hybrid resist...
- Patent number 6,277,543
- Issue date Aug 21, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming features using frequency doubling hybrid resist...
- Patent number 6,245,488
- Issue date Jun 12, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for fabricating short channel field effect transistor with...
- Patent number 6,221,704
- Issue date Apr 24, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist image reversal by means of spun-on-glass
- Patent number 6,221,562
- Issue date Apr 24, 2001
- International Business Machines Corporation
- Diane C. Boyd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming features using self-trimming by selective etch a...
- Patent number 6,210,866
- Issue date Apr 3, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming borderless gate structures and apparatus formed...
- Patent number 6,207,514
- Issue date Mar 27, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimization of space width for hybrid photoresist
- Patent number 6,200,726
- Issue date Mar 13, 2001
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Printing sublithographic images using a shadow mandrel and off-axis...
- Patent number 6,194,268
- Issue date Feb 27, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low “K” factor hybrid photoresist
- Patent number 6,190,829
- Issue date Feb 20, 2001
- International Business Machines Corporation
- Steve J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fused hybrid resist shapes as a means of modulating hybrid resist s...
- Patent number 6,184,041
- Issue date Feb 6, 2001
- International Business Machines Corporation
- Toshiharu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming self-aligned features
- Patent number 6,150,256
- Issue date Nov 21, 2000
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency doubling hybrid photoresist having negative and positive...
- Patent number 6,114,082
- Issue date Sep 5, 2000
- International Business Machines Corporation
- Mark C. Hakey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure for folded architecture pillar memory cell
- Patent number 6,114,725
- Issue date Sep 5, 2000
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acid sensitive ARC and method of use
- Patent number 6,110,653
- Issue date Aug 29, 2000
- International Business Machines Corporation
- Steven J. Holmes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Vertical dual gate field effect transistor
- Publication number 20040219725
- Publication date Nov 4, 2004
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for selective trimming of gate structures and apparatus form...
- Publication number 20040180484
- Publication date Sep 16, 2004
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical dual gate field effect transistor
- Publication number 20030052364
- Publication date Mar 20, 2003
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Assist features for contact hole mask patterns
- Publication number 20030008216
- Publication date Jan 9, 2003
- International Business Machines Corporation
- Orest Bula
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF T-GATE FABRICATION USING A HYBRID RESIST
- Publication number 20020048858
- Publication date Apr 25, 2002
- TOSHIHARU FURUKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF A HIGH DENSITY LONG CHANNEL DRAM GATE WITH OR WITHOU...
- Publication number 20010003034
- Publication date Jun 7, 2001
- TOSHIHARU FURUKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Paul A. Rabidoux

Person

Patents Grantslast 30 patents

Vertical dual gate field effect transistor

Method for selective trimming of gate structures and apparatus form...

Vertical dual gate field effect transistor

Method for selective trimming of gate structures and apparatus form...

Assist features for contact hole mask patterns

Borderless gate structures

Structure for folded architecture pillar memory cell

Low &#x0201C;K&#x0201D; factor hybrid photoresist

Fabrication of a high density long channel DRAM gate with or withou...

Methods of T-gate fabrication using a hybrid resist

Method of producing an integrated circuit chip using frequency doub...

Hybrid resist based on photo acid/photo base blending

Acid sensitive ARC and method of use

Integrated circuit chip produced by using frequency doubling hybrid...

Process for self-alignment of sub-critical contacts to wiring

Method of producing an integrated circuit chip using low &#x0201C;k...

Method for forming features using frequency doubling hybrid resist...

Method for forming features using frequency doubling hybrid resist...

Process for fabricating short channel field effect transistor with...

Resist image reversal by means of spun-on-glass

Method for forming features using self-trimming by selective etch a...

Method for forming borderless gate structures and apparatus formed...

Optimization of space width for hybrid photoresist

Printing sublithographic images using a shadow mandrel and off-axis...

Low &#x0201C;K&#x0201D; factor hybrid photoresist

Fused hybrid resist shapes as a means of modulating hybrid resist s...

Method for forming self-aligned features

Frequency doubling hybrid photoresist having negative and positive...

Structure for folded architecture pillar memory cell

Acid sensitive ARC and method of use

Patents Applicationslast 30 patents

Vertical dual gate field effect transistor

Method for selective trimming of gate structures and apparatus form...

Vertical dual gate field effect transistor

Assist features for contact hole mask patterns

METHODS OF T-GATE FABRICATION USING A HYBRID RESIST

FABRICATION OF A HIGH DENSITY LONG CHANNEL DRAM GATE WITH OR WITHOU...

Low “K” factor hybrid photoresist

Method of producing an integrated circuit chip using low “k...

Low “K” factor hybrid photoresist